loadpatents
name:-0.023869037628174
name:-0.027392864227295
name:-0.002824068069458
Tomoyasu; Masayuki Patent Filings

Tomoyasu; Masayuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tomoyasu; Masayuki.The latest application filed is for "focus ring, chuck assembly for securing a substrate and plasma treatment apparatus having the same".

Company Profile
2.23.17
  • Tomoyasu; Masayuki - Seongnam-si KR
  • TOMOYASU; Masayuki - Hwaseong-si KR
  • Tomoyasu; Masayuki - Tokyo JP
  • Tomoyasu; Masayuki - Yamanashi JP
  • Tomoyasu; Masayuki - Nirasaki JP
  • Tomoyasu, Masayuki - Nirasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same
Grant 11,450,545 - Sun , et al. September 20, 2
2022-09-20
Focus Ring, Chuck Assembly For Securing A Substrate And Plasma Treatment Apparatus Having The Same
App 20210305021 - SONG; Incheol ;   et al.
2021-09-30
Substrate Processing Apparatus And Method Of Processing A Substrate
App 20210272838 - SUN; Jong Woo ;   et al.
2021-09-02
Substrate processing apparatus including edge ring
Grant 11,018,046 - Sun , et al. May 25, 2
2021-05-25
Capacitively-coupled Plasma Substrate Processing Apparatus Including A Focus Ring And A Substrate Processing Method Using The Same
App 20200335376 - SUN; Jongwoo ;   et al.
2020-10-22
Substrate Processing Apparatus Including Edge Ring
App 20200328105 - SUN; Jong Woo ;   et al.
2020-10-15
Substrate processing system, method of managing the same and method of manufacturing semiconductor device with the same
Grant 9,859,175 - Song , et al. January 2, 2
2018-01-02
Method for fabricating a semiconductor device
Grant 9,799,561 - Park , et al. October 24, 2
2017-10-24
Method For Fabricating A Semiconductor Device
App 20170053828 - PARK; Chan-Hoon ;   et al.
2017-02-23
Plasma Processing Apparatus
App 20170047200 - Lee; Hyung-Joo ;   et al.
2017-02-16
Dry Etching Apparatus
App 20170032987 - LEE; Hyung-Joo ;   et al.
2017-02-02
Substrate Processing System, Method Of Managing The Same And Method Of Manufacturing Semiconductor Device With The Same
App 20160372386 - SONG; Kiwook ;   et al.
2016-12-22
Method and system for performing a chemical oxide removal process
Grant 8,175,736 - Tomoyasu , et al. May 8, 2
2012-05-08
Method And System For Performing A Chemical Oxide Removal Process
App 20110307089 - TOMOYASU; Masayuki ;   et al.
2011-12-15
Method and system for performing a chemical oxide removal process
Grant 7,877,161 - Tomoyasu , et al. January 25, 2
2011-01-25
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
Grant 7,648,610 - Komiya , et al. January 19, 2
2010-01-19
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
Grant 7,505,879 - Tomoyasu , et al. March 17, 2
2009-03-17
Fault detection and classification (FDC) using a run-to-run controller
Grant 7,477,960 - Willis , et al. January 13, 2
2009-01-13
Plasma processing method and apparatus
Grant 7,289,866 - Tomoyasu October 30, 2
2007-10-30
Observation window of plasma processing apparatus and plasma processing apparatus using the same
Grant 7,172,675 - Tomoyasu February 6, 2
2007-02-06
Plasma processing apparatus and method of plasma processing
Grant 7,153,387 - Tomoyasu December 26, 2
2006-12-26
Fault detection and classification (FDC) using a run-to-run controller
App 20060184264 - Willis; James E. ;   et al.
2006-08-17
Process control system and process control method
Grant 7,047,095 - Tomoyasu May 16, 2
2006-05-16
Plasma processing method and apparatus
App 20050154482 - Tomoyasu, Masayuki
2005-07-14
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
App 20050143952 - Tomoyasu, Masayuki ;   et al.
2005-06-30
Method of operating a system for chemical oxide removal
App 20040185583 - Tomoyasu, Masayuki ;   et al.
2004-09-23
Observation window of plasma processing apparatus and plasma processing apparatus using the same
App 20040134426 - Tomoyasu, Masayuki
2004-07-15
Process control system and process control method
App 20040138773 - Tomoyasu, Masayuki
2004-07-15
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
App 20030094135 - Komiya, Taro ;   et al.
2003-05-22
Plasma treatment method and apparatus
Grant 6,544,380 - Tomoyasu , et al. April 8, 2
2003-04-08
Etching method
Grant 6,423,242 - Kojima , et al. July 23, 2
2002-07-23
Plasma treatment method and apparatus
App 20020088547 - Tomoyasu, Masayuki ;   et al.
2002-07-11
Plasma treatment method and apparatus
Grant 6,264,788 - Tomoyasu , et al. July 24, 2
2001-07-24
Plasma treatment method utilizing an amplitude-modulated high frequency power
Grant 6,106,737 - Tomoyasu , et al. August 22, 2
2000-08-22
Plasma processing apparatus
Grant 6,074,518 - Imafuku , et al. June 13, 2
2000-06-13
Plasma processing apparatus
Grant 5,904,780 - Tomoyasu May 18, 1
1999-05-18
Plasma treatment method and apparatus
Grant 5,900,103 - Tomoyasu , et al. May 4, 1
1999-05-04
Plasma processing method
Grant 5,888,907 - Tomoyasu , et al. March 30, 1
1999-03-30
Ion implantation system
Grant 5,343,047 - Ono , et al. August 30, 1
1994-08-30
Laser beam scanning system
Grant 5,067,798 - Tomoyasu November 26, 1
1991-11-26

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