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Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same Grant 11,450,545 - Sun , et al. September 20, 2 | 2022-09-20 |
Focus Ring, Chuck Assembly For Securing A Substrate And Plasma Treatment Apparatus Having The Same App 20210305021 - SONG; Incheol ;   et al. | 2021-09-30 |
Substrate Processing Apparatus And Method Of Processing A Substrate App 20210272838 - SUN; Jong Woo ;   et al. | 2021-09-02 |
Substrate processing apparatus including edge ring Grant 11,018,046 - Sun , et al. May 25, 2 | 2021-05-25 |
Capacitively-coupled Plasma Substrate Processing Apparatus Including A Focus Ring And A Substrate Processing Method Using The Same App 20200335376 - SUN; Jongwoo ;   et al. | 2020-10-22 |
Substrate Processing Apparatus Including Edge Ring App 20200328105 - SUN; Jong Woo ;   et al. | 2020-10-15 |
Substrate processing system, method of managing the same and method of manufacturing semiconductor device with the same Grant 9,859,175 - Song , et al. January 2, 2 | 2018-01-02 |
Method for fabricating a semiconductor device Grant 9,799,561 - Park , et al. October 24, 2 | 2017-10-24 |
Method For Fabricating A Semiconductor Device App 20170053828 - PARK; Chan-Hoon ;   et al. | 2017-02-23 |
Plasma Processing Apparatus App 20170047200 - Lee; Hyung-Joo ;   et al. | 2017-02-16 |
Dry Etching Apparatus App 20170032987 - LEE; Hyung-Joo ;   et al. | 2017-02-02 |
Substrate Processing System, Method Of Managing The Same And Method Of Manufacturing Semiconductor Device With The Same App 20160372386 - SONG; Kiwook ;   et al. | 2016-12-22 |
Method and system for performing a chemical oxide removal process Grant 8,175,736 - Tomoyasu , et al. May 8, 2 | 2012-05-08 |
Method And System For Performing A Chemical Oxide Removal Process App 20110307089 - TOMOYASU; Masayuki ;   et al. | 2011-12-15 |
Method and system for performing a chemical oxide removal process Grant 7,877,161 - Tomoyasu , et al. January 25, 2 | 2011-01-25 |
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate Grant 7,648,610 - Komiya , et al. January 19, 2 | 2010-01-19 |
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus Grant 7,505,879 - Tomoyasu , et al. March 17, 2 | 2009-03-17 |
Fault detection and classification (FDC) using a run-to-run controller Grant 7,477,960 - Willis , et al. January 13, 2 | 2009-01-13 |
Plasma processing method and apparatus Grant 7,289,866 - Tomoyasu October 30, 2 | 2007-10-30 |
Observation window of plasma processing apparatus and plasma processing apparatus using the same Grant 7,172,675 - Tomoyasu February 6, 2 | 2007-02-06 |
Plasma processing apparatus and method of plasma processing Grant 7,153,387 - Tomoyasu December 26, 2 | 2006-12-26 |
Fault detection and classification (FDC) using a run-to-run controller App 20060184264 - Willis; James E. ;   et al. | 2006-08-17 |
Process control system and process control method Grant 7,047,095 - Tomoyasu May 16, 2 | 2006-05-16 |
Plasma processing method and apparatus App 20050154482 - Tomoyasu, Masayuki | 2005-07-14 |
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus App 20050143952 - Tomoyasu, Masayuki ;   et al. | 2005-06-30 |
Method of operating a system for chemical oxide removal App 20040185583 - Tomoyasu, Masayuki ;   et al. | 2004-09-23 |
Observation window of plasma processing apparatus and plasma processing apparatus using the same App 20040134426 - Tomoyasu, Masayuki | 2004-07-15 |
Process control system and process control method App 20040138773 - Tomoyasu, Masayuki | 2004-07-15 |
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate App 20030094135 - Komiya, Taro ;   et al. | 2003-05-22 |
Plasma treatment method and apparatus Grant 6,544,380 - Tomoyasu , et al. April 8, 2 | 2003-04-08 |
Etching method Grant 6,423,242 - Kojima , et al. July 23, 2 | 2002-07-23 |
Plasma treatment method and apparatus App 20020088547 - Tomoyasu, Masayuki ;   et al. | 2002-07-11 |
Plasma treatment method and apparatus Grant 6,264,788 - Tomoyasu , et al. July 24, 2 | 2001-07-24 |
Plasma treatment method utilizing an amplitude-modulated high frequency power Grant 6,106,737 - Tomoyasu , et al. August 22, 2 | 2000-08-22 |
Plasma processing apparatus Grant 6,074,518 - Imafuku , et al. June 13, 2 | 2000-06-13 |
Plasma processing apparatus Grant 5,904,780 - Tomoyasu May 18, 1 | 1999-05-18 |
Plasma treatment method and apparatus Grant 5,900,103 - Tomoyasu , et al. May 4, 1 | 1999-05-04 |
Plasma processing method Grant 5,888,907 - Tomoyasu , et al. March 30, 1 | 1999-03-30 |
Ion implantation system Grant 5,343,047 - Ono , et al. August 30, 1 | 1994-08-30 |
Laser beam scanning system Grant 5,067,798 - Tomoyasu November 26, 1 | 1991-11-26 |