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Patent applications and USPTO patent grants for Tominaga; Sho.The latest application filed is for "method of etching silicon containing films selectively against each other".
Patent | Date |
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Method of etching silicon containing films selectively against each other Grant 11,404,281 - Gohira , et al. August 2, 2 | 2022-08-02 |
Method Of Etching Silicon Containing Films Selectively Against Each Other App 20210104413 - Gohira; Taku ;   et al. | 2021-04-08 |
Method of etching silicon containing films selectively against each other Grant 10,903,084 - Gohira , et al. January 26, 2 | 2021-01-26 |
Plasma etching method Grant 10,707,090 - Takayama , et al. | 2020-07-07 |
Etching method Grant 10,381,237 - Takeda , et al. A | 2019-08-13 |
Method Of Etching Silicon Containing Films Selectively Against Each Other App 20190244829 - Gohira; Taku ;   et al. | 2019-08-08 |
Method of etching silicon oxide and silicon nitride selectively against each other Grant 10,304,691 - Gohira , et al. | 2019-05-28 |
Etching Method App 20180261465 - TAKEDA; Ryohei ;   et al. | 2018-09-13 |
Plasma Etching Method App 20180226264 - TAKAYAMA; Wataru ;   et al. | 2018-08-09 |
Etching method Grant 9,997,374 - Takeda , et al. June 12, 2 | 2018-06-12 |
Plasma etching method Grant 9,966,273 - Takayama , et al. May 8, 2 | 2018-05-08 |
Method Of Etching Silicon Oxide And Silicon Nitride Selectively Against Each Other App 20180076048 - Gohira; Taku ;   et al. | 2018-03-15 |
Etching method Grant 9,779,961 - Saitoh , et al. October 3, 2 | 2017-10-03 |
Etching Method App 20170178921 - TAKEDA; Ryohei ;   et al. | 2017-06-22 |
Plasma Etching Method App 20170162399 - TAKAYAMA; Wataru ;   et al. | 2017-06-08 |
Etching method Grant 9,666,446 - Tominaga , et al. May 30, 2 | 2017-05-30 |
Etching Method App 20160314986 - TOMINAGA; Sho ;   et al. | 2016-10-27 |
Etching Method App 20160064245 - SAITOH; Yusuke ;   et al. | 2016-03-03 |
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