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Patent applications and USPTO patent grants for Tominaga; Aiko.The latest application filed is for "oxide sintered material and method of manufacturing the same, sputtering target, oxide semiconductor film, and method of manufac".
Patent | Date |
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Oxide sintered material and method for manufacturing the same, sputtering target, and method for manufacturing semiconductor device Grant 10,894,744 - Miyanaga , et al. January 19, 2 | 2021-01-19 |
Oxide Sintered Material And Method Of Manufacturing The Same, Sputtering Target, Oxide Semiconductor Film, And Method Of Manufac App 20200126790 - MIYANAGA; Miki ;   et al. | 2020-04-23 |
Oxide Sintered Material And Method For Manufacturing The Same, Sputtering Target, And Method For Manufacturing Semiconductor Dev App 20200062651 - MIYANAGA; Miki ;   et al. | 2020-02-27 |
Electrode catalyst material, fuel cell electrode, method for producing electrode catalyst material, and fuel cell Grant 10,003,082 - Hiraiwa , et al. June 19, 2 | 2018-06-19 |
Electrode Catalyst Material, Fuel Cell Electrode, Method For Producing Electrode Catalyst Material, And Fuel Cell App 20160248101 - HIRAIWA; Chihiro ;   et al. | 2016-08-25 |
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