Tomimori; Hiroaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tomimori; Hiroaki.The latest application filed is for "method of forming a high-k film on a semiconductor device".

Company Profile

0.20.21

Tomimori; Hiroaki - Kanagawa JP
Tomimori; Hiroaki - Kawasaki JP
Tomimori; Hiroaki - Tokyo JP
Tomimori, Hiroaki - Kawasaki-shi JP
Tomimori, Hiroaki - Nakahara-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for manufacturing semiconductor device to form a via hole Grant 7,786,005 - Yamamoto , et al. August 31, 2	2010-08-31
Method of forming a high-k film on a semiconductor device Grant 7,718,532 - Tomimori , et al. May 18, 2	2010-05-18
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Grant 7,592,266 - Aoki , et al. September 22, 2	2009-09-22
Process for making a semiconductor device having a roughened surface Grant 7,560,372 - Tomimori , et al. July 14, 2	2009-07-14
Method of forming a high-k film on a semiconductor device App 20080081445 - Tomimori; Hiroaki ; et al.	2008-04-03
Removing Solution, Cleaning Method For Semiconductor Substrate, And Process For Production Of Semiconductor Device App 20080066779 - AOKI; Hidemitsu ; et al.	2008-03-20
Cleaning solution for semiconductor substrate Grant 7,312,186 - Takashima , et al. December 25, 2	2007-12-25
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Grant 7,312,160 - Aoki , et al. December 25, 2	2007-12-25
Manufacturing method of semiconductor device Grant 7,268,087 - Aoki , et al. September 11, 2	2007-09-11
Method of forming a high-k film on a semiconductor device Grant 7,192,835 - Tomimori , et al. March 20, 2	2007-03-20
Anticorrosive treating concentrate Grant 7,186,354 - Aoki , et al. March 6, 2	2007-03-06
Semiconductor device having a roughened surface Grant 7,170,172 - Tomimori , et al. January 30, 2	2007-01-30
Process or making a semiconductor device having a roughened surface App 20070015351 - Tomimori; Hiroaki ; et al.	2007-01-18
Washing liquid composition for semiconductor substrate Grant 7,138,362 - Abe , et al. November 21, 2	2006-11-21
Method for manufacturing semiconductor device App 20060214300 - Yamamoto; Kenichi ; et al.	2006-09-28
Post-CMP washing liquid composition Grant 7,087,562 - Abe , et al. August 8, 2	2006-08-08
Cleaning method, method for fabricating semiconductor device and cleaning solution Grant 6,998,352 - Aoki , et al. February 14, 2	2006-02-14
Stripping agent composition and method of stripping Grant 6,992,050 - Koita , et al. January 31, 2	2006-01-31
Semiconductor wafer surface and method of treating a semiconductor wafer surface Grant 6,897,150 - Aoki , et al. May 24, 2	2005-05-24
Semiconductor device fabricating method and treating liquid Grant 6,890,864 - Aoki , et al. May 10, 2	2005-05-10
Method of washing a semiconductor wafer Grant 6,864,187 - Tomimori , et al. March 8, 2	2005-03-08
Manufacturing method of semiconductor device App 20040266171 - Aoki, Hidemitsu ; et al.	2004-12-30
Method for manufacturing semiconductor device App 20040248350 - Tomimori, Hiroaki ; et al.	2004-12-09
Cleaning water for cleaning a wafer and method of cleaning a wafer Grant 6,797,648 - Aoki , et al. September 28, 2	2004-09-28
Manufacturing method of semicondcutor device Grant 6,787,480 - Aoki , et al. September 7, 2	2004-09-07
Cleaning solution for semiconductor substrate App 20040161933 - Takashima, Masayuki ; et al.	2004-08-19
Liquid composition for cleaning hydrophobic substrate and cleaning method therewith App 20040116315 - Aoki, Hidemitsu ; et al.	2004-06-17
Stripping agent composition and method of stripping App 20040029051 - Koita, Tatsuya ; et al.	2004-02-12
Post-CMP washing liquid composition App 20030216270 - Abe, Yumiko ; et al.	2003-11-20
Washing liquid composition for semiconductor substrate App 20030171233 - Abe, Yumiko ; et al.	2003-09-11
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device App 20030139045 - Aoki, Hidemitsu ; et al.	2003-07-24
Semiconductor device fabricating method and treating liquid App 20030134507 - Aoki, Hidemitsu ; et al.	2003-07-17
Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions Grant 6,592,677 - Tomimori , et al. July 15, 2	2003-07-15
Semiconductor device and method for producing the same App 20030111731 - Tomimori, Hiroaki ; et al.	2003-06-19
Wash water or immersion water used during semiconductor manufacturing App 20030094610 - Aoki, Hidemitsu ; et al.	2003-05-22
Cleaning method, method for fabricating semiconductor device and cleaning solution App 20030087524 - Aoki, Hidemitsu ; et al.	2003-05-08
Semiconductor device fabricating method and treating liquid App 20030027418 - Aoki, Hidemitsu ; et al.	2003-02-06
Method of washing a semiconductor wafer App 20030013310 - Tomimori, Hiroaki ; et al.	2003-01-16
Cleaning water for cleaning a wafer and method of cleaning a wafer App 20020189639 - Aoki, Hidemitsu ; et al.	2002-12-19
Manufacturing method of semiconductor device App 20020155702 - Aoki, Hidemitsu ; et al.	2002-10-24
Anticorrosive treating concentrate App 20010030315 - Aoki, Hidemitsu ; et al.	2001-10-18

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.