Tomimatu; Yoshikatu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tomimatu; Yoshikatu.The latest application filed is for "semiconductor device and fabrication method therefor".
- Tomimatu; Yoshikatu - Tokyo JP
- Tomimatu, Yoshikatu - Hyogo JP
| Patent | Date |
|---|---|
| Method, equipment, and recording medium for controlling exposure accuracy Grant 6,662,145 - Tomimatu December 9, 2 | 2003-12-09 |
| Semiconductor device and fabrication method therefor App 20030104292 - Tomimatu, Yoshikatu | 2003-06-05 |
| Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus Grant 6,239,858 - Tomimatu May 29, 2 | 2001-05-29 |
| Overlay error determination mark considering influence of aberration Grant 6,165,656 - Tomimatu December 26, 2 | 2000-12-26 |
| Aberration estimation reticle for determining overlay error Grant 5,939,226 - Tomimatu August 17, 1 | 1999-08-17 |
| Method of aligning reticle pattern Grant 5,792,580 - Tomimatu August 11, 1 | 1998-08-11 |
| Measuring method of a relative positional deviation of reticle pattern Grant 5,773,180 - Tomimatu June 30, 1 | 1998-06-30 |
| Method of determining position offset of a pattern Grant 5,671,165 - Tomimatu September 23, 1 | 1997-09-23 |
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