Tolani; Vikram
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tolani; Vikram.The latest application filed is for "system and method for reducing printable defects on extreme ultraviolet pattern masks".
- Tolani; Vikram - San Jose CA
| Patent | Date |
|---|---|
| System and method for reducing printable defects on extreme ultraviolet pattern masks Grant 11,119,404 - Yang , et al. September 14, 2 | 2021-09-14 |
| System And Method For Reducing Printable Defects On Extreme Ultraviolet Pattern Masks App 20210109440 - Yang; Xiaochun ; et al. | 2021-04-15 |
| Dispositioning defects detected on extreme ultraviolet photomasks Grant 10,866,197 - Tolani , et al. December 15, 2 | 2020-12-15 |
| Dispositioning Defects Detected On Extreme Ultraviolet Photomasks App 20200096862 - Tolani; Vikram ; et al. | 2020-03-26 |
| Photo-mask acceptance technique Grant 8,458,622 - Pang , et al. June 4, 2 | 2013-06-04 |
| Photo-Mask Acceptance Technique App 20120134542 - Pang; Linyong ; et al. | 2012-05-31 |
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