Tokyo Electron Kyushu Limited
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tokyo Electron Kyushu Limited.The latest application filed is for "method of forming coating film and apparatus therefor".
Company Profile
0.69.0
- Tokyo Electron Kyushu Limited - Tosu JP
- Tokyo Electron Kyushu Limited - JP JP
- Tokyo Electron Kyushu Ltd. - JP JP
- Tokyo Electron Kyushu Limited - both of JP
- Tokyo Electron Kyushu Limited - Kumamoto JP
Patent Activity
| Patent | Date |
|---|---|
| Method of forming coating film and apparatus therefor Grant 6,063,190 - Hasebe , et al. May 16, 2 | 2000-05-16 |
| Method of substrate processing to form a film on multiple target objects Grant 6,054,181 - Nanbu , et al. April 25, 2 | 2000-04-25 |
| Substrate transferring device Grant 6,022,185 - Mokuo February 8, 2 | 2000-02-08 |
| Double-sided substrate cleaning apparatus and cleaning method using the same Grant 5,964,954 - Matsukawa , et al. October 12, 1 | 1999-10-12 |
| Processing apparatus and processing method Grant 5,965,200 - Tateyama , et al. October 12, 1 | 1999-10-12 |
| Solvent and resist spin coating apparatus Grant 5,942,035 - Hasebe , et al. August 24, 1 | 1999-08-24 |
| Processing apparatus and processing method Grant 5,871,584 - Tateyama , et al. February 16, 1 | 1999-02-16 |
| Substrate processing system Grant 5,826,129 - Hasebe , et al. October 20, 1 | 1998-10-20 |
| Apparatus and method for developing resist coated on substrate Grant 5,826,130 - Tanaka , et al. October 20, 1 | 1998-10-20 |
| Substrate heat treatment table apparatus Grant 5,817,156 - Tateyama , et al. October 6, 1 | 1998-10-06 |
| Resist processing apparatus having an interface section including two stacked substrate waiting tables Grant 5,803,932 - Akimoto , et al. September 8, 1 | 1998-09-08 |
| Resist processing method and apparatus Grant 5,779,796 - Tomoeda , et al. July 14, 1 | 1998-07-14 |
| Substrate processing apparatus Grant 5,762,745 - Hirose June 9, 1 | 1998-06-09 |
| Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections Grant 5,725,664 - Nanbu , et al. March 10, 1 | 1998-03-10 |
| Resist processing apparatus for a rectangular substrate Grant 5,718,763 - Tateyama , et al. February 17, 1 | 1998-02-17 |
| Substrate transfer apparatus Grant 5,711,646 - Ueda , et al. January 27, 1 | 1998-01-27 |
| Method of forming a coating film Grant 5,695,817 - Tateyama , et al. December 9, 1 | 1997-12-09 |
| Apparatus for developing a resist-coated substrate Grant 5,689,749 - Tanaka , et al. November 18, 1 | 1997-11-18 |
| Resist treating method Grant 5,686,143 - Matsukawa , et al. November 11, 1 | 1997-11-11 |
| Hydrophobic treatment method involving delivery of a liquid process agent to a process space Grant 5,681,614 - Omori , et al. October 28, 1 | 1997-10-28 |
| Coating apparatus Grant 5,672,205 - Fujimoto , et al. September 30, 1 | 1997-09-30 |
| Substrate drying apparatus and substrate drying method Grant 5,671,544 - Yokomizo , et al. September 30, 1 | 1997-09-30 |
| Substrate processing method and substrate processing apparatus Grant 5,665,200 - Fujimoto , et al. September 9, 1 | 1997-09-09 |
| Method of forming coating film and apparatus therefor Grant 5,658,615 - Hasebe , et al. August 19, 1 | 1997-08-19 |
| Cleaning apparatus and cleaning method Grant 5,636,401 - Yonemizu , et al. June 10, 1 | 1997-06-10 |
| Resist processing apparatus, substrate processing apparatus and method of transferring a processed article Grant 5,626,675 - Sakamoto , et al. May 6, 1 | 1997-05-06 |
| Resist processing method and apparatus Grant 5,626,913 - Tomoeda , et al. May 6, 1 | 1997-05-06 |
| Apparatus and method for developing resist coated on a substrate Grant 5,625,433 - Inada , et al. April 29, 1 | 1997-04-29 |
| Transfer apparatus Grant 5,620,295 - Nishi April 15, 1 | 1997-04-15 |
| Method and apparatus for heat-treating substrate Grant 5,620,560 - Akimoto , et al. April 15, 1 | 1997-04-15 |
| Coating apparatus and method Grant 5,580,607 - Takekuma , et al. December 3, 1 | 1996-12-03 |
| System for applying process liquid Grant 5,578,127 - Kimura November 26, 1 | 1996-11-26 |
| Substrate drying apparatus and substrate drying method Grant 5,575,079 - Yokomizo , et al. November 19, 1 | 1996-11-19 |
| Semiconductor treatment system and method for exchanging and treating substrate Grant 5,564,889 - Araki October 15, 1 | 1996-10-15 |
| Method for scrubbing and cleaning substrate Grant 5,518,552 - Tanoue , et al. May 21, 1 | 1996-05-21 |
| Double-sided substrate cleaning apparatus Grant 5,518,542 - Matsukawa , et al. May 21, 1 | 1996-05-21 |
| Heat treatment device Grant 5,514,852 - Takamori , et al. May 7, 1 | 1996-05-07 |
| Hydrophobic processing apparatus including a liquid delivery system Grant 5,505,781 - Omori , et al. April 9, 1 | 1996-04-09 |
| Transfer apparatus Grant 5,505,577 - Nishi April 9, 1 | 1996-04-09 |
| Method and apparatus for hydrophobic treatment Grant 5,501,870 - Shiraishi , et al. March 26, 1 | 1996-03-26 |
| Apparatus and method for washing substrates Grant 5,498,294 - Matsushita , et al. March 12, 1 | 1996-03-12 |
| Method for processing wafer-shaped substrates Grant 5,460,478 - Akimoto , et al. October 24, 1 | 1995-10-24 |
| Processing apparatus with a gas distributor having back and forth parallel movement relative to a workpiece support surface Grant 5,445,699 - Kamikawa , et al. August 29, 1 | 1995-08-29 |
| Apparatus and method for drying substrates Grant 5,443,540 - Kamikawa August 22, 1 | 1995-08-22 |
| Resist processing method Grant 5,442,416 - Tateyama , et al. August 15, 1 | 1995-08-15 |
| Spindrier Grant 5,435,075 - Shiraishi , et al. | 1995-07-25 |
| Spin chuck and treatment apparatus using same Grant 5,421,056 - Tateyama , et al. June 6, 1 | 1995-06-06 |
| Method for applying process solution to substrates Grant 5,416,047 - Konishi , et al. May 16, 1 | 1995-05-16 |
| Substrates processing device Grant 5,405,443 - Akimoto , et al. April 11, 1 | 1995-04-11 |
| Method and apparatus for hydrophobic treatment Grant 5,401,316 - Shiraishi , et al. March 28, 1 | 1995-03-28 |
| Apparatus for cleaning conveyor chuck Grant 5,379,784 - Nishi , et al. January 10, 1 | 1995-01-10 |
| Device having brush for scrubbing substrate Grant 5,375,291 - Tateyama , et al. December 27, 1 | 1994-12-27 |
| Transfer apparatus Grant 5,374,153 - Nishi December 20, 1 | 1994-12-20 |
| Substrate drying apparatus Grant 5,369,891 - Kamikawa December 6, 1 | 1994-12-06 |
| Apparatus for processing wafer-shaped substrates Grant 5,364,222 - Akimoto , et al. November 15, 1 | 1994-11-15 |
| Cleaning apparatus for cleaning reverse surface of semiconductor wafer Grant 5,361,449 - Akimoto November 8, 1 | 1994-11-08 |
| Device and method for scrubbing and cleaning substrate Grant 5,345,639 - Tanoue , et al. September 13, 1 | 1994-09-13 |
| Resist processing method Grant 5,339,128 - Tateyama , et al. August 16, 1 | 1994-08-16 |
| Transportation-transfer device for an object of treatment Grant 5,297,910 - Yoshioka , et al. March 29, 1 | 1994-03-29 |
| Liquid supply apparatus Grant 5,275,658 - Kimura January 4, 1 | 1994-01-04 |
| Supply nozzle for applying liquid resist to a semiconductor wafer Grant D341,418 - Akimoto November 16, 1 | 1993-11-16 |
| Coating method and apparatus Grant 5,254,367 - Matsumura , et al. October 19, 1 | 1993-10-19 |
| Coating apparatus with nozzle moving means Grant 5,250,114 - Konishi , et al. October 5, 1 | 1993-10-05 |
| Indirect temperature-measurement of films formed on semiconductor wafers Grant 5,249,142 - Shirakawa , et al. September 28, 1 | 1993-09-28 |
| Washing apparatus Grant 5,226,437 - Kamikawa , et al. July 13, 1 | 1993-07-13 |
| Resist process system Grant 5,202,716 - Tateyama , et al. April 13, 1 | 1993-04-13 |
| Method for heat-processing semiconductor device and apparatus for the same Grant 5,151,871 - Matsumura , et al. September 29, 1 | 1992-09-29 |
| Liquid coating device Grant 5,127,362 - Iwatsu , et al. July 7, 1 | 1992-07-07 |
| Exposure apparatus Grant 5,028,955 - Hayashida , et al. July 2, 1 | 1991-07-02 |
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