Tokyo Eectron Limited
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tokyo Eectron Limited.The latest application filed is for "method of scavenging intermediate formed by reaction of oxidoreductase with substrate".
- Tokyo Eectron Limited - Tokyo JP
- TOKYO EECTRON LIMITED - 3-6 AKASAKA 5-CHOME MINATO-KU TOKYO JP
| Patent | Date |
|---|---|
| CVD apparatus and method of cleaning the CVD apparatus Grant 8,277,560 - Sakai , et al. October 2, 2 | 2012-10-02 |
| Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD Grant 7,704,893 - Kobayashi , et al. April 27, 2 | 2010-04-27 |
| Method of scavenging intermediate formed by reaction of oxidoreductase with substrate App 20060235558 - Tanaka; Osamu | 2006-10-19 |
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