Tokunaga; Hikaru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tokunaga; Hikaru.The latest application filed is for "composition for coating substrate with level difference, said composition containing compound having curable functional group".

Company Profile

13.5.18

Tokunaga; Hikaru - Toyama JP
TOKUNAGA; Hikaru - Toyama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Crosslinkable compound-containing photocurable stepped substrate-coating composition Grant 11,454,889 - Endo , et al. September 27, 2	2022-09-27
Composition For Coating Substrate With Level Difference, Said Composition Containing Compound Having Curable Functional Group App 20220269176 - HATTORI; Hayato ; et al.	2022-08-25
Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms Grant 11,385,546 - Endo , et al. July 12, 2	2022-07-12
Resist Underlayer Film-forming Composition App 20220155686 - TOKUNAGA; Hikaru ; et al.	2022-05-19
Resist Underlayer Film-forming Composition App 20220146939 - OGATA; Hiroto ; et al.	2022-05-12
Protective film-forming composition Grant 11,112,696 - Hashimoto , et al. September 7, 2	2021-09-07
Resist Underlayer Film-forming Composition Including Cyclic Carbonyl Compound App 20210124268 - TOKUNAGA; Hikaru ; et al.	2021-04-29
Resist Underlayer Film-forming Composition Using Carbon-oxygen Double Bond App 20210116814 - TOKUNAGA; Hikaru ; et al.	2021-04-22
Composition For Forming Photocurable Silicon-containing Coating Film App 20210054231 - SHIBAYAMA; Wataru ; et al.	2021-02-25
Stepped Substrate Coating Composition Containing Compound Having Curable Functional Group App 20210024773 - TOKUNAGA; Hikaru ; et al.	2021-01-28
Composition for forming film protecting against aqueous hydrogen peroxide solution Grant 10,894,887 - Tokunaga , et al. January 19, 2	2021-01-19
Stepped substrate-coating composition containing polyether resin having photocrosslinkable group Grant 10,871,712 - Tokunaga , et al. December 22, 2	2020-12-22
Resist Underlayer Film Forming Composition Using A Fluorene Compound App 20200379350 - TOKUNAGA; Hikaru ; et al.	2020-12-03
Stepped Substrate-coating Composition Containing Polyether Resin Having Photocrosslinkable Group App 20200301278 - TOKUNAGA; Hikaru ; et al.	2020-09-24
Crosslinkable Compound-containing Photocurable Stepped Substrate-coating Composition App 20200225585 - ENDO; Takafumi ; et al.	2020-07-16
Protective Film-forming Composition App 20200183282 - HASHIMOTO; Yuto ; et al.	2020-06-11
Composition For Forming Film Protecting Against Aqueous Hydrogen Peroxide Solution App 20200131376 - TOKUNAGA; Hikaru ; et al.	2020-04-30
Multi-level Substrate Coating Film-forming Composition Containing Plasma-curable Compound Based On Unsaturated Bonds Between Car App 20200124966 - ENDO; Takafumi ; et al.	2020-04-23
Resist Underlayer Film-forming Composition Containing Amide Solvent App 20190354018 - TOKUNAGA; Hikaru ; et al.	2019-11-21
Photocurable Composition And Method For Producing Semiconductor Device App 20190171101 - TOKUNAGA; Hikaru ; et al.	2019-06-06
Composition For Forming Resist Underlayer Film With Improved Film Density App 20190137878 - TOKUNAGA; Hikaru ; et al.	2019-05-09
Stepped Substrate Coating Composition Including Compound Having Photocrosslinking Group Due To Unsaturated Bond Between Carbon Atoms App 20190079397 - ENDO; Takafumi ; et al.	2019-03-14
Resist Underlayer Film-forming Composition Containing Indolocarbazole Novolak Resin App 20180356732 - TOKUNAGA; Hikaru ; et al.	2018-12-13

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