Tokumitsu; Eisuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tokumitsu; Eisuke.The latest application filed is for "dielectric layer and manufacturing method of dielectric layer, and solid-state electronic device and manufacturing method of solid-state electronic device".

Company Profile

0.6.7

Tokumitsu; Eisuke - Ishikawa JP
Tokumitsu; Eisuke - Kanazawa N/A JP
TOKUMITSU; Eisuke - Kanazawa-shi JP
Tokumitsu; Eisuke - Minato-ku JP
Tokumitsu; Eisuke - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Dielectric layer and manufacturing method of dielectric layer, and solid-state electronic device and manufacturing method of solid-state electronic device Grant 9,876,067 - Shimoda , et al. January 23, 2	2018-01-23
Dielectric Layer And Manufacturing Method Of Dielectric Layer, And Solid-state Electronic Device And Manufacturing Method Of Solid-state Electronic Device App 20160284790 - SHIMODA; Tatsuya ; et al.	2016-09-29
Solid-state electronic device including dielectric bismuth niobate film formed from solution Grant 9,293,257 - Shimoda , et al. March 22, 2	2016-03-22
Oxide Layer And Production Method For Oxide Layer, As Well As Capacitor, Semiconductor Device, And Microelectromechanical System Provided With Oxide Layer App 20160016813 - SHIMODA; Tatsuya ; et al.	2016-01-21
Process for production of functional device, process for production of ferroelectric material layer, process for production of field effect transistor, thin film transistor, field effect transistor, and piezoelectric inkjet head Grant 9,202,895 - Shimoda , et al. December 1, 2	2015-12-01
Process for production of functional device, process for production of ferroelectric material layer, process for production of field effect transistor, thin film transistor, field effect transistor, and piezoelectric ink jet head Grant 9,123,752 - Shimoda , et al. September 1, 2	2015-09-01
Process For Production Of Functional Device, Process For Production Of Ferroelectric Material Layer, Process For Production Of Field Effect Transistor, Thin Film Transistor, Field Effect Transistor, And Piezoelectric Ink Jet Head App 20150093841 - SHIMODA; Tatsuya ; et al.	2015-04-02
Laminated Structure, Ferroelectric Gate Thin Film Transistor, And Ferroelectric Thin Film Capacitor App 20140339550 - Shimoda; Tatsuya ; et al.	2014-11-20
Solid-state Electronic Device App 20140319660 - Shimoda; Tatsuya ; et al.	2014-10-30
Process For Production Of Functional Device, Process For Production Of Ferroelectric Material Layer, Process For Production Of Field Effect Transistor, Thin Film Transistor, Field Effect Transistor, And Piezoelectric Inkjet Head App 20130240871 - Shimoda; Tatsuya ; et al.	2013-09-19
Method of writing data to a single transistor type ferroelectric memory Grant 5,822,239 - Ishihara , et al. October 13, 1	1998-10-13

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