| Patent | Date |
|---|
Pulsed-voltage Hardware Assembly For Use In A Plasma Processing System
App 20220037120 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Assembly Using Pulsed-voltage And Radio-frequency Power
App 20220037119 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Using Pulsed-voltage And Radio-frequency Power
App 20220037121 - DORF; Leonid ; et al. | 2022-02-03 |
Dual-level pulse tuning
Grant 11,177,115 - Leray , et al. November 16, 2 | 2021-11-16 |
Processing chamber with substrate edge enhancement processing
Grant 11,094,511 - Lee , et al. August 17, 2 | 2021-08-17 |
Cooling mechanism utilized in a plasma reactor with enhanced temperature regulation
Grant 10,991,552 - Pal , et al. April 27, 2 | 2021-04-27 |
Dual-level Pulse Tuning
App 20200381214 - LERAY; Gary ; et al. | 2020-12-03 |
Processing Chamber With Substrate Edge Enhancement Processing
App 20200152431 - LEE; Changhun ; et al. | 2020-05-14 |
Inductively coupled plasma apparatus
Grant 10,573,493 - Todorow , et al. Feb | 2020-02-25 |
Power deposition control in inductively coupled plasma (ICP) reactors
Grant 10,553,398 - Banna , et al. Fe | 2020-02-04 |
Cooling Mechanism Utlized In A Plasma Reactor With Enhanced Temperature Regulation
App 20190198295 - PAL; Aniruddha ; et al. | 2019-06-27 |
Enhanced plasma source for a plasma reactor
Grant 10,290,469 - Todorow , et al. | 2019-05-14 |
Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation
Grant 10,249,475 - Pal , et al. | 2019-04-02 |
Shielded lid heater assembly
Grant 10,083,816 - Willwerth , et al. September 25, 2 | 2018-09-25 |
Shielded Lid Heater Assembly
App 20160254123 - WILLWERTH; Michael D. ; et al. | 2016-09-01 |
Inductively Coupled Plasma Apparatus
App 20160196953 - TODOROW; VALENTIN N. ; et al. | 2016-07-07 |
Inductively coupled plasma reactor having RF phase control and methods of use thereof
Grant 9,378,930 - Grimbergen , et al. June 28, 2 | 2016-06-28 |
Shielded lid heater assembly
Grant 9,362,148 - Willwerth , et al. June 7, 2 | 2016-06-07 |
Methods For Extending Chamber Component Life For Plasma Processing Semiconductor Applications
App 20150294843 - CHEN; Feng ; et al. | 2015-10-15 |
Cooling Mechanism Utlized In A Plasma Reactor With Enhanced Temperature Regulation
App 20150279634 - PAL; Aniruddha ; et al. | 2015-10-01 |
Electrostatic Chuck With Magnetic Cathode Liner For Critical Dimension (cd) Tuning
App 20150221481 - Willwerth; Michael D. ; et al. | 2015-08-06 |
Power Deposition Control In Inductively Coupled Plasma (icp) Reactors
App 20150068682 - BANNA; SAMER ; et al. | 2015-03-12 |
Enhanced Plasma Source For A Plasma Reactor
App 20140367046 - TODOROW; Valentin N. ; et al. | 2014-12-18 |
Method And Apparatus For Stable Plasma Processing
App 20140345803 - TODOROW; Valentin N. ; et al. | 2014-11-27 |
Method and apparatus for stable plasma processing
Grant 8,801,896 - Todorow , et al. August 12, 2 | 2014-08-12 |
Apparatus for forming a magnetic field and methods of use thereof
Grant 8,773,020 - Leray , et al. July 8, 2 | 2014-07-08 |
Deposition Shield For Plasma Enhanced Substrate Processing
App 20140151331 - TODOROW; VALENTIN N. ; et al. | 2014-06-05 |
Shielded Lid Heater Assembly
App 20130189848 - WILLWERTH; Michael D. ; et al. | 2013-07-25 |
Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system
Grant 8,492,980 - Banna , et al. July 23, 2 | 2013-07-23 |
Inductively Coupled Plasma Apparatus
App 20130134129 - TODOROW; VALENTIN N. ; et al. | 2013-05-30 |
Method And Apparatus For Stable Plasma Processing
App 20130118687 - TODOROW; VALENTIN N. ; et al. | 2013-05-16 |
Shielded lid heater assembly
Grant 8,419,893 - Willwerth , et al. April 16, 2 | 2013-04-16 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
Grant 8,383,002 - Katz , et al. February 26, 2 | 2013-02-26 |
Inductively coupled plasma reactor having RF phase control and methods of use thereof
Grant 8,368,308 - Banna , et al. February 5, 2 | 2013-02-05 |
Plasma reactor with uniform process rate distribution by improved RF ground return path
Grant 8,360,003 - Nguyen , et al. January 29, 2 | 2013-01-29 |
Method and apparatus for stable plasma processing
Grant 8,349,128 - Todorow , et al. January 8, 2 | 2013-01-08 |
Field enhanced inductively coupled plasma (Fe-ICP) reactor
Grant 8,299,391 - Todorow , et al. October 30, 2 | 2012-10-30 |
Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias
Grant 8,236,133 - Katz , et al. August 7, 2 | 2012-08-07 |
Methods For Calibrating Rf Power Applied To A Plurality Of Rf Coils In A Plasma Processing System
App 20120104950 - BANNA; SAMER ; et al. | 2012-05-03 |
Apparatus For Forming A Magnetic Field And Methods Of Use Thereof
App 20120097870 - LERAY; GARY ; et al. | 2012-04-26 |
Gas flow equalizer plate suitable for use in a substrate process chamber
Grant 8,075,728 - Balakrishna , et al. December 13, 2 | 2011-12-13 |
Method to control uniformity using tri-zone showerhead
Grant 8,066,895 - Belen , et al. November 29, 2 | 2011-11-29 |
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process
Grant 8,017,526 - Hammond, IV , et al. September 13, 2 | 2011-09-13 |
Process for wafer backside polymer removal and wafer front side photoresist removal
Grant 7,967,996 - Collins , et al. June 28, 2 | 2011-06-28 |
Inductively Coupled Plasma Apparatus
App 20110094994 - TODOROW; VALENTIN N. ; et al. | 2011-04-28 |
Dual Mode Inductively Coupled Plasma Reactor With Adjustable Phase Coil Assembly
App 20110097901 - BANNA; SAMER ; et al. | 2011-04-28 |
Rf Feed Structure For Plasma Processing
App 20110094683 - CHEN; ZHIGANG ; et al. | 2011-04-28 |
Method Of Processing A Workpiece In A Plasma Reactor With Independent Wafer Edge Process Gas Injection
App 20110068082 - Katz; Dan ; et al. | 2011-03-24 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
Grant 7,879,250 - Katz , et al. February 1, 2 | 2011-02-01 |
Plasma Reactor With Uniform Process Rate Distribution By Improved Rf Ground Return Path
App 20110005685 - Nguyen; Andrew ; et al. | 2011-01-13 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber
Grant 7,832,354 - Katz , et al. November 16, 2 | 2010-11-16 |
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof
App 20100276391 - GRIMBERGEN; MICHAEL N. ; et al. | 2010-11-04 |
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof
App 20100224321 - GRIMBERGEN; MICHAEL N. ; et al. | 2010-09-09 |
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof
App 20100227420 - BANNA; SAMER ; et al. | 2010-09-09 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
Grant 7,780,864 - Paterson , et al. August 24, 2 | 2010-08-24 |
Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures
Grant 7,771,606 - Kim , et al. August 10, 2 | 2010-08-10 |
Pulsed-plasma system for etching semiconductor structures
Grant 7,737,042 - Kim , et al. June 15, 2 | 2010-06-15 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
Grant 7,727,413 - Paterson , et al. June 1, 2 | 2010-06-01 |
Field Enhanced Inductively Coupled Plasma (fe-icp) Reactor
App 20100025384 - TODOROW; VALENTIN N. ; et al. | 2010-02-04 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
Grant 7,645,357 - Paterson , et al. January 12, 2 | 2010-01-12 |
Plasma Process Employing Multiple Zone Gas Distribution For Improved Uniformity Of Critical Dimension Bias
App 20090275206 - Katz; Dan ; et al. | 2009-11-05 |
Plasma Reactor With Center-fed Multiple Zone Gas Distribution For Improved Uniformity Of Critical Dimension Bias
App 20090272492 - Katz; Dan ; et al. | 2009-11-05 |
Shielded Lid Heater Assembly
App 20090236315 - Willwerth; Michael D. ; et al. | 2009-09-24 |
Gas Flow Equalizer Plate Suitable For Use In A Substrate Process Chamber
App 20090218043 - Balakrishna; Ajit ; et al. | 2009-09-03 |
Method To Control Uniformity Using Tri-zone Showerhead
App 20090218317 - BELEN; RODOLFO P. ; et al. | 2009-09-03 |
Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactor
App 20090156011 - Belen; Rodolfo P. ; et al. | 2009-06-18 |
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process
App 20090142930 - Hammond, IV; Edward P. ; et al. | 2009-06-04 |
Trajectory Based Control Of Plasma Processing
App 20090061544 - HOLLAND; JOHN P. ; et al. | 2009-03-05 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
App 20090057269 - Katz; Dan ; et al. | 2009-03-05 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber
App 20090056629 - Katz; Dan ; et al. | 2009-03-05 |
Plasma Reactor With An Overhead Inductive Antenna And An Overhead Gas Distribution Showerhead
App 20080236490 - PATERSON; ALEXANDER ; et al. | 2008-10-02 |
Pulsed-plasma System For Etching Semiconductor Structures
App 20080206900 - KIM; TAE WON ; et al. | 2008-08-28 |
Pulsed-plasma System With Pulsed Reaction Gas Replenish For Etching Semiconductor Structures
App 20080206901 - KIM; TAE WON ; et al. | 2008-08-28 |
Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode
App 20080193673 - Paterson; Alexander M. ; et al. | 2008-08-14 |
Temperature-switched Process For Wafer Backside Polymer Removal And Front Side Photoresist Strip
App 20080179290 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Reactor For Wafer Backside Polymer Removal Having An Etch Plasma Jet Stream Source
App 20080179009 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Process for wafer backside polymer removal and wafer front side photoresist removal
App 20080179291 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode
App 20080178805 - Paterson; Alexander M. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal With Wafer Front Side Gas Purge
App 20080179287 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Reactor For Wafer Backside Polymer Removal Using Plasma Products In A Lower Process Zone And Purge Gases In An Upper Process Zone
App 20080179007 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal And Wafer Front Side Scavenger Plasma
App 20080179288 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal With A Ring Of Plasma Under The Wafer
App 20080178913 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma etch process for controlling line edge roughness
App 20080149592 - Belen; Rodolfo P. ; et al. | 2008-06-26 |
Alternating Asymmetrical Plasma Generation In A Process Chamber
App 20080023443 - Paterson; Alexander ; et al. | 2008-01-31 |
Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequency
App 20070246161 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with independent capacitive and inductive plasma sources
App 20070246163 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma process for controlling plasma ion dissociation
App 20070246443 - Paterson; Alexander ; et al. | 2007-10-25 |
Dual plasma source process using a variable frequency capacitively coupled source for controlling plasma ion dissociation
App 20070245961 - Paterson; Alexander ; et al. | 2007-10-25 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
App 20070245959 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density
App 20070245960 - Paterson; Alexander ; et al. | 2007-10-25 |
Dual plasma source process using a variable frequency capacitively coupled source for controlling ion radial distribution
App 20070245958 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with an inductive plasma source and a VHF capacitively coupled plasma source with variable frequency
App 20070246162 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
App 20070247074 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
App 20070247073 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with independent capacitive and toroidal plasma sources
Grant 7,264,688 - Paterson , et al. September 4, 2 | 2007-09-04 |
Method and apparatus for stable plasma processing
App 20060000805 - Todorow; Valentin N. ; et al. | 2006-01-05 |
Alternating asymmetrical plasma generation in a process chamber
App 20050241762 - Paterson, Alexander ; et al. | 2005-11-03 |
Plasma reactor having a symmetric parallel conductor coil antenna
Grant 6,893,533 - Holland , et al. May 17, 2 | 2005-05-17 |
Plasma reactor having a symmetric parallel conductor coil antenna
App 20040083971 - Holland, John ; et al. | 2004-05-06 |
Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber
Grant 6,727,655 - McChesney , et al. April 27, 2 | 2004-04-27 |
Plasma reactor having a symmetrical parallel conductor coil antenna
Grant 6,694,915 - Holland , et al. February 24, 2 | 2004-02-24 |
Plasma reactor having a symmetrical parallel conductor coil antenna
Grant 6,685,798 - Holland , et al. February 3, 2 | 2004-02-03 |
Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber
App 20030082835 - McChesney, Jon ; et al. | 2003-05-01 |
Pulsed RF power delivery for plasma processing
Grant 6,472,822 - Chen , et al. October 29, 2 | 2002-10-29 |
Plasma reactor having a symmetric parallel conductor coil antenna
Grant 6,462,481 - Holland , et al. October 8, 2 | 2002-10-08 |
Plasma reactor having a symmetric parallel conductor coil antenna
Grant 6,414,648 - Holland , et al. July 2, 2 | 2002-07-02 |
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