Todorow; Valentin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Todorow; Valentin.The latest application filed is for "process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunability".

Company Profile

4.14.15

Todorow; Valentin - Palo Alto CA
Todorow; Valentin - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability Grant 10,825,708 - Todorow , et al. November 3, 2	2020-11-03
Method, apparatus and system for wafer dechucking using dynamic voltage sweeping Grant 10,546,731 - Wang , et al. Ja	2020-01-28
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability App 20190221463 - TODOROW; VALENTIN ; et al.	2019-07-18
High efficiency triple-coil inductively coupled plasma source with phase control Grant 10,271,416 - Banna , et al.	2019-04-23
High efficiency inductively coupled plasma source with customized RF shield for plasma profile control Grant 9,945,033 - Banna , et al. April 17, 2	2018-04-17
High Efficiency Inductively Coupled Plasma Source With Customized Rf Shield For Plasma Profile Control App 20150191823 - Banna; Samer ; et al.	2015-07-09
Extended and independent RF powered cathode substrate for extreme edge tunability Grant 8,988,848 - Todorow , et al. March 24, 2	2015-03-24
Methods to eliminate "M-shape" etch rate profile in inductively coupled plasma reactor Grant 8,956,500 - Yuen , et al. February 17, 2	2015-02-17
Inductively coupled plasma source with phase control Grant 8,933,628 - Banna , et al. January 13, 2	2015-01-13
Methods and apparatus for controlling substrate temperature in a process chamber Grant 8,633,423 - Lin , et al. January 21, 2	2014-01-21
Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability App 20130155568 - TODOROW; VALENTIN ; et al.	2013-06-20
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability App 20130154175 - TODOROW; VALENTIN ; et al.	2013-06-20
High Efficiency Triple-coil Inductively Coupled Plasma Source With Phase Control App 20130105086 - BANNA; SAMER ; et al.	2013-05-02
Plasma Reactor With Chamber Wall Temperature Control App 20130105085 - YOUSIF; IMAD ; et al.	2013-05-02
Inductively Coupled Plasma Soure With Phase Control App 20130106286 - BANNA; SAMER ; et al.	2013-05-02
Electrostatic Chuck App 20130107415 - BANNA; SAMER ; et al.	2013-05-02
Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power delivery Grant 8,264,154 - Banner , et al. September 11, 2	2012-09-11
Methods And Apparatus For Controlling Substrate Temperature In A Process Chamber App 20120091108 - LIN; XING ; et al.	2012-04-19
Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus Grant 7,837,838 - Chua , et al. November 23, 2	2010-11-23
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Grant 7,645,710 - Olsen , et al. January 12, 2	2010-01-12
Method And Apparatus For Pulsed Plasma Processing Using A Time Resolved Tuning Scheme For Rf Power Delivery App 20090284156 - BANNA; SAMER ; et al.	2009-11-19
Methods To Eliminate "m-shape" Etch Rate Profile In Inductively Coupled Plasma Reactor App 20080264904 - YUEN; STEPHEN ; et al.	2008-10-30
Method Of Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma Apparatus App 20070218623 - Chua; Thai Cheng ; et al.	2007-09-20
Apparatus For Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma System App 20070209930 - Chua; Thai Cheng ; et al.	2007-09-13
Method And Apparatus For Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma System App 20070212895 - CHUA; Thai Cheng ; et al.	2007-09-13
Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system Grant 6,818,562 - Todorow , et al. November 16, 2	2004-11-16
Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system App 20030196757 - Todorow, Valentin ; et al.	2003-10-23

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