Tobioka; Akihiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tobioka; Akihiro.The latest application filed is for "electrical overlay measurement methods and structures for wafer-to-wafer bonding".

Company Profile

2.6.11

Tobioka; Akihiro - Yokkaichi JP
TOBIOKA; Akihiro - Nagoya JP
Tobioka, Akihiro - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Three-dimensional memory device including stairless word line contact structures for and method of making the same Grant 11,450,679 - Tanaka , et al. September 20, 2	2022-09-20
Electrical Overlay Measurement Methods And Structures For Wafer-to-wafer Bonding App 20220285234 - YOKOMIZO; Ikue ; et al.	2022-09-08
Method Of Forming A Stepped Surface In A Three-dimensional Memory Device And Structures Incorporating The Same App 20220246636 - TOBIOKA; Akihiro ; et al.	2022-08-04
Three-dimensional Memory Device With Backside Support Pillar Structures And Methods Of Forming The Same App 20220223614 - TAKUMA; Shunsuke ; et al.	2022-07-14
Three-dimensional Memory Device Including Stairless Word Line Contact Structures For And Method Of Making The Same App 20220005824 - TANAKA; Yoshinobu ; et al.	2022-01-06
Three-dimensional Memory Device Including Stairless Word Line Contact Structures For And Method Of Making The Same App 20220005818 - TANAKA; Yoshinobu ; et al.	2022-01-06
Three-dimensional memory array including self-aligned dielectric pillar structures and methods of making the same Grant 11,189,637 - Tobioka November 30, 2	2021-11-30
Three-dimensional memory array including self-aligned dielectric pillar structures and methods of making the same Grant 10,861,871 - Tobioka December 8, 2	2020-12-08
Three-dimensional Memory Array Including Self-aligned Dielectric Pillar Structures And Methods Of Making The Same App 20200295032 - Tobioka; Akihiro	2020-09-17
Three-dimensional Memory Array Including Self-aligneddielectric Pillar Structures And Methods Of Making The Same. App 20200295040 - Tobioka; Akihiro	2020-09-17
Reticle with reduced transmission regions for detecting a defocus condition in a lithography process Grant 10,274,841 - Tobioka	2019-04-30
Reticle With Reduced Transmission Regions For Detecting A Defocus Condition In A Lithography Process App 20180024375 - Tobioka; Akihiro	2018-01-25
Reticle with reduced transmission regions for detecting a defocus condition in a lithography process Grant 9,810,916 - Tobioka November 7, 2	2017-11-07
Reticle With Reduced Transmission Regions For Detecting A Defocus Condition In A Lithography Process App 20160370598 - Tobioka; Akihiro	2016-12-22
Self-aligned Process Using Variable-fluidity Material App 20160247674 - Tobioka; Akihiro	2016-08-25
Self-aligned process using variable-fluidity material Grant 9,425,047 - Tobioka August 23, 2	2016-08-23
Method of forming alignment mark App 20050064676 - Tobioka, Akihiro ; et al.	2005-03-24

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