Tobin; Jeff

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tobin; Jeff.The latest application filed is for "apparatus and methods for backside passivation".

Company Profile

0.11.4

Tobin; Jeff - Mountain View CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus And Methods For Backside Passivation App 20180294153 - Hawrylchak; Lara ; et al.	2018-10-11
Apparatus and methods for backside passivation Grant 10,020,187 - Hawrylchak , et al. July 10, 2	2018-07-10
Injector For Spatially Separated Atomic Layer Deposition Chamber App 20160215392 - Yudovsky; Joseph ; et al.	2016-07-28
Apparatus And Methods For Backside Passivation App 20140147990 - Hawrylchak; Lara ; et al.	2014-05-29
Sequential deposition/anneal film densification method Grant 7,790,633 - Tarafdar , et al. September 7, 2	2010-09-07
Conformal nanolaminate dielectric deposition and etch bag gap fill process Grant 7,482,247 - Papasouliotis , et al. January 27, 2	2009-01-27
Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition Grant 7,297,608 - Papasouliotis , et al. November 20, 2	2007-11-20
Methods for the use of alkoxysilanol precursors for vapor deposition of SiO.sub.2 films Grant 7,294,583 - Rulkens , et al. November 13, 2	2007-11-13
Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry Grant 7,271,112 - Papasouliotis , et al. September 18, 2	2007-09-18
Dynamic rapid vapor deposition process for conformal silica laminates Grant 7,223,707 - Papasouliotis , et al. May 29, 2	2007-05-29
Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer Grant 7,202,185 - Hausmann , et al. April 10, 2	2007-04-10
Sequential deposition/anneal film densification method Grant 7,148,155 - Tarafdar , et al. December 12, 2	2006-12-12
Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO.sub.2 films Grant 7,097,878 - Rulkens , et al. August 29, 2	2006-08-29

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