To; Bang N.
Patent Applications and Registrations
Patent applications and USPTO patent grants for To; Bang N..The latest application filed is for "wet clean process for removing cxhyfz etch residue".
- To; Bang N. - Yorktown Heights NY
- To; Bang N. - Millwood NY
| Patent | Date |
|---|---|
| Wet clean process for removing C.sub.xH.sub.yF.sub.z etch residue Grant 10,167,443 - Bruce , et al. J | 2019-01-01 |
| Etch rate enhancement for a silicon etch process through etch chamber pretreatment Grant 9,711,365 - Joseph , et al. July 18, 2 | 2017-07-18 |
| WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE App 20170044470 - Bruce; Robert L. ; et al. | 2017-02-16 |
| Wet clean process for removing C.sub.xH.sub.yF.sub.z etch residue Grant 9,536,731 - Bruce , et al. January 3, 2 | 2017-01-03 |
| Etch Rate Enhancement For A Silicon Etch Process Throuh Etch Chamber Pretreatment App 20150318182 - Joseph; Eric A. ; et al. | 2015-11-05 |
| Sidewall image transfer for heavy metal patterning in integrated circuits Grant 9,171,796 - Brink , et al. October 27, 2 | 2015-10-27 |
| WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE App 20150118839 - Bruce; Robert L. ; et al. | 2015-04-30 |
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