Timmermans; Marina
Patent Applications and Registrations
Patent applications and USPTO patent grants for Timmermans; Marina.The latest application filed is for "method for forming an extreme ultraviolet lithography pellicle".
- Timmermans; Marina - Bertem BE
| Patent | Date |
|---|---|
| Lithography scanner Grant 11,181,818 - Gallagher , et al. November 23, 2 | 2021-11-23 |
| Induced stress for EUV pellicle tensioning Grant 11,163,229 - Mariano Juste , et al. November 2, 2 | 2021-11-02 |
| Method for forming a pellicle Grant 11,092,886 - Timmermans , et al. August 17, 2 | 2021-08-17 |
| Method for Forming an Extreme Ultraviolet Lithography Pellicle App 20210191255 - Timmermans; Marina ; et al. | 2021-06-24 |
| Method for forming a carbon nanotube pellicle membrane Grant 10,712,659 - Gallagher , et al. | 2020-07-14 |
| Lithography Scanner App 20200209737 - Gallagher; Emily ; et al. | 2020-07-02 |
| Induced Stress for EUV Pellicle Tensioning App 20200201169 - Mariano Juste; Marina ; et al. | 2020-06-25 |
| Method for Forming a Carbon Nanotube Pellicle Membrane App 20180329289 - Gallagher; Emily ; et al. | 2018-11-15 |
| Method for Forming a Pellicle App 20180329291 - Timmermans; Marina ; et al. | 2018-11-15 |
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