Tillocher; Thomas
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tillocher; Thomas.The latest application filed is for "selective etching with fluorine, oxygen and noble gas containing plasmas".
- Tillocher; Thomas - Orleans FR
- Tillocher; Thomas - Olivet FR
| Patent | Date |
|---|---|
| Selective Etching with Fluorine, Oxygen and Noble Gas Containing Plasmas App 20220199418 - Zhang; Du ; et al. | 2022-06-23 |
| Etching Method And Etching Apparatus App 20220102160 - TAHARA; Shigeru ; et al. | 2022-03-31 |
| Plasma etching method Grant 11,120,999 - Yatsuda , et al. September 14, 2 | 2021-09-14 |
| Method Of Etching Porous Film App 20200395221 - TAHARA; Shigeru ; et al. | 2020-12-17 |
| Plasma Etching Method App 20200381264 - YATSUDA; Koichi ; et al. | 2020-12-03 |
| Deep anisotropic silicon etch method Grant 8,012,365 - Dussart , et al. September 6, 2 | 2011-09-06 |
| Deep anisotropic silicon etch method App 20080293250 - Dussart; Remi ; et al. | 2008-11-27 |
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