| Patent | Date |
|---|
Optical Sensor for Inspecting Pattern Collapse Defects
App 20220139743 - MALEEV; Ivan ; et al. | 2022-05-05 |
Normal-incidence In-situ Process Monitor Sensor
App 20210193444 - MENG; Ching Ling ; et al. | 2021-06-24 |
Normal-incident in-situ process monitor sensor
Grant 10,978,278 - Meng , et al. April 13, 2 | 2021-04-13 |
Synthetic Wavelengths For Endpoint Detection In Plasma Etching
App 20210057195 - CHEN; Yan ; et al. | 2021-02-25 |
Synthetic wavelengths for endpoint detection in plasma etching
Grant 10,910,201 - Chen , et al. February 2, 2 | 2021-02-02 |
Optical Diagnostics of Semiconductor Process Using Hyperspectral Imaging
App 20200372629 - Chen; Yan ; et al. | 2020-11-26 |
Optical Diagnostics of Semiconductor Process Using Hyperspectral Imaging
App 20200373210 - Chen; Yan ; et al. | 2020-11-26 |
Optical sensor for phase determination
Grant 10,837,902 - Maleev , et al. November 17, 2 | 2020-11-17 |
Enhanced Resolution In Semiconductor Fabrication Data Acquisition Instruments Using Machine Learning
App 20200292388 - CHEN; Yan ; et al. | 2020-09-17 |
Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
Grant 10,692,705 - Mihaylov , et al. | 2020-06-23 |
Normal-incident In-situ Process Monitor Sensor
App 20200043710 - Meng; Ching Ling ; et al. | 2020-02-06 |
Endpoint detection algorithm for atomic layer etching (ALE)
Grant 10,453,653 - Chen , et al. Oc | 2019-10-22 |
Dark field wafer nano-defect inspection system with a singular beam
Grant 10,345,246 - Tian , et al. July 9, 2 | 2019-07-09 |
Optical Sensor For Phase Determination
App 20190056320 - MALEEV; Ivan ; et al. | 2019-02-21 |
Advanced Optical Sensor, System, And Methodologies For Etch Processing Monitoring
App 20180286643 - TUITJE; Holger ; et al. | 2018-10-04 |
Endpoint Detection Algorithm For Atomic Layer Etching (ale)
App 20180068831 - Chen; Yan ; et al. | 2018-03-08 |
Dark Field Wafer Nano-defect Inspection System With A Singular Beam
App 20170350826 - TIAN; Xinkang ; et al. | 2017-12-07 |
Advanced Optical Sensor And Method For Plasma Chamber
App 20170140905 - Mihaylov; Mihail ; et al. | 2017-05-18 |
System for in-situ film stack measurement during etching and etch control method
Grant 9,059,038 - Li , et al. June 16, 2 | 2015-06-16 |
System For In-situ Film Stack Measurement During Etching And Etch Control Method
App 20140024143 - LI; Shifang ; et al. | 2014-01-23 |
Etch process control using optical metrology and sensor devices
Grant 8,193,007 - Madriaga , et al. June 5, 2 | 2012-06-05 |
Etch stage measurement system
Grant 8,173,451 - Tian , et al. May 8, 2 | 2012-05-08 |
Method of designing an etch stage measurement system
Grant 8,173,450 - Tian , et al. May 8, 2 | 2012-05-08 |
Controlling angle of incidence of multiple-beam optical metrology tools
Grant 8,030,632 - Norton , et al. October 4, 2 | 2011-10-04 |
Apparatus for controlling angle of incidence of multiple illumination beams
Grant 8,030,631 - Norton , et al. October 4, 2 | 2011-10-04 |
Auto focus of a workpiece using two or more focus parameters
Grant 7,948,630 - Adam , et al. May 24, 2 | 2011-05-24 |
Controlling Angle Of Incidence Of Multiple- Beam Optical Metrology Tools
App 20100243860 - Norton; Adam ; et al. | 2010-09-30 |
Apparatus For Controlling Angle Of Incidence Of Multiple Illumination Beams
App 20100243859 - NORTON; ADAM ; et al. | 2010-09-30 |
Automated process control using an optical metrology system optimized with design goals
Grant 7,761,178 - Tian , et al. July 20, 2 | 2010-07-20 |
Optical metrology system optimized with design goals
Grant 7,761,250 - Tian , et al. July 20, 2 | 2010-07-20 |
Designing an optical metrology system optimized with signal criteria
Grant 7,742,889 - Tian , et al. June 22, 2 | 2010-06-22 |
Apparatus for designing an optical metrology system optimized with signal criteria
Grant 7,734,437 - Tian , et al. June 8, 2 | 2010-06-08 |
Auto Focus Of A Workpiece Using Two Or More Focus Parameters
App 20100085576 - NORTON; ADAM ; et al. | 2010-04-08 |
Apparatus for auto focusing a workpiece using two or more focus parameters
Grant 7,660,696 - Norton , et al. February 9, 2 | 2010-02-09 |
Automated Process Control Using An Optical Metrology System Optimized With Design Goals
App 20090319075 - TIAN; XINKANG ; et al. | 2009-12-24 |
Optical Metrology System Optimized With Design Goals
App 20090319214 - TIAN; XINKANG ; et al. | 2009-12-24 |
Apparatus For Designing An Optical Metrology System Optimized With Signal Criteria
App 20090248340 - TIAN; XINKANG ; et al. | 2009-10-01 |
Designing An Optical Metrology System Optimized With Signal Criteria
App 20090248339 - TIAN; XINKANG ; et al. | 2009-10-01 |
Process Control Using An Optical Metrology System Optimized With Signal Criteria
App 20090248341 - TIAN; XINKANG ; et al. | 2009-10-01 |
Optical metrology system optimized with a plurality of design goals
Grant 7,595,869 - Tian , et al. September 29, 2 | 2009-09-29 |
Apparatus For Designing An Optical Metrology System Optimized For Operating Time Budget
App 20090240537 - TIAN; XINKANG ; et al. | 2009-09-24 |
Method Of Designing An Optical Metrology System Optimized For Operating Time Budget
App 20090234687 - TIAN; XINKANG ; et al. | 2009-09-17 |
Process control using an optical metrology system optimized with signal criteria
Grant 7,589,845 - Tian , et al. September 15, 2 | 2009-09-15 |
Pattern recognition matching for bright field imaging of low contrast semiconductor devices
Grant 7,538,868 - Shen , et al. May 26, 2 | 2009-05-26 |
Pattern recognition matching for bright field imaging of low contrast semiconductor devices
App 20070139645 - Shen; Wei-Ning ; et al. | 2007-06-21 |
| 