| Patent | Date |
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Light Projection Method And Light Projection Device
App 20220090914 - YIN; Xiaodong ; et al. | 2022-03-24 |
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
Grant 11,036,126 - Lin , et al. June 15, 2 | 2021-06-15 |
Near-eye Optical Imaging System, Near-eye Display Device And Head-mounted Display Device
App 20200225487 - HUANG; Zhengyu ; et al. | 2020-07-16 |
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
Grant 10,585,346 - Lin , et al. | 2020-03-10 |
Semiconductor Fabrication Design Rule Loophole Checking For Design For Manufacturability Optimization
App 20190294039 - LIN; CHIEH-YU ; et al. | 2019-09-26 |
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
Grant 10,394,116 - Lin , et al. A | 2019-08-27 |
Semiconductor Fabrication Design Rule Loophole Checking For Design For Manufacturability Optimization
App 20190072845 - LIN; CHIEH-YU ; et al. | 2019-03-07 |
Semiconductor Fabrication Design Rule Loophole Checking For Design For Manufacturability Optimization
App 20190072846 - LIN; CHIEH-YU ; et al. | 2019-03-07 |
Method and program product for designing source and mask for lithography
Grant 9,857,676 - Inoue , et al. January 2, 2 | 2018-01-02 |
Dummy gate structure for electrical isolation of a fin DRAM
Grant 9,741,722 - Barth, Jr. , et al. August 22, 2 | 2017-08-22 |
Source, target and mask optimization by incorporating contour based assessments and integration over process variations
Grant 9,651,856 - Inoue , et al. May 16, 2 | 2017-05-16 |
Dummy gate structure for electrical isolation of a fin DRAM
Grant 9,564,445 - Barth, Jr. , et al. February 7, 2 | 2017-02-07 |
Synthesizing low mask error enhancement factor lithography solutions
Grant 9,395,622 - Inoue , et al. July 19, 2 | 2016-07-19 |
Source, Target And Mask Optimization By Incorporating Contour Based Assessments And Integration Over Process Variations
App 20160109795 - INOUE; TADANOBU ; et al. | 2016-04-21 |
Method And Program Product For Designing Source And Mask For Lithography
App 20160103389 - Inoue; Tadanobu ; et al. | 2016-04-14 |
Source, target and mask optimization by incorporating countour based assessments and integration over process variations
Grant 9,250,535 - Inoue , et al. February 2, 2 | 2016-02-02 |
Dummy Gate Structure For Electrical Isolation Of A Fin Dram
App 20160027789 - Barth, JR.; John E. ; et al. | 2016-01-28 |
High density field effect transistor design including a broken gate line
Grant 9,117,051 - Lin , et al. August 25, 2 | 2015-08-25 |
Synthesizing Low Mask Error Enhancement Factor Lithography Solutions
App 20150234970 - Inoue; Tadanobu ; et al. | 2015-08-20 |
Dummy Gate Structure For Electrical Isolation Of A Fin Dram
App 20150206885 - Barth, Jr.; John E. ; et al. | 2015-07-23 |
High Density Field Effect Transistor Design Including A Broken Gate Line
App 20150111367 - Lin; Chieh-yu ; et al. | 2015-04-23 |
Mask design method, program, and mask design system
Grant 8,959,462 - Inoue , et al. February 17, 2 | 2015-02-17 |
Source-mask optimization for a lithography process
Grant 8,954,898 - Inoue , et al. February 10, 2 | 2015-02-10 |
Analyzing a patterning process using a model of yield
Grant 8,880,382 - Bagheri , et al. November 4, 2 | 2014-11-04 |
Source-mask Optimization For A Lithography Process
App 20140282291 - Inoue; Tadanobu ; et al. | 2014-09-18 |
Source, Target And Mask Optimization By Incorporating Countour Based Assessments And Integration Over Process Variations
App 20140268075 - Inoue; Tadanobu ; et al. | 2014-09-18 |
Optimizing lithographic mask for manufacturability in efficient manner
Grant 8,719,735 - Sakamoto , et al. May 6, 2 | 2014-05-06 |
Analyzing a patterning process using a model of yield
Grant 8,682,634 - Bagheri , et al. March 25, 2 | 2014-03-25 |
Constrained optimization of lithographic source intensities under contingent requirements
Grant 8,605,254 - Bagheri , et al. December 10, 2 | 2013-12-10 |
Mask Design Method, Program, And Mask Design System
App 20130263063 - Inoue; Tadanobu ; et al. | 2013-10-03 |
System and method for projection lithography with immersed image-aligned diffractive element
Grant 8,537,444 - Gil , et al. September 17, 2 | 2013-09-17 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
Grant 8,539,390 - Inoue , et al. September 17, 2 | 2013-09-17 |
Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
Grant 8,495,528 - Bagheri , et al. July 23, 2 | 2013-07-23 |
Analyzing A Patterning Process Using A Model Of Yield
App 20130185046 - Bagheri; Saeed ; et al. | 2013-07-18 |
Analyzing A Patterning Process Using A Model Of Yield
App 20130185045 - BAGHERI; Saeed ; et al. | 2013-07-18 |
Wavefront engineering of mask data for semiconductor device design
Grant 8,453,076 - Inoue , et al. May 28, 2 | 2013-05-28 |
Fracturing continuous photolithography masks
Grant 8,448,098 - Liu , et al. May 21, 2 | 2013-05-21 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element
App 20130071774 - Gil; Dario ; et al. | 2013-03-21 |
Method for optimizing source and mask to control line width roughness and image log slope
Grant 8,372,565 - Tian , et al. February 12, 2 | 2013-02-12 |
Optimizing lithographic mask for manufacturability in efficient manner
App 20130019211 - Sakamoto; Masaharu ; et al. | 2013-01-17 |
Method to match exposure tools using a programmable illuminator
Grant 8,351,037 - Azpiroz , et al. January 8, 2 | 2013-01-08 |
Dynamic provisional decomposition of lithographic patterns having different interaction ranges
Grant 8,266,554 - Bagheri , et al. September 11, 2 | 2012-09-11 |
Fracturing continuous photolithography masks
Grant 8,266,556 - Liu , et al. September 11, 2 | 2012-09-11 |
Fracturing Continuous Photolithography Masks
App 20120210281 - LIU; YING ; et al. | 2012-08-16 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
App 20120196210 - Inoue; Tadanobu ; et al. | 2012-08-02 |
Method for fast estimation of lithographic binding patterns in an integrated circuit layout
Grant 8,234,603 - Bagheri , et al. July 31, 2 | 2012-07-31 |
Method For Generating A Plurality Of Optimized Wavefronts For A Multiple Exposure Lithographic Process
App 20120077130 - Bagheri; Saeed ; et al. | 2012-03-29 |
Method For Optimizing Source And Mask To Control Line Width Roughness And Image Log Slope
App 20120052418 - Tian; Kehan ; et al. | 2012-03-01 |
Dynamic Provisional Decomposition Of Lithographic Patterns Having Different Interaction Ranges
App 20120047471 - Bagheri; Saeed ; et al. | 2012-02-23 |
Fracturing Continuous Photolithography Masks
App 20120036487 - LIU; YING ; et al. | 2012-02-09 |
Method For Fast Estimation Of Lithographic Binding Patterns In An Integrated Circuit Layout
App 20120017194 - Bagheri; Saeed ; et al. | 2012-01-19 |
Method To Match Exposure Tools Using A Programmable Illuminator
App 20120008134 - Azpiroz; Jaione Tirapu ; et al. | 2012-01-12 |
Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge
Grant 8,059,885 - Tirapu-Azpiroz , et al. November 15, 2 | 2011-11-15 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask
Grant 8,056,023 - Inoue , et al. November 8, 2 | 2011-11-08 |
Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask
Grant 8,056,026 - Inoue , et al. November 8, 2 | 2011-11-08 |
Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale
Grant 8,028,254 - Inoue , et al. September 27, 2 | 2011-09-27 |
Wavefront engineering of mask data for semiconductor device design
App 20110231803 - Inoue; Tadanobu ; et al. | 2011-09-22 |
Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images
Grant 7,969,554 - Melville , et al. June 28, 2 | 2011-06-28 |
High contrast lithographic masks
Grant 7,944,545 - Bagheri , et al. May 17, 2 | 2011-05-17 |
Constrained Optimization Of Lithographic Source Intensities Under Contingent Requirements
App 20110096313 - Bagheri; Saeed ; et al. | 2011-04-28 |
High Contrast Lithographic Masks
App 20100283982 - Bagheri; Saeed ; et al. | 2010-11-11 |
Determining Manufacturability Of Lithographic Mask Using Continuous Derivatives Characterizing The Manufacturability On A Continuous Scale
App 20100153903 - Inoue; Tadanobu ; et al. | 2010-06-17 |
Determining Manufacturability Of Lithographic Mask By Selecting Target Edge Pairs Used In Determining A Manufacturing Penalty Of The Lithographic Mask
App 20100153902 - Inoue; Tadanobu ; et al. | 2010-06-17 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask
App 20100153901 - Inoue; Tadanobu ; et al. | 2010-06-17 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element
App 20100003605 - Gil; Dario ; et al. | 2010-01-07 |
Calculating Image Intensity Of Mask By Decomposing Manhattan Polygon Based On Parallel Edge
App 20090185740 - Tirapu-Azpiroz; Jaione ; et al. | 2009-07-23 |
Method, Computer Program, Apparatus and System Providing Printing for an Illumination Mask for Three-Dimensional Images
App 20090021718 - Melville; David O. S. ; et al. | 2009-01-22 |
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