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name:-0.024816989898682
name:-0.021387100219727
name:-0.00062417984008789
THOMPSON; JEFFERY SCOTT Patent Filings

THOMPSON; JEFFERY SCOTT

Patent Applications and Registrations

Patent applications and USPTO patent grants for THOMPSON; JEFFERY SCOTT.The latest application filed is for "process for making titanium compounds".

Company Profile
0.18.26
  • THOMPSON; JEFFERY SCOTT - West Chester PA
  • Thompson; Jeffery Scott - Wilmington DE
  • Thompson; Jeffery Scott - US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Process For Making Titanium Compounds
App 20140363366 - THOMPSON; JEFFERY SCOTT
2014-12-11
Process for inhibiting oxide formation on copper surfaces
Grant 8,298,610 - Thompson October 30, 2
2012-10-30
Process For Inhibiting Oxide Formation On Copper Surfaces
App 20120160266 - THOMPSON; Jeffery Scott
2012-06-28
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 8,110,382 - DiCosimo , et al. February 7, 2
2012-02-07
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 8,084,238 - DiCosimo , et al. December 27, 2
2011-12-27
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 8,071,343 - DiCosimo , et al. December 6, 2
2011-12-06
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 8,008,052 - DiCosimo , et al. August 30, 2
2011-08-30
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 7,939,303 - DiCosimo , et al. May 10, 2
2011-05-10
Process For Inhibiting Oxide Formation On Copper Surfaces
App 20110045203 - Grovola; Michael Joseph ;   et al.
2011-02-24
Process For Inhibiting Oxide Formation On Copper Surfaces
App 20100215841 - Thompson; Jeffery Scott
2010-08-26
Atomic layer deposition of metal-containing films using surface-activating agents
Grant 7,776,394 - Thompson August 17, 2
2010-08-17
Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
Grant 7,759,508 - Bradley , et al. July 20, 2
2010-07-20
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 7,741,083 - DiCosimo , et al. June 22, 2
2010-06-22
Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
Grant 7,736,697 - Thompson , et al. June 15, 2
2010-06-15
Enzymatic production of glycolic acid
Grant 7,638,617 - DiCosimo , et al. December 29, 2
2009-12-29
Atomic layer deposition processes for the formation of ruthenium films, and ruthenium precursors useful in such processes
Grant 7,632,351 - Thompson December 15, 2
2009-12-15
Copper (II) complexes for deposition of copper films by atomic layer deposition
Grant 7,619,107 - Bradley , et al. November 17, 2
2009-11-17
Atomic layer deposition of copper using surface-activation agents
Grant 7,604,840 - Thompson October 20, 2
2009-10-20
Enzymatic Production Of Glycolic Acid
App 20090035841 - DiCosimo; Robert ;   et al.
2009-02-05
Process For Producing Glycolic Acid From Formaldehyde And Hydrogen Cyanide
App 20090011482 - DiCosimo; Robert ;   et al.
2009-01-08
Process For Producing Glycolic Acid From Formaldehyde and Hydrogen Cyanide
App 20090004709 - DiCosimo; Robert ;   et al.
2009-01-01
Process For Producing Glycolic Acid From Formaldehyde And Hydrogen Cyanide
App 20090004711 - DiCosimo; Robert ;   et al.
2009-01-01
Process For Producing Glycolic Acid From Formaldehyde And Hydrogen Cyanide
App 20090004710 - DiCosimo; Robert ;   et al.
2009-01-01
Process for Producing Glycolic Acid from Formaldehyde And Hydrogen Cyanide
App 20090004707 - DiCosimo; Robert ;   et al.
2009-01-01
Process For Producing Glycolic Acid From Formaldehyde And Hydrogen Cyanide
App 20090004708 - DiCosimo; Robert ;   et al.
2009-01-01
Copper (I) Complexes for Deposition of Copper Films by Atomic Layer Deposition
App 20080299322 - Alexander Zak; Bradley ;   et al.
2008-12-04
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
Grant 7,445,917 - DiCosimo , et al. November 4, 2
2008-11-04
Volatile Copper(1) Complexes And Processes For Deposition Of Copper Films By Atomic Layer Deposition
App 20080063882 - Bradley; Alexander Zak ;   et al.
2008-03-13
Copper (II) Complexes for Deposition of Copper Films by Atomic Layer Deposition
App 20080044687 - Bradley; Alexander Zak ;   et al.
2008-02-21
Enzymatic production of Glycolic acid
App 20070178556 - DiCosimo; Robert ;   et al.
2007-08-02
Composition comprising amino-imine compounds
Grant 7,186,835 - Bradley , et al. March 6, 2
2007-03-06
Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
App 20070036894 - Thompson; Jeffery Scott ;   et al.
2007-02-15
Atomic layer deposition of metal-containing films using surface-activating agents
App 20070037391 - Thompson; Jeffery Scott
2007-02-15
Atomic layer deposition of ruthenium-containing films using surface-activating agents and novel ruthenium complexes
App 20070037392 - Thompson; Jeffery Scott
2007-02-15
Process for producing glycolic acid from formaldehyde and hydrogen cyanide
App 20060247467 - DiCosimo; Robert ;   et al.
2006-11-02
Valatime copper (II) complexes and reducing agents for deposition of copper films by atomic layer deposition
App 20060237718 - Bradley; Alexander Zax ;   et al.
2006-10-26
Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
App 20060182884 - Bradley; Alexander Zak ;   et al.
2006-08-17
Atomic layer deposition of copper using surface-activation agents
App 20060134331 - Thompson; Jeffery Scott
2006-06-22
Method of copper deposition from a supercritical fluid solution containing copper (I) complexes with monoanionic bidentate and neutral monodentate ligands
App 20060099343 - Thompson; Jeffery Scott ;   et al.
2006-05-11
Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition
App 20050158479 - Bradley, Alexander Zak ;   et al.
2005-07-21
Volatile copper (II) complexes and reducing agents for deposition of copper films by atomic layer deposition
App 20050107283 - Bradley, Alexander Zak ;   et al.
2005-05-19
Copper deposition using copper formate complexes
Grant 6,770,122 - Thompson August 3, 2
2004-08-03
Copper deposition using copper formate complexes
App 20030165623 - Thompson, Jeffery Scott
2003-09-04
Method for precipitating a solid phase of metal
Grant 5,730,873 - Hapka , et al. March 24, 1
1998-03-24

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