loadpatents
Patent applications and USPTO patent grants for Thiyagarajan; Muthiah.The latest application filed is for "polymer compositions and articles coated therewith".
Patent | Date |
---|---|
Polymer Compositions And Products Formed Therewith App 20210189106 - Thiyagarajan; Muthiah ;   et al. | 2021-06-24 |
Polymer Compositions And Articles Coated Therewith App 20210189103 - Toliver; Jon ;   et al. | 2021-06-24 |
Polymer Compositions And Products Formed Therewith App 20210189104 - Thiyagarajan; Muthiah ;   et al. | 2021-06-24 |
Composition comprising a polymeric thermal acid generator and processes thereof Grant 9,291,909 - Wu , et al. March 22, 2 | 2016-03-22 |
Methods and materials for removing metals in block copolymers Grant 9,040,659 - Yin , et al. May 26, 2 | 2015-05-26 |
Composition Comprising A Polymeric Thermal Acid Generator And Processes Thereof App 20140342290 - WU; Hengpeng ;   et al. | 2014-11-20 |
Methods And Materials For Removing Metals In Block Copolymers App 20140151330 - YIN; Jian ;   et al. | 2014-06-05 |
Methods and materials for removing metals in block copolymers Grant 8,686,109 - Yin , et al. April 1, 2 | 2014-04-01 |
Methods And Materials For Removing Metals In Block Copolymers App 20130233827 - YIN; Jian ;   et al. | 2013-09-12 |
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20120219919 - Thiyagarajan; Muthiah ;   et al. | 2012-08-30 |
Photoresist compositions Grant 8,252,503 - Chakrapani , et al. August 28, 2 | 2012-08-28 |
Composition for coating over a photoresist pattern comprising a lactam Grant 7,923,200 - Thiyagarajan , et al. April 12, 2 | 2011-04-12 |
Photoresist Image-forming Process Using Double Patterning App 20100183851 - Cao; Yi ;   et al. | 2010-07-22 |
Composition for coating over a photoresist pattern Grant 7,745,077 - Thiyagarajan , et al. June 29, 2 | 2010-06-29 |
Composition for Coating over a Photoresist Pattern App 20090317739 - Thiyagarajan; Muthiah ;   et al. | 2009-12-24 |
Photoresist Compositions App 20090053652 - Chakrapani; Srinivasan ;   et al. | 2009-02-26 |
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20080248427 - Thiyagarajan; Muthiah ;   et al. | 2008-10-09 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.