Thiele; Jorg

Patent Applications and Registrations

Patent applications and USPTO patent grants for Thiele; Jorg.The latest application filed is for "transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift mask".

Company Profile

0.6.9

Thiele; Jorg - Munchen DE
Thiele; Jorg - Vaterstetten DE
Thiele; Jorg - Vatersetten DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Set of at least two masks for the projection of structure patterns Grant 7,393,613 - Dettmann , et al. July 1, 2	2008-07-01
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer Grant 7,393,614 - Kohle , et al. July 1, 2	2008-07-01
Lithography mask for imaging of convex structures Grant 7,354,683 - Moukara , et al. April 8, 2	2008-04-08
Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift mask App 20080042171 - Mosler; Sebastian ; et al.	2008-02-21
Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask App 20060190850 - Kohle; Roderick ; et al.	2006-08-24
Method for compensation of the shortening of line ends during the formation of lines on a wafer App 20050196686 - Meyer, Dirk ; et al.	2005-09-08
Method for producing for a mask a mask layout which avoids aberrations App 20050120326 - Semmler, Armin ; et al.	2005-06-02
Lithography mask for imaging of convex structures App 20050095512 - Moukara, Molela ; et al.	2005-05-05
Set of at least two masks for the projection of structure patterns and method for producing the masks App 20040202943 - Dettmann, Wolfgang ; et al.	2004-10-14
Set of masks for the projection of structure patterns onto a semiconductor wafer App 20040197677 - Kohle, Roderick ; et al.	2004-10-07
Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor Grant 6,745,380 - Bodendorf , et al. June 1, 2	2004-06-01
Mask for optical projection systems, and a process for its production Grant 6,692,875 - Fischer , et al. February 17, 2	2004-02-17
Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor App 20030046654 - Bodendorf, Christof Tilmann ; et al.	2003-03-06
Method of producing masks for fabricating semiconductor structures Grant 6,493,865 - Fischer , et al. December 10, 2	2002-12-10
Mask for optical projection systems, and a process for its production App 20020006554 - Fischer, Werner ; et al.	2002-01-17

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.