loadpatents
name:-0.038556814193726
name:-0.035413026809692
name:-0.00048184394836426
Thach; Senh Patent Filings

Thach; Senh

Patent Applications and Registrations

Patent applications and USPTO patent grants for Thach; Senh.The latest application filed is for "real time monitoring with closed loop chucking force control".

Company Profile
0.39.46
  • Thach; Senh - Union City TX
  • Thach; Senh - Saratoga CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High temperature electrostatic chuck bonding adhesive
Grant 11,264,261 - Sun , et al. March 1, 2
2022-03-01
Method of processing a substrate support assembly
Grant 10,557,202 - Boyd, Jr. , et al. Feb
2020-02-11
Real time monitoring with closed loop chucking force control
Grant 10,460,916 - Boyd, Jr. , et al. Oc
2019-10-29
Pixilated cooling, temperature controlled substrate support assembly
Grant 10,403,534 - Parkhe , et al. Sep
2019-09-03
Real Time Monitoring With Closed Loop Chucking Force Control
App 20180330926 - BOYD, JR.; Wendell Glenn ;   et al.
2018-11-15
Electrostatic chuck with external flow adjustments for improved temperature distribution
Grant 10,121,688 - Busche , et al. November 6, 2
2018-11-06
Substrate Support Assembly Having A Plasma Resistant Protective Layer
App 20180151401 - Sun; Jennifer Y. ;   et al.
2018-05-31
Substrate support assembly having a plasma resistant protective layer
Grant 9,916,998 - Sun , et al. March 13, 2
2018-03-13
Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
Grant 9,875,923 - Boyd, Jr. , et al. January 23, 2
2018-01-23
Electrostatic Chuck With External Flow Adjustments For Improved Temperature Distribution
App 20170213754 - Busche; Matthew J. ;   et al.
2017-07-27
Method Of Processing A Substrate Support Assembly
App 20170167018 - BOYD, JR.; Wendell Glen ;   et al.
2017-06-15
Control Systems Employing Deflection Sensors To Control Clamping Forces Applied By Electrostatic Chucks, And Related Methods
App 20170103911 - BOYD, JR.; Wendell ;   et al.
2017-04-13
Electrostatic chuck with external flow adjustments for improved temperature distribution
Grant 9,622,375 - Busche , et al. April 11, 2
2017-04-11
Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
Grant 9,558,981 - Boyd, Jr. , et al. January 31, 2
2017-01-31
High temperature electrostatic chuck bonding adhesive
Grant 9,520,314 - Sun , et al. December 13, 2
2016-12-13
Electrostatic chuck with internal flow adjustments for improved temperature distribution
Grant 9,520,315 - Parkhe , et al. December 13, 2
2016-12-13
Electrostatic Chuck With External Flow Adjustments For Improved Temperature Distribution
App 20150187625 - Busche; Matthew J. ;   et al.
2015-07-02
Electrostatic Chuck With Internal Flow Adjustments For Improved Temperature Distribution
App 20150187626 - Parkhe; Vijay D. ;   et al.
2015-07-02
Pixilated Cooling, Temperature Controlled Substrate Support Assembly
App 20150129165 - PARKHE; Vijay D. ;   et al.
2015-05-14
Single-body electrostatic chuck
Grant 8,941,969 - Thach , et al. January 27, 2
2015-01-27
Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber
Grant 8,871,312 - Sun , et al. October 28, 2
2014-10-28
Single-body Electrostatic Chuck
App 20140177123 - Thach; Senh ;   et al.
2014-06-26
Method of producing a plasma-resistant thermal oxide coating
Grant 8,758,858 - Sun , et al. June 24, 2
2014-06-24
Substrate Support Assembly Having A Plasma Resistant Protective Layer
App 20140154465 - Sun; Jennifer Y. ;   et al.
2014-06-05
High Temperature Electrostatic Chuck With Real-time Heat Zone Regulating Capability
App 20130284374 - LUBOMIRSKY; Dmitry ;   et al.
2013-10-31
Plasma-resistant ceramics with controlled electrical resistivity
Grant 8,367,227 - Sun , et al. February 5, 2
2013-02-05
Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber
App 20130022838 - Sun; Jennifer Y. ;   et al.
2013-01-24
Wet clean process for recovery of anodized chamber parts
Grant 8,231,736 - Sun , et al. July 31, 2
2012-07-31
Plasma resistant coatings for plasma chamber components
Grant 8,206,829 - Sun , et al. June 26, 2
2012-06-26
Method of producing a plasma-resistant thermal oxide coating
App 20120125488 - Sun; Jennifer Y. ;   et al.
2012-05-24
Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating
Grant 8,129,029 - Sun , et al. March 6, 2
2012-03-06
Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
Grant 8,067,067 - Sun , et al. November 29, 2
2011-11-29
Gas Distribution Showerhead With Coating Material For Semiconductor Processing
App 20110198034 - Sun; Jennifer ;   et al.
2011-08-18
High Temperature Electrostatic Chuck Bonding Adhesive
App 20100156054 - Sun; Jennifer Y. ;   et al.
2010-06-24
Filled Polymer Composition For Etch Chamber Component
App 20100140222 - Sun; Jennifer Y. ;   et al.
2010-06-10
Self-passivating plasma resistant material for joining chamber components
Grant 7,718,029 - Sun , et al. May 18, 2
2010-05-18
Plasma Resistant Coatings For Plasma Chamber Components
App 20100119843 - SUN; JENNIFER Y. ;   et al.
2010-05-13
Ceramic coating comprising yttrium which is resistant to a reducing plasma
App 20090214825 - Sun; Jennifer Y. ;   et al.
2009-08-27
Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components
App 20090162647 - Sun; Jennifer Y. ;   et al.
2009-06-25
Corrosion-resistant gas distribution plate for plasma processing chamber
App 20090087615 - Sun; Jennifer Y. ;   et al.
2009-04-02
Wet Clean Process For Recovery Of Anodized Chamber Parts
App 20090056745 - SUN; JENNIFER Y. ;   et al.
2009-03-05
Plasma-resistant ceramics with controlled electrical resistivity
App 20090036292 - Sun; Jennifer Y. ;   et al.
2009-02-05
Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
Grant 7,479,304 - Sun , et al. January 20, 2
2009-01-20
Low temperature aerosol deposition of a plasma resistive layer
Grant 7,479,464 - Sun , et al. January 20, 2
2009-01-20
Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
App 20080213496 - Sun; Jennifer Y. ;   et al.
2008-09-04
Low Temperature Aerosol Deposition Of A Plasma Resistive Layer
App 20080108225 - SUN; JENNIFER Y. ;   et al.
2008-05-08
Self-passivating Plasma Resistant Material For Joining Chamber Components
App 20080029211 - SUN; JENNIFER Y. ;   et al.
2008-02-07
Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
Grant 7,220,937 - Hofman , et al. May 22, 2
2007-05-22
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures
Grant 7,055,732 - Thach , et al. June 6, 2
2006-06-06
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus
Grant 7,048,814 - Lin , et al. May 23, 2
2006-05-23
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus
Grant 7,033,447 - Lin , et al. April 25, 2
2006-04-25
System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
Grant 6,949,203 - Hsieh , et al. September 27, 2
2005-09-27
Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
App 20050056218 - Sun, Jennifer Y. ;   et al.
2005-03-17
Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
App 20050037193 - Sun, Jennifer Y. ;   et al.
2005-02-17
Process kit for erosion resistance enhancement
App 20050016684 - Sun, Jennifer Y. ;   et al.
2005-01-27
Electrochemically roughened aluminum semiconductor chamber surfaces
App 20040224171 - Sun, Jennifer Y. ;   et al.
2004-11-11
Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber
Grant 6,795,292 - Grimard , et al. September 21, 2
2004-09-21
Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers
Grant 6,776,873 - Sun , et al. August 17, 2
2004-08-17
Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
App 20040149699 - Hofman, Daniel J. ;   et al.
2004-08-05
High temperature electrical connector
Grant 6,736,668 - Kholodenko , et al. May 18, 2
2004-05-18
Actively-controlled electrostatic chuck heater
App 20040081439 - Kholodenko, Arnold ;   et al.
2004-04-29
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures
App 20040041004 - Thach, Senh ;   et al.
2004-03-04
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus
Grant 6,659,331 - Thach , et al. December 9, 2
2003-12-09
Halogen-resistant, anodized aluminium for use in semiconductor processing apparatus
App 20030205479 - Lin, Yixing ;   et al.
2003-11-06
Plasma processing chamber having magnetic assembly and method
App 20030192646 - Wu, Robert W. ;   et al.
2003-10-16
System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
App 20030164354 - Hsieh, Chang-Lin ;   et al.
2003-09-04
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus
App 20030160085 - Thach, Senh ;   et al.
2003-08-28
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus
App 20030150530 - Lin, Yixing ;   et al.
2003-08-14
Electrochemically roughened aluminum semiconductor processing apparatus surfaces
App 20030047464 - Sun, Jennifer Y. ;   et al.
2003-03-13
Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber
App 20020171994 - Grimard, Dennis ;   et al.
2002-11-21
Method and apparatus for thermal control of a semiconductor substrate
Grant 6,466,426 - Mok , et al. October 15, 2
2002-10-15
Connectors For An Eletrostatic Chuck
App 20020022403 - CHENG, WING L. ;   et al.
2002-02-21
Method of fabricating a semiconductor wafer support chuck apparatus having small diameter gas distribution ports for distributing a heat transfer gas
App 20010024349 - Shamoulian, Shamouil ;   et al.
2001-09-27
Connectors for an electrostatic chuck and combination thereof
Grant 6,151,203 - Shamouilian , et al. November 21, 2
2000-11-21

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