| Patent | Date |
|---|
Moisture barrier capacitors in semiconductor components
Grant 9,786,733 - Barth , et al. October 10, 2 | 2017-10-10 |
Strained semiconductor device and method of making the same
Grant 9,559,204 - Tews , et al. January 31, 2 | 2017-01-31 |
Methods for producing a tunnel field-effect transistor
Grant 9,390,975 - Kakoschke , et al. July 12, 2 | 2016-07-12 |
Moisture Barrier Capacitors in Semiconductor Components
App 20150200244 - Barth; Hans-Joachim ; et al. | 2015-07-16 |
Methods for Producing a Tunnel Field-Effect Transistor
App 20150140770 - Kakoschke; Ronald ; et al. | 2015-05-21 |
Strained Semiconductor Device and Method of Making the Same
App 20150123201 - Tews; Helmut Horst ; et al. | 2015-05-07 |
Methods of forming moisture barrier capacitors in semiconductor components
Grant 9,012,297 - Barth , et al. April 21, 2 | 2015-04-21 |
Strained semiconductor device and method of making the same
Grant 8,946,034 - Tews , et al. February 3, 2 | 2015-02-03 |
Strained Semiconductor Device and Method of Making the Same
App 20140077299 - Tews; Helmut Horst ; et al. | 2014-03-20 |
Strained semiconductor device and method of making the same
Grant 8,624,334 - Tews , et al. January 7, 2 | 2014-01-07 |
Capacitor having a plurality of parallel conductive members
Grant 8,569,820 - Barth , et al. October 29, 2 | 2013-10-29 |
Semiconductor Devices and Methods of Manufacture Thereof
App 20120099243 - Barth; Hans-Joachim ; et al. | 2012-04-26 |
Semiconductor devices and methods of manufacture thereof
Grant 8,138,539 - Barth , et al. March 20, 2 | 2012-03-20 |
Strained Semiconductor Device and Method of Making the Same
App 20110278680 - Tews; Helmut Horst ; et al. | 2011-11-17 |
Strained semiconductor device and method of making the same
Grant 8,003,470 - Tews , et al. August 23, 2 | 2011-08-23 |
Moisture Barrier Capacitors in Semiconductor Components
App 20100330771 - Barth; Hans-Joachim ; et al. | 2010-12-30 |
Moisture barrier capacitors in semiconductor components
Grant 7,812,424 - Barth , et al. October 12, 2 | 2010-10-12 |
Method of implanting using a shadow effect
Grant 7,767,562 - Tews , et al. August 3, 2 | 2010-08-03 |
Moisture Barrier Capacitors in Semiconductor Components
App 20090160020 - Barth; Hans-Joachim ; et al. | 2009-06-25 |
Semiconductor Devices and Methods of Manufacture Thereof
App 20090141424 - Barth; Hans-Joachim ; et al. | 2009-06-04 |
Strained semiconductor device and method of making the same
App 20070057324 - Tews; Helmut Horst ; et al. | 2007-03-15 |
Selective etching to increase trench surface area
Grant 7,157,328 - Tews , et al. January 2, 2 | 2007-01-02 |
Selective etching to increase trench surface area
App 20060172486 - Tews; Helmut Horst ; et al. | 2006-08-03 |
Method of implanting using a shadow effect
App 20060024930 - Tews; Helmut Horst ; et al. | 2006-02-02 |
Nitrogen implantation using a shadow effect to control gate oxide thickness in DRAM semiconductor
Grant 6,967,147 - Tews , et al. November 22, 2 | 2005-11-22 |
Sacrificial collar method for improved deep trench processing
Grant 6,905,944 - Chudzik , et al. June 14, 2 | 2005-06-14 |
Sacrificial Collar Method For Improved Deep Trench Processing
App 20040224478 - Chudzik, Michael Patrick ; et al. | 2004-11-11 |
Semiconductor structures and manufacturing methods
App 20040209474 - Tews, Helmut Horst ; et al. | 2004-10-21 |
Process of fabricating DRAM cells with collar isolation layers
Grant 6,797,636 - Tews , et al. September 28, 2 | 2004-09-28 |
Semiconductor structures and manufacturing methods
Grant 6,740,555 - Tews , et al. May 25, 2 | 2004-05-25 |
Vertical hard mask
Grant 6,723,611 - Akatsu , et al. April 20, 2 | 2004-04-20 |
Vertical Hard Mask
App 20040048441 - Akatsu, Hiroyuki ; et al. | 2004-03-11 |
High aspect ratio PBL SiN barrier formation
Grant 6,677,197 - Kudelka , et al. January 13, 2 | 2004-01-13 |
Process flow for two-step collar in DRAM preparation
Grant 6,670,235 - Tews , et al. December 30, 2 | 2003-12-30 |
Process of fabricating dram cells with collar isolation layers
App 20030224605 - Tews, Helmut Horst ; et al. | 2003-12-04 |
Low resistivity deep trench fill for DRAM and EDRAM applications
Grant 6,620,724 - Schroeder , et al. September 16, 2 | 2003-09-16 |
Method for surface roughness enhancement in semiconductor capacitor manufacturing
Grant 6,613,642 - Rahn , et al. September 2, 2 | 2003-09-02 |
Semiconductor structures and manufacturing methods
Grant 6,605,860 - Tews , et al. August 12, 2 | 2003-08-12 |
High aspect ratio PBL SiN barrier formation
App 20030124805 - Kudelka, Stephan ; et al. | 2003-07-03 |
Method For Surface Roughness Enhancement In Semiconductor Capacitor Manufacturing
App 20030114005 - Rahn, Stephen ; et al. | 2003-06-19 |
Process flow for capacitance enhancement in a DRAM trench
Grant 6,555,430 - Chudzik , et al. April 29, 2 | 2003-04-29 |
Process Flow For Sacrificial Collar With Polysilicon Void
App 20030077872 - Tews, Helmut Horst ; et al. | 2003-04-24 |
Process for improving the thickness uniformity of a thin oxide layer in semiconductor wafer fabrication
Grant 6,537,926 - Schrems , et al. March 25, 2 | 2003-03-25 |
Process Flow For Sacrificial Collar Scheme With Vertical Nitride Mask
App 20030036241 - Tews, Helmut Horst | 2003-02-20 |
Integrated circuit trench device with a dielectric collar stack, and method of forming thereof
Grant 6,486,024 - Tews , et al. November 26, 2 | 2002-11-26 |
Plasma doping for DRAM with deep trenches and hemispherical grains
Grant 6,475,859 - Tews , et al. November 5, 2 | 2002-11-05 |
Process flow for sacrificial collar with poly mask
Grant 6,458,647 - Tews , et al. October 1, 2 | 2002-10-01 |
Method of forming a vertically oriented device in an integrated circuit
Grant 6,426,253 - Tews , et al. July 30, 2 | 2002-07-30 |
Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates
Grant 6,362,040 - Tews , et al. March 26, 2 | 2002-03-26 |
Method of forming a hemispherical grained capacitor
Grant 6,159,874 - Tews , et al. December 12, 2 | 2000-12-12 |
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