| Patent | Date |
|---|
Reflective Mask Blank And Reflective Mask
App 20220283492 - MIMURA; Shohei ; et al. | 2022-09-08 |
Reflective Mask Blank, And Method For Manufacturing Thereof
App 20220283491 - TERASAWA; Tsuneo ; et al. | 2022-09-08 |
Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask
Grant 11,415,874 - Terasawa , et al. August 16, 2 | 2022-08-16 |
Substrate With Multilayer Reflection Film For Euv Mask Blank, Manufacturing Method Thereof, And Euv Mask Blank
App 20220075255 - INAZUKI; Yukio ; et al. | 2022-03-10 |
Substrate With Multilayer Reflection Film For Euv Mask Blank, Manufacturing Method Thereof, And Euv Mask Blank
App 20220075254 - INAZUKI; Yukio ; et al. | 2022-03-10 |
Substrate Defect Inspection Method And Substrate Defect Inspection Apparatus
App 20220065797 - TERASAWA; Tsuneo ; et al. | 2022-03-03 |
Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank
App 20210333702 - TERASAWA; Tsuneo ; et al. | 2021-10-28 |
Method Of Manufacturing Reflective Mask Blank, And Reflective Mask Blank
App 20210278759 - INAZUKI; Yukio ; et al. | 2021-09-09 |
Photomask blank and making method
Grant 11,061,319 - Kosaka , et al. July 13, 2 | 2021-07-13 |
Method Of Manufacturing Reflective Mask Blank, Reflective Mask Blank, And Method Of Manufacturing Reflective Mask
App 20210080819 - TERASAWA; Tsuneo ; et al. | 2021-03-18 |
Defect classification method, method of sorting photomask blanks, and method of manufacturing mask blank
Grant 10,488,347 - Terasawa , et al. Nov | 2019-11-26 |
Defect Classification Method, Method Of Sorting Photomask Blanks, And Method Of Manufacturing Mask Blank
App 20190331608 - Terasawa; Tsuneo ; et al. | 2019-10-31 |
Methods for defect inspection, sorting, and manufacturing photomask blank
Grant 10,295,477 - Terasawa , et al. | 2019-05-21 |
Photomask Blank And Making Method
App 20180356721 - KOSAKA; Takuro ; et al. | 2018-12-13 |
Methods For Defect Inspection, Sorting, And Manufacturing Photomask Blank
App 20180209916 - TERASAWA; Tsuneo ; et al. | 2018-07-26 |
Imaging apparatus and imaging method
Grant 9,958,399 - Yamane , et al. May 1, 2 | 2018-05-01 |
Defect inspecting method, sorting method and producing method for photomask blank
Grant 9,829,442 - Terasawa , et al. November 28, 2 | 2017-11-28 |
Defect inspecting method, sorting method, and producing method for photomask blank
Grant 9,829,787 - Terasawa , et al. November 28, 2 | 2017-11-28 |
Evaluation method of defect size of photomask blank, selection method, and manufacturing method
Grant 9,772,551 - Terasawa , et al. September 26, 2 | 2017-09-26 |
Defect Inspecting Method, Sorting Method And Producing Method For Photomask Blank
App 20170068158 - TERASAWA; Tsuneo ; et al. | 2017-03-09 |
Defect Inspecting Method, Sorting Method, And Producing Method For Photomask Blank
App 20160377553 - TERASAWA; Tsuneo ; et al. | 2016-12-29 |
Evaluation Method Of Defect Size Of Photomask Blank, Selection Method, And Manufacturing Method
App 20160116837 - TERASAWA; Tsuneo ; et al. | 2016-04-28 |
Method of inspecting mask, mask inspection device, and method of manufacturing mask
Grant 9,229,314 - Terasawa , et al. January 5, 2 | 2016-01-05 |
Method Of Inspecting Mask, Mask Inspection Device, And Method Of Manufacturing Mask
App 20150253658 - TERASAWA; Tsuneo ; et al. | 2015-09-10 |
Method of inspecting mask, mask inspection device, and method of manufacturing mask
Grant 9,063,098 - Terasawa , et al. June 23, 2 | 2015-06-23 |
Imaging Apparatus And Imaging Method
App 20150138344 - Yamane; Takeshi ; et al. | 2015-05-21 |
Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device
Grant 8,986,913 - Yamane , et al. March 24, 2 | 2015-03-24 |
Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method
Grant 8,912,501 - Yamane , et al. December 16, 2 | 2014-12-16 |
Mask inspection method and mask inspection apparatus
Grant 8,797,524 - Yamane , et al. August 5, 2 | 2014-08-05 |
Mask defect inspection method and defect inspection apparatus
Grant 8,699,783 - Yamane , et al. April 15, 2 | 2014-04-15 |
Optimum Imaging Position Detecting Method, Optimum Imaging Position Detecting Device, Photomask Manufacturing Method, and Semiconductor Device Manufacturing Method
App 20130244143 - YAMANE; Takeshi ; et al. | 2013-09-19 |
Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device
App 20130244142 - YAMANE; Takeshi ; et al. | 2013-09-19 |
Method of inspecting mask pattern and mask pattern inspection apparatus
Grant 8,488,866 - Terasawa , et al. July 16, 2 | 2013-07-16 |
Manufacturing method of semiconductor device and manufacturing method of mask
Grant 8,435,702 - Terasawa , et al. May 7, 2 | 2013-05-07 |
Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device
Grant 8,384,888 - Yamane , et al. February 26, 2 | 2013-02-26 |
Method Of Inspecting Mask, Mask Inspection Device, And Method Of Manufacturing Mask
App 20130017475 - TERASAWA; Tsuneo ; et al. | 2013-01-17 |
Mask Inspection Method And Mask Inspection Apparatus
App 20120224051 - YAMANE; Takeshi ; et al. | 2012-09-06 |
Mask Inspection Method And Mask Inspection Apparatus
App 20120218543 - YAMANE; Takeshi ; et al. | 2012-08-30 |
Mask Defect Inspection Method And Defect Inspection Apparatus
App 20120063667 - YAMANE; Takeshi ; et al. | 2012-03-15 |
Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits
Grant 7,911,600 - Terasawa , et al. March 22, 2 | 2011-03-22 |
Mask Defect Measurement Method, Mask Quality Determination Method, And Manufacturing Method Of Semiconductor Device
App 20110043811 - Yamane; Takeshi ; et al. | 2011-02-24 |
Method Of Inspecting Mask Pattern And Mask Pattern Inspection Apparatus
App 20100208978 - TERASAWA; Tsuneo ; et al. | 2010-08-19 |
Manufacturing Method Of Semiconductor Device And Manufacturing Method Of Mask
App 20100080647 - TERASAWA; Tsuneo ; et al. | 2010-04-01 |
Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same
Grant 7,630,068 - Tanaka , et al. December 8, 2 | 2009-12-08 |
Apparatus And A Method For Inspection Of A Mask Blank, A Method For Manufacturing A Reflective Exposure Mask, A Method For Reflective Exposure, And A Method For Manufacturing Semiconductor Integrated Circuits
App 20090091752 - TERASAWA; Tsuneo ; et al. | 2009-04-09 |
Mask Pattern Designing Method Using Optical Proximity Correction in Optical Lithography, Designing Device, and Semiconductor Device Manufacturing Method Using the Same
App 20080276215 - Higuchi; Tetsuya ; et al. | 2008-11-06 |
Method for designing mask pattern and method for manufacturing semiconductor device
App 20080250383 - Tanaka; Toshihiko ; et al. | 2008-10-09 |
Method and apparatus for circuit pattern inspection
Grant 7,369,703 - Yamaguchi , et al. May 6, 2 | 2008-05-06 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
Grant 7,361,530 - Terasawa , et al. April 22, 2 | 2008-04-22 |
Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same
App 20070188743 - Tanaka; Toshihiko ; et al. | 2007-08-16 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
App 20070155052 - Terasawa; Tsuneo ; et al. | 2007-07-05 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
Grant 7,205,222 - Terasawa , et al. April 17, 2 | 2007-04-17 |
Method for designing mask pattern and method for manufacturing semiconductor device
App 20070074146 - Tanaka; Toshihiko ; et al. | 2007-03-29 |
Method and apparatus for circuit pattern inspection
App 20060269121 - Yamaguchi; Atsuko ; et al. | 2006-11-30 |
Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
Grant 7,125,651 - Hasegawa , et al. October 24, 2 | 2006-10-24 |
Method and apparatus for circuit pattern inspection
Grant 7,095,884 - Yamaguchi , et al. August 22, 2 | 2006-08-22 |
Method of fabrication of semiconductor integrated circuit device and mask fabrication method
App 20060110667 - Hasegawa; Norio ; et al. | 2006-05-25 |
Image input apparatus and inspection apparatus
App 20050196059 - Inoue, Hiromu ; et al. | 2005-09-08 |
Method of producing semiconductor integrated circuit device and method of producing multi-chip module
App 20050112504 - Terasawa, Tsuneo ; et al. | 2005-05-26 |
Method Of Fabricating Semiconductor Integrated Circuit Device And Method Of Producing A Multi-chip Module That Includes Patterning With A Photomask That Uses Metal For Blocking Exposure Light And A Photomask That Uses Organic Resin For Blocking Exposure Light
Grant 6,849,540 - Terasawa , et al. February 1, 2 | 2005-02-01 |
Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
App 20040063037 - Hasegawa, Norio ; et al. | 2004-04-01 |
Semiconductor device and a manufacturing method of the same
Grant 6,709,880 - Yamamoto , et al. March 23, 2 | 2004-03-23 |
Method of manufacturing a photomask
Grant 6,686,099 - Tanaka , et al. February 3, 2 | 2004-02-03 |
Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor
Grant 6,677,107 - Hasegawa , et al. January 13, 2 | 2004-01-13 |
Method of manufacturing a photomask
Grant 6,667,135 - Tanaka , et al. December 23, 2 | 2003-12-23 |
Method of manufacturing a photomask
Grant 6,656,645 - Tanaka , et al. December 2, 2 | 2003-12-02 |
Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate
Grant 6,645,856 - Tanaka , et al. November 11, 2 | 2003-11-11 |
Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 nm
App 20030207521 - Tanaka, Toshihiko ; et al. | 2003-11-06 |
Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM
Grant 6,596,656 - Tanaka , et al. July 22, 2 | 2003-07-22 |
Method of producing semiconductor integrated circuit device and method of producing multi-chip module
App 20030109126 - Terasawa, Tsuneo ; et al. | 2003-06-12 |
Semiconductor device and a manufacturing method of the same
App 20030054580 - Yamamoto, Jiro ; et al. | 2003-03-20 |
Method for manufacturing a semiconductor device
App 20030036293 - Tanaka, Toshihiko ; et al. | 2003-02-20 |
Method and apparatus for circuit pattern inspection
App 20030021463 - Yamaguchi, Atsuko ; et al. | 2003-01-30 |
Fabrication method of semiconductor integrated circuit device and mask fabrication method
App 20020098421 - Hasegawa, Norio ; et al. | 2002-07-25 |
Device manufacturing method, photomask used for the method, and photomask manufacturing method
App 20020081501 - Hasegawa, Norio ; et al. | 2002-06-27 |
Method of manufacturing a semiconductor device
App 20020052122 - Tanaka, Toshihiko ; et al. | 2002-05-02 |
Fabrication method of semiconductor integrated circuit device
App 20020042007 - Miyazaki, Ko ; et al. | 2002-04-11 |
Method of manufacturing a photomask
App 20020028395 - Tanaka, Toshihiko ; et al. | 2002-03-07 |
Method of manufacturing a photomask
App 20020022184 - Tanaka, Toshihiko ; et al. | 2002-02-21 |
Method of manufacturing a photomask
App 20020022185 - Tanaka, Toshihiko ; et al. | 2002-02-21 |
Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices
Grant 5,691,115 - Okamoto , et al. November 25, 1 | 1997-11-25 |
Pattern forming method and projection exposure tool therefor
Grant 5,621,497 - Terasawa , et al. April 15, 1 | 1997-04-15 |
Method of forming a pattern and projection exposure apparatus
Grant 5,595,857 - Fukuda , et al. January 21, 1 | 1997-01-21 |
Methods for measuring optical system, and method and apparatus for exposure using said measuring method
Grant 5,420,436 - Seya , et al. May 30, 1 | 1995-05-30 |
Projection exposure apparatus
Grant 5,418,598 - Fukuda , et al. May 23, 1 | 1995-05-23 |
Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same
Grant 5,408,320 - Katagiri , et al. April 18, 1 | 1995-04-18 |
Projection exposure apparatus and pattern forming method for use therewith
Grant 5,348,837 - Fukuda , et al. September 20, 1 | 1994-09-20 |
Method of forming a pattern
Grant 5,316,896 - Fukuda , et al. May 31, 1 | 1994-05-31 |
Projection type X-ray lithography apparatus
Grant 5,305,364 - Mochiji , et al. April 19, 1 | 1994-04-19 |
Illumination method, illumination apparatus and projection exposure apparatus
Grant 5,302,999 - Oshida , et al. April 12, 1 | 1994-04-12 |
Method of magnetically recording and reading data, magnetic recording medium, its production method and magnetic recording apparatus
Grant 5,296,995 - Yonezawa , et al. March 22, 1 | 1994-03-22 |
Method of and apparatus for detecting defect on photomask
Grant 5,235,400 - Terasawa , et al. August 10, 1 | 1993-08-10 |
X-ray pattern masking by a reflective reduction projection optical system
Grant 5,222,112 - Terasawa , et al. June 22, 1 | 1993-06-22 |
Spectrometer
Grant 4,983,039 - Harada , et al. January 8, 1 | 1991-01-08 |
Chamber plate for use in cell fusion and a process for production thereof
Grant 4,894,343 - Tanaka , et al. January 16, 1 | 1990-01-16 |
Pattern printing method and apparatus
Grant 4,798,470 - Moriyama , et al. January 17, 1 | 1989-01-17 |
Angular velocity and acceleration sensor
Grant 4,750,364 - Kawamura , et al. June 14, 1 | 1988-06-14 |
Pattern detector
Grant 4,614,432 - Kuniyoshi , et al. September 30, 1 | 1986-09-30 |
Pattern detector
Grant 4,597,669 - Terasawa , et al. July 1, 1 | 1986-07-01 |
Automatic focusing apparatus
Grant 4,477,183 - Kawamura , et al. October 16, 1 | 1984-10-16 |
Pattern detecting apparatus
Grant 4,441,206 - Kuniyoshi , et al. April 3, 1 | 1984-04-03 |
| 