TERASAKI; Masato

Patent Applications and Registrations

Patent applications and USPTO patent grants for TERASAKI; Masato.The latest application filed is for "method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium".

Company Profile

7.23.20

TERASAKI; Masato - Toyoma-shi JP
TERASAKI; Masato - TOYAMA JP
TERASAKI; Masato - Toyama-shi JP
Terasaki; Masato - Nakaniikawa-gun JP
Terasaki, Masato - Nakano-ku JP
Terasaki; Masato - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, And Recording Medium App 20220102136 - NODA; Takaaki ; et al.	2022-03-31
Method Of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, And Recording Medium App 20210407774 - IMAMURA; Tomoki ; et al.	2021-12-30
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Grant 10,840,094 - Maeda , et al. November 17, 2	2020-11-17
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium Grant 10,714,336 - Horita , et al.	2020-07-14
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Grant 10,607,833 - Harada , et al.	2020-03-31
Substrate processing apparatus and guide portion Grant 10,513,774 - Terasaki , et al. Dec	2019-12-24
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Grant 10,513,775 - Yamakoshi , et al. Dec	2019-12-24
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medi App 20190214250 - HORITA; Hideki ; et al.	2019-07-11
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium App 20190206679 - MAEDA; Kiyohiko ; et al.	2019-07-04
Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium App 20190127848 - NAGATO; Masaya ; et al.	2019-05-02
Gas Supply Nozzle, Substrate Processing Apparatus, And Non-transitory Computer-readable Recording Medium App 20180363137 - TAKAGI; Kosuke ; et al.	2018-12-20
Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium Grant 10,081,868 - Takagi , et al. September 25, 2	2018-09-25
Method of manufacturing semiconductor device Grant 9,934,960 - Horita , et al. April 3, 2	2018-04-03
Method of manufacturing semiconductor device Grant 9,905,413 - Yamakoshi , et al. February 27, 2	2018-02-27
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium App 20170298508 - YAMAKOSHI; Risa ; et al.	2017-10-19
Method Of Manufacturing Semiconductor Device App 20170178889 - YAMAKOSHI; Risa ; et al.	2017-06-22
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium App 20170170004 - HARADA; Katsuyoshi ; et al.	2017-06-15
Gas Supply Nozzle, Substrate Processing Apparatus, And Non-transitory Computer-readable Recording Medium App 20170051408 - TAKAGI; Kosuke ; et al.	2017-02-23
Return nozzle Grant D773,609 - Morita , et al. December 6, 2	2016-12-06
Return nozzle Grant D771,543 - Morita , et al. November 15, 2	2016-11-15
Return nozzle Grant D771,772 - Morita , et al. November 15, 2	2016-11-15
Substrate Processing Apparatus And Guide Portion App 20160298235 - TERASAKI; Masato ; et al.	2016-10-13
Method of Manufacturing Semiconductor Device App 20160284539 - HORITA; Hideki ; et al.	2016-09-29
Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium Grant 9,401,272 - Terasaki , et al. July 26, 2	2016-07-26
Method of manufacturing semiconductor device, method of processing substrate and non-transitory computer readable recording medium Grant 9,190,264 - Yuasa , et al. November 17, 2	2015-11-17
Reaction tube Grant D739,832 - Yamazaki , et al. September 29, 2	2015-09-29
Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus Grant 9,006,116 - Terasaki April 14, 2	2015-04-14
Reaction tube Grant D725,055 - Yamazaki , et al. March 24, 2	2015-03-24
Reaction tube Grant D720,707 - Yamazaki , et al. January 6, 2	2015-01-06
Reaction tube Grant D719,114 - Yamazaki , et al. December 9, 2	2014-12-09
Substrate Processing Apparatus, Method Of Manufacturing Semiconductor Device, And Non-transitory Computer-readable Recording Medium App 20140357058 - TAKAGI; Kosuke ; et al.	2014-12-04
Cleaning Method, Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus And Non-transitory Computer-readable Recording Medium App 20140287594 - TERASAKI; Masato ; et al.	2014-09-25
Reaction tube Grant D711,843 - Yamazaki , et al. August 26, 2	2014-08-26
Method Of Manufacturing Semiconductor Device, Substrate Processing Method And Substrate Processing Apparatus App 20140099797 - Terasaki; Masato	2014-04-10
Method Of Manufacturing Semiconductor Device, Method Of Processing Substrate, Substrate Processing Apparatus And Non-transitory Computer Readable Recording Medium App 20130084712 - YUASA; Kazuhiro ; et al.	2013-04-04
Substrate treatment device and manufacturing method of semiconductor device Grant 7,795,157 - Terasaki , et al. September 14, 2	2010-09-14
Substrate Treatment Device and Manufacturing Method of Semiconductor Device App 20090170338 - Terasaki; Masato ; et al.	2009-07-02
Method for manufacturing semiconductor device, method for processing substrate, and substrate processing apparatus App 20020192984 - Hiyama, Shin ; et al.	2002-12-19
Method of plasma processing a substrate placed on a substrate table Grant 6,194,037 - Terasaki , et al. February 27, 2	2001-02-27

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