| Patent | Date |
|---|
Method and apparatus for sputtering onto large flat panels
Grant 8,500,975 - Le , et al. August 6, 2 | 2013-08-06 |
Coils For Generating A Plasma And For Sputtering
App 20130168232 - NULMAN; Jaim ; et al. | 2013-07-04 |
Coils for generating a plasma and for sputtering
Grant 8,398,832 - Nulman , et al. March 19, 2 | 2013-03-19 |
Scrubber box and methods for using the same
Grant 7,774,887 - Yudovsky , et al. August 17, 2 | 2010-08-17 |
Flow Control Module For A Fluid Delivery System
App 20100084023 - Melcer; Chris ; et al. | 2010-04-08 |
Staggered target tiles
Grant 7,550,066 - Tepman June 23, 2 | 2009-06-23 |
Two dimensional magnetron scanning for flat panel sputtering
Grant 7,513,982 - Tepman April 7, 2 | 2009-04-07 |
Electro-chemical deposition system
Grant 7,497,932 - Dordi , et al. March 3, 2 | 2009-03-03 |
Pad conditioning head for CMP process
Grant 7,459,056 - Polyak , et al. December 2, 2 | 2008-12-02 |
Batch Equipment Robots And Methods Of Array To Array Work-piece Transfer For Photovoltaic Factory
App 20080292433 - Bachrach; Robert Z. ; et al. | 2008-11-27 |
Batch Equipment Robots And Methods Within Equipment Work-piece Transfer For Photovoltaic Factory
App 20080279658 - Bachrach; Robert Z. ; et al. | 2008-11-13 |
Batch Equipment Robots And Methods Of Stack To Array Work-piece Transfer For Photovoltaic Factory
App 20080279672 - BACHRACH; ROBERT Z. ; et al. | 2008-11-13 |
Scrubber Box And Methods For Using The Same
App 20080210258 - Yudovsky; Joseph ; et al. | 2008-09-04 |
Scrubber box
Grant 7,377,002 - Yudovsky , et al. May 27, 2 | 2008-05-27 |
Pad Conditioning Head For Cmp Process
App 20080057836 - Polyak; Alexander S. ; et al. | 2008-03-06 |
Method For Processing A Substrate Using Multiple Fluid Distribtuions On A Polishing Surface
App 20080038998 - Polyak; Alexander S. ; et al. | 2008-02-14 |
Pad conditioning head for CMP process
Grant 7,288,165 - Polyak , et al. October 30, 2 | 2007-10-30 |
Substrate centering apparatus and method
Grant 7,256,132 - Lerner , et al. August 14, 2 | 2007-08-14 |
Method and apparatus for sputtering onto large flat panels
App 20070012562 - Le; Hien Minh Huu ; et al. | 2007-01-18 |
Electro-chemical deposition system
App 20060246690 - Dordi; Yezdi ; et al. | 2006-11-02 |
Stable cell platform
Grant 7,114,693 - Olgado , et al. October 3, 2 | 2006-10-03 |
Method for processing a substrate using multiple fluid distributions on a polishing surface
App 20060079156 - Polyak; Alexander S. ; et al. | 2006-04-13 |
Coils for generating a plasma and for sputtering
App 20060070875 - Nulman; Jaim ; et al. | 2006-04-06 |
Apparatus and method for two dimensional magnetron scanning for sputtering onto flat panels
App 20060049040 - Tepman; Avi | 2006-03-09 |
Staggered target tiles
App 20060006058 - Tepman; Avi | 2006-01-12 |
Target tiles in a staggered array
App 20060006064 - Tepman; Avi | 2006-01-12 |
Slurry delivery arm
App 20050272352 - Polyak, Alexander S. ; et al. | 2005-12-08 |
Lift pin alignment and operation methods and apparatus
App 20050217586 - Lubomirsky, Dmitry ; et al. | 2005-10-06 |
Slurry delivery arm
Grant 6,939,210 - Polyak , et al. September 6, 2 | 2005-09-06 |
Lift pin alignment and operation methods and apparatus
Grant 6,935,466 - Lubomirsky , et al. August 30, 2 | 2005-08-30 |
Pad conditioning head for CMP process
App 20050167048 - Polyak, Alexander S. ; et al. | 2005-08-04 |
Two dimensional magnetron scanning for flat panel sputtering
App 20050145478 - Tepman, Avi | 2005-07-07 |
Clamshell and small volume chamber with fixed substrate support
App 20050139160 - Lei, Lawrence C. ; et al. | 2005-06-30 |
Scrubber box and methods for using the same
App 20050087212 - Yudovsky, Joseph ; et al. | 2005-04-28 |
Cooling system for magnetron sputtering apparatus
Grant 6,881,310 - Tepman April 19, 2 | 2005-04-19 |
Clamshell and small volume chamber with fixed substrate support
Grant 6,866,746 - Lei , et al. March 15, 2 | 2005-03-15 |
Coils for generating a plasma and for sputtering
App 20040256217 - Nulman, Jaim ; et al. | 2004-12-23 |
Slurry delivery arm
App 20040229549 - Polyak, Alexander S. ; et al. | 2004-11-18 |
Coils for generating a plasma and for sputtering
Grant 6,783,639 - Nulman , et al. August 31, 2 | 2004-08-31 |
Variable flow deposition apparatus and method in semiconductor substrate processing
Grant 6,777,352 - Tepman , et al. August 17, 2 | 2004-08-17 |
System for planarizing metal conductive layers
Grant 6,770,565 - Olgado , et al. August 3, 2 | 2004-08-03 |
Electro-chemical deposition system
App 20040084301 - Dordi, Yezdi ; et al. | 2004-05-06 |
Apparatus for electro chemical deposition of copper metallization with the capability of in-situ thermal annealing
App 20040079633 - Cheung, Robin ; et al. | 2004-04-29 |
Robot blade with dual offset wafer supports
Grant 6,722,834 - Tepman April 20, 2 | 2004-04-20 |
Cooling system for magnetron sputtering apparatus
App 20040045670 - Tepman, Avi | 2004-03-11 |
Apparatus for wafer rinse and clean and edge etching
Grant 6,689,418 - Olgado , et al. February 10, 2 | 2004-02-10 |
Compact and high throughput semiconductor fabrication system
App 20040018070 - Zhao, Jun ; et al. | 2004-01-29 |
Clamshell and small volume chamber with fixed substrate support
App 20030221780 - Lei, Lawrence C. ; et al. | 2003-12-04 |
Cooling system for magnetron sputtering apparatus
Grant 6,641,701 - Tepman November 4, 2 | 2003-11-04 |
Electro-chemical deposition system
Grant 6,635,157 - Dordi , et al. October 21, 2 | 2003-10-21 |
Variable flow deposition apparatus and method in semiconductor substrate processing
App 20030153177 - Tepman, Avi ; et al. | 2003-08-14 |
Resonant chamber applicator for remote plasma source
Grant 6,603,269 - Vo , et al. August 5, 2 | 2003-08-05 |
System for planarizing metal conductive layers
App 20030129850 - Olgado, Donald J.K. ; et al. | 2003-07-10 |
Multiple blade robot adjustment apparatus and associated method
Grant 6,571,657 - Olgado , et al. June 3, 2 | 2003-06-03 |
Apparatus for wafer rinse and clean and edge etching
App 20030024557 - Olgado, Donald J.K. ; et al. | 2003-02-06 |
Coils for generating a plasma and for sputtering
App 20020144901 - Nulman, Jaim ; et al. | 2002-10-10 |
Lift pin alignment and operation methods and apparatus
App 20020121312 - Lubomirsky, Dmitry ; et al. | 2002-09-05 |
Dual buffer chamber cluster tool for semiconductor wafer processing
Grant 6,440,261 - Tepman , et al. August 27, 2 | 2002-08-27 |
Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber
Grant 6,430,468 - Tepman , et al. August 6, 2 | 2002-08-06 |
Alternate steps of IMP and sputtering process to improve sidewall coverage
App 20020084181 - Gopalraja, Praburam ; et al. | 2002-07-04 |
High productivity semiconductor wafer processing system
App 20020061248 - Tepman, Avi | 2002-05-23 |
Temperature controlled gas distribution plate
Grant 6,379,466 - Sahin , et al. April 30, 2 | 2002-04-30 |
Coils for generating a plasma and for sputtering
Grant 6,368,469 - Nulman , et al. April 9, 2 | 2002-04-09 |
Electro-chemical deposition system
App 20020029961 - Dordi, Yezdi ; et al. | 2002-03-14 |
Alternate steps of IMP and sputtering process to improve sidewall coverage
Grant 6,350,353 - Gopalraja , et al. February 26, 2 | 2002-02-26 |
Sealing Device And Method Useful In Semiconductor Processing Apparatus For Bridging Materials Having A Thermal Expansion Differential
App 20010040029 - DAVENPORT, ROBERT E. ; et al. | 2001-11-15 |
Chemical vapor deposition hardware and process
Grant 6,296,712 - Guo , et al. October 2, 2 | 2001-10-02 |
Recessed coil for generating a plasma
App 20010019016 - Subramani, Anantha ; et al. | 2001-09-06 |
RF plasma method
Grant 6,270,687 - Ye , et al. August 7, 2 | 2001-08-07 |
Plasma treatment of titanium nitride formed by chemical vapor deposition
Grant 6,270,859 - Zhao , et al. August 7, 2 | 2001-08-07 |
Electro-chemical deposition system
Grant 6,258,220 - Dordi , et al. July 10, 2 | 2001-07-10 |
Plasma Treatment Of Titanium Nitride Formed By Chemical Vapor Deposition
App 20010004478 - ZHAO, JUN ; et al. | 2001-06-21 |
Integrated bake and chill plate
App 20010003901 - Bolandi, Hooman ; et al. | 2001-06-21 |
Alternate Steps Of Imp And Sputtering Process To Improve Sidewall Coverage
App 20010003607 - GOPALRAJA, PRABURAM ; et al. | 2001-06-14 |
Magnetron for low pressure, full face erosion
Grant 6,228,235 - Tepman , et al. May 8, 2 | 2001-05-08 |
Apparatus for electro-chemical deposition with thermal anneal chamber
Grant 6,136,163 - Cheung , et al. October 24, 2 | 2000-10-24 |
Apparatus for substrate processing with improved throughput and yield
Grant 6,129,044 - Zhao , et al. October 10, 2 | 2000-10-10 |
Front end vacuum processing environment
Grant 6,071,055 - Tepman June 6, 2 | 2000-06-06 |
RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
Grant 6,071,372 - Ye , et al. June 6, 2 | 2000-06-06 |
Two-piece slit valve insert for vacuum processing system
Grant 6,045,620 - Tepman , et al. April 4, 2 | 2000-04-04 |
Removable pumping channel liners within a chemical vapor deposition chamber
Grant 5,964,947 - Zhao , et al. October 12, 1 | 1999-10-12 |
Apparatus for full wafer deposition
Grant 5,951,775 - Tepman September 14, 1 | 1999-09-14 |
Multiple edge deposition exclusion rings
Grant 5,922,133 - Tepman , et al. July 13, 1 | 1999-07-13 |
Magnetron for low pressure full face erosion
Grant 5,907,220 - Tepman , et al. May 25, 1 | 1999-05-25 |
Gas injection slit nozzle for a plasma process reactor
Grant 5,885,358 - Maydan , et al. March 23, 1 | 1999-03-23 |
Compartmentalized substrate processing chamber
Grant 5,883,017 - Tepman , et al. March 16, 1 | 1999-03-16 |
Self-cleaning plasma processing reactor
Grant 5,879,575 - Tepman , et al. March 9, 1 | 1999-03-09 |
Robot assembly
Grant 5,879,127 - Grunes , et al. March 9, 1 | 1999-03-09 |
Clamp ring for shielding a substrate during film layer deposition
Grant 5,868,847 - Chen , et al. February 9, 1 | 1999-02-09 |
Thermally floating pedestal collar in a chemical vapor deposition chamber
Grant 5,846,332 - Zhao , et al. December 8, 1 | 1998-12-08 |
Method and apparatus for cleaning a target in a sputtering source
Grant 5,772,858 - Tepman June 30, 1 | 1998-06-30 |
Lid and door for a vacuum chamber and pretreatment therefor
Grant 5,762,748 - Banholzer , et al. June 9, 1 | 1998-06-09 |
Gas injection slit nozzle for a plasma process reactor
Grant 5,746,875 - Maydan , et al. May 5, 1 | 1998-05-05 |
Semiconductor processing apparatus for promoting heat transfer between isolated volumes
Grant 5,735,339 - Davenport , et al. April 7, 1 | 1998-04-07 |
Compartnetalized substrate processing chamber
Grant 5,730,801 - Tepman , et al. March 24, 1 | 1998-03-24 |
Robot assembly
Grant 5,678,980 - Grunes , et al. October 21, 1 | 1997-10-21 |
Support platen with removable insert useful in semiconductor processing apparatus
Grant 5,673,167 - Davenport , et al. September 30, 1 | 1997-09-30 |
Sputtering target
Grant D381,030 - Tepman July 15, 1 | 1997-07-15 |
Two piece anti-stick clamp ring
Grant 5,632,873 - Stevens , et al. May 27, 1 | 1997-05-27 |
Apparatus for full wafer deposition
Grant 5,589,224 - Tepman , et al. December 31, 1 | 1996-12-31 |
Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing
Grant 5,566,744 - Tepman October 22, 1 | 1996-10-22 |
Lid and door for a vacuum chamber and pretreatment therefor
Grant 5,565,058 - Banholzer , et al. October 15, 1 | 1996-10-15 |
Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing
Grant 5,540,821 - Tepman July 30, 1 | 1996-07-30 |
Cylindrical sputtering shield
Grant 5,527,438 - Tepman June 18, 1 | 1996-06-18 |
Method of heating and cooling a wafer during semiconductor processing
Grant 5,484,011 - Tepman , et al. January 16, 1 | 1996-01-16 |
Robot assembly
Grant 5,447,409 - Grunes , et al. September 5, 1 | 1995-09-05 |
Lid and door for a vacuum chamber and pretreatment therefor
Grant 5,401,319 - Banholzer , et al. March 28, 1 | 1995-03-28 |
Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing
Grant 5,366,002 - Tepman November 22, 1 | 1994-11-22 |
Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity
Grant 5,320,728 - Tepman June 14, 1 | 1994-06-14 |
Physical vapor deposition clamping mechanism and heater/cooler
Grant 5,228,501 - Tepman , et al. July 20, 1 | 1993-07-20 |
Slit valve apparatus and method
Grant 5,226,632 - Tepman , et al. July 13, 1 | 1993-07-13 |
Removable shutter apparatus for a semiconductor process chamber
Grant 5,223,112 - Tepman June 29, 1 | 1993-06-29 |
Staged-vacuum wafer processing system and method
Grant 5,186,718 - Tepman , et al. February 16, 1 | 1993-02-16 |
Material deposition method for integrated circuit manufacturing
Grant 5,171,412 - Talieh , et al. December 15, 1 | 1992-12-15 |
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