Temchenko; Vlad

Patent Applications and Registrations

Patent applications and USPTO patent grants for Temchenko; Vlad.The latest application filed is for "methods of forming semiconductor devices using aspect ratio dependent etching effects, and related memory devices and electronic".

Company Profile

4.7.7

Temchenko; Vlad - Boise ID
Temchenko; Vlad - Dresden DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related memory devices and electronic systems Grant 10,991,700 - Guo , et al. April 27, 2	2021-04-27
Methods Of Forming Semiconductor Devices Using Aspect Ratio Dependent Etching Effects, And Related Memory Devices And Electronic App 20200185389 - Guo; Song ; et al.	2020-06-11
Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related semiconductor devices Grant 10,593,678 - Guo , et al.	2020-03-17
Methods Of Forming Semiconductor Devices Using Aspect Ratio Dependent Etching Effects, And Related Semiconductor Devices App 20200066730 - Guo; Song ; et al.	2020-02-27
Method for Exposing an Area on a Substrate to a Beam and Photolithographic System App 20140204355 - Temchenko; Vlad ; et al.	2014-07-24
Method for exposing an area on a substrate to a beam and photolithographic system Grant 8,715,910 - Temchenko , et al. May 6, 2	2014-05-06
Reticle for use in a semiconductor lithographic system and method for modifying the same Grant 7,910,265 - Temchenko , et al. March 22, 2	2011-03-22
Lithography system with illumination monitor Grant 7,880,863 - Temchenko February 1, 2	2011-02-01
Optical components, illumination systems, and methods Grant 7,738,160 - Schneider , et al. June 15, 2	2010-06-15
Method for Exposing an Area on a Substrate to a Beam and Photolithographic System App 20100040987 - Temchenko; Vlad ; et al.	2010-02-18
Reticle for Use in a Semiconductor Lithographic System and Method for Modifying the Same App 20090233239 - Temchenko; Vlad ; et al.	2009-09-17
Lithography System With Illumination Monitor App 20090185155 - Temchenko; Vlad	2009-07-23
Lithography aperture lenses, illumination systems, and methods App 20080285001 - Schneider; Jens ; et al.	2008-11-20

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