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Patent applications and USPTO patent grants for Tekleab; Daniel G..The latest application filed is for "dual high-k oxides with sige channel".
Patent | Date |
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Method to improve source/drain parasitics in vertical devices Grant 8,258,035 - Mathew , et al. September 4, 2 | 2012-09-04 |
Dual high-k oxides with sige channel Grant 8,017,469 - Luo , et al. September 13, 2 | 2011-09-13 |
Dual High-k Oxides With Sige Channel App 20100184260 - Luo; Tien-Ying ;   et al. | 2010-07-22 |
Optimized Compressive SiGe Channel PMOS Transistor with Engineered Ge Profile and Optimized Silicon Cap Layer App 20100109044 - Tekleab; Daniel G. ;   et al. | 2010-05-06 |
Method to improve source/drain parasitics in vertical devices App 20080274600 - Mathew; Leo ;   et al. | 2008-11-06 |
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