te Nijenhuis; Harald
Patent Applications and Registrations
Patent applications and USPTO patent grants for te Nijenhuis; Harald.The latest application filed is for "vapor accumulator for corrosive gases with purging".
- te Nijenhuis; Harald - San Jose CA
| Patent | Date |
|---|---|
| Vapor Accumulator For Corrosive Gases With Purging App 20220213599 - Lind; Gary Bridger ; et al. | 2022-07-07 |
| Configurable liquid precursor vaporizer Grant 10,107,490 - Smith , et al. October 23, 2 | 2018-10-23 |
| Treatment for flowable dielectric deposition on substrate surfaces Grant 9,847,222 - Reilly , et al. December 19, 2 | 2017-12-19 |
| Dual-plenum showerhead with interleaved plenum sub-volumes Grant 9,728,380 - Mohn , et al. August 8, 2 | 2017-08-08 |
| System and apparatus for flowable deposition in semiconductor fabrication Grant 9,719,169 - Mohn , et al. August 1, 2 | 2017-08-01 |
| Variable Showerhead Flow By Varying Internal Baffle Conductance App 20160020074 - Mohn; Jonathan D. ; et al. | 2016-01-21 |
| Configurable Liquid Precursor Vaporizer App 20150377481 - Smith; Colin F. ; et al. | 2015-12-31 |
| Variable showerhead flow by varying internal baffle conductance Grant 9,121,097 - Mohn , et al. September 1, 2 | 2015-09-01 |
| Atomic Layer Removal Process With Higher Etch Amount App 20150118848 - Draeger; Nerissa ; et al. | 2015-04-30 |
| Treatment For Flowable Dielectric Deposition On Substrate Surfaces App 20150118862 - Reilly; Patrick ; et al. | 2015-04-30 |
| Variable Showerhead Flow By Varying Internal Baffle Conductance App 20140061324 - Mohn; Jonathan D. ; et al. | 2014-03-06 |
| Defect Reduction In Plasma Processing App 20140049162 - Thomas; George ; et al. | 2014-02-20 |
| System And Apparatus For Flowable Deposition In Semiconductor Fabrication App 20120161405 - Mohn; Jonathan D. ; et al. | 2012-06-28 |
| Bottom Up Fill In High Aspect Ratio Trenches App 20120149213 - Nittala; Lakshminarayana ; et al. | 2012-06-14 |
| Protective layer to enable damage free gap fill Grant 8,133,797 - van Schravendijk , et al. March 13, 2 | 2012-03-13 |
| Atomic layer removal process with higher etch amount Grant 8,058,179 - Draeger , et al. November 15, 2 | 2011-11-15 |
| Atomic layer removal for high aspect ratio gapfill Grant 7,981,763 - van Schravendijk , et al. July 19, 2 | 2011-07-19 |
| Protective Layer To Enable Damage Free Gap Fill App 20090286381 - van Schravendijk; Bart ; et al. | 2009-11-19 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 