TAVASSOLI; Hamid

Patent Applications and Registrations

Patent applications and USPTO patent grants for TAVASSOLI; Hamid.The latest application filed is for "symmetric plasma process chamber".

Company Profile

9.36.40

TAVASSOLI; Hamid - Cupertino CA
Tavassoli; Hamid - Cupertion CA
Tavassoli; Hamid - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Symmetric Plasma Process Chamber App 20220254606 - CARDUCCI; James D. ; et al.	2022-08-11
Symmetric plasma process chamber Grant 11,315,760 - Carducci , et al. April 26, 2	2022-04-26
Process kit design for in-chamber heater and wafer rotating mechanism Grant 10,704,147 - Rasheed , et al.	2020-07-07
Collimator for use in a physical vapor deposition chamber Grant 10,697,057 - Yoshidome , et al.	2020-06-30
Symmetric Plasma Process Chamber App 20200185192 - CARDUCCI; James D. ; et al.	2020-06-11
Symmetric plasma process chamber Grant 10,615,006 - Carducci , et al.	2020-04-07
Symmetric plasma process chamber Grant 10,580,620 - Carducci , et al.	2020-03-03
Symmetric plasma process chamber Grant 10,546,728 - Carducci , et al. Ja	2020-01-28
Distributed electro-static chuck cooling Grant 10,537,013 - Silveira , et al. Ja	2020-01-14
Symmetric plasma process chamber Grant 10,535,502 - Carducci , et al. Ja	2020-01-14
Symmetric plasma process chamber Grant 10,453,656 - Carducci , et al. Oc	2019-10-22
Apparatus for controlling temperature uniformity of a substrate Grant 10,386,126 - Bera , et al. A	2019-08-20
Process Kit Design For In-chamber Heater And Wafer Rotating Mechanism App 20180155838 - RASHEED; Muhammad M. ; et al.	2018-06-07
Collimator For Use In A Physical Vapor Deposition Chamber App 20180142342 - YOSHIDOME; GOICHI ; et al.	2018-05-24
Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching App 20180053631 - Dorf; Leonid ; et al.	2018-02-22
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching Grant 9,799,491 - Dorf , et al. October 24, 2	2017-10-24
Symmetric Plasma Process Chamber App 20170271129 - CARDUCCI; James D. ; et al.	2017-09-21
Symmetric plasma process chamber Grant 9,741,546 - Carducci , et al. August 22, 2	2017-08-22
Low Electron Temperature Etch Chamber With Independent Control Over Plasma Density, Radical Composition And Ion Energy For Atomic Precision Etching App 20170125217 - Dorf; Leonid ; et al.	2017-05-04
Electron beam plasma source with remote radical source Grant 9,564,297 - Wu , et al. February 7, 2	2017-02-07
Symmetric Plasma Process Chamber App 20160314936 - CARDUCCI; James D. ; et al.	2016-10-27
Symmetric Plasma Process Chamber App 20160314937 - CARDUCCI; James D. ; et al.	2016-10-27
Symmetric Plasma Process Chamber App 20160314942 - CARDUCCI; James D. ; et al.	2016-10-27
Symmetric Plasma Process Chamber App 20160314940 - CARDUCCI; James D. ; et al.	2016-10-27
Apparatus For Controlling Temperature Uniformity Of A Substrate App 20160169593 - BERA; KALLOL ; et al.	2016-06-16
Apparatus for controlling the temperature uniformity of a substrate Grant 9,267,742 - Bera , et al. February 23, 2	2016-02-23
Electron Beam Plasma Source With Rotating Cathode, Backside Heliumcooling And Liquid Cooled Pedestal For Uniform Plasma Generation App 20160042961 - Dorf; Leonid ; et al.	2016-02-11
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity Grant 9,248,509 - Tavassoli , et al. February 2, 2	2016-02-02
Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow Grant 9,214,315 - Silveira , et al. December 15, 2	2015-12-15
Temperature Control In Plasma Processing Apparatus Using Pulsed Heat Transfer Fluid Flow App 20150316941 - SILVEIRA; Fernando M. ; et al.	2015-11-05
Plasma reactor with a multiple zone thermal control feed forward control apparatus Grant 8,980,044 - Brillhart , et al. March 17, 2	2015-03-17
Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow Grant 8,916,793 - Silveira , et al. December 23, 2	2014-12-23
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity App 20140346743 - Tavassoli; Hamid ; et al.	2014-11-27
Electron Beam Plasma Source With Remote Radical Source App 20140339980 - Wu; Ming-Feng ; et al.	2014-11-20
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity Grant 8,822,876 - Tavassoli , et al. September 2, 2	2014-09-02
Assembly for delivering RF power and DC voltage to a plasma processing chamber Grant 8,629,370 - Tavassoli , et al. January 14, 2	2014-01-14
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2	2013-12-17
Esc Cooling Base For Large Diameter Subsrates App 20130284372 - TAVASSOLI; Hamid ; et al.	2013-10-31
Distributed Electro-static Chuck Cooling App 20130276981 - Silveira; Fernando ; et al.	2013-10-24
Symmetric Plasma Process Chamber App 20130087286 - Carducci; James D. ; et al.	2013-04-11
Capacitively coupled plasma reactor having very agile wafer temperature control Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2	2012-12-25
Apparatus for controlling gas flow in a semiconductor substrate processing chamber Grant 8,236,105 - Bera , et al. August 7, 2	2012-08-07
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2	2012-07-17
Temperature Control In Plasma Processing Apparatus Using Pulsed Heat Transfer Fluid Flow App 20120132397 - Silveira; Fernando M. ; et al.	2012-05-31
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity App 20120091104 - Tavassoli; Hamid ; et al.	2012-04-19
Capacitively coupled plasma reactor having very agile wafer temperature control Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2	2012-04-17
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2	2012-01-10
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution Grant 8,092,638 - Brillhart , et al. January 10, 2	2012-01-10
Assembly For Delivering Rf Power And Dc Voltage To A Plasma Processing Chamber App 20110297650 - Tavassoli; Hamid ; et al.	2011-12-08
Method for agile workpiece temperature control in a plasma reactor using a thermal model Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2	2011-09-20
Plasma reactor with a multiple zone thermal control feed forward control apparatus Grant 8,012,304 - Brillhart , et al. September 6, 2	2011-09-06
Apparatus For Controlling Temperature Uniformity Of A Substrate App 20110180243 - BERA; KALLOL ; et al.	2011-07-28
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes App 20100319851 - Buchberger, JR.; Douglas A. ; et al.	2010-12-23
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution App 20100319852 - Brillhart; Paul Lukas ; et al.	2010-12-23
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus App 20100314046 - Brillhart; Paul Lukas ; et al.	2010-12-16
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control App 20100303680 - Buchberger, JR.; Douglas A. ; et al.	2010-12-02
Method And Apparatus For Controlling Temperature Of A Substrate App 20090159566 - Brillhart; Paul L. ; et al.	2009-06-25
Plasma reactor with a multiple zone thermal control feed forward control apparatus App 20070089834 - Brillhart; Paul Lukas ; et al.	2007-04-26
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops App 20070091538 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes App 20070091539 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method for agile workpiece temperature control in a plasma reactor using a thermal model App 20070091537 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Capacitively coupled plasma reactor having very agile wafer temperature control App 20070081294 - Buchberger; Douglas A. JR. ; et al.	2007-04-12
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution App 20070081295 - Brillhart; Paul Lukas ; et al.	2007-04-12
Apparatus for controlling gas flow in a semiconductor substrate processing chamber App 20050224180 - Bera, Kallol ; et al.	2005-10-13
Cathode pedestal for a plasma etch reactor App 20040040664 - Yang, Jang Gyoo ; et al.	2004-03-04

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