Tatsumi; Toru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tatsumi; Toru.The latest application filed is for "semiconductor device and method of manufacturing the same".

Company Profile

0.39.26

Tatsumi; Toru - Tokyo N/A JP
Tatsumi; Toru - Hachioji JP
Tatsumi; Toru - Kawasaki-shi JP
Tatsumi; Toru - Minato-ku JP
Tatsumi; Toru - Kyoto JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods for manufacturing dielectric films Grant 8,524,617 - Nakagawa , et al. September 3, 2	2013-09-03
Semiconductor device and method of manufacturing the same Grant 8,415,753 - Nakagawa , et al. April 9, 2	2013-04-09
Method of manufacturing hafnium-containing and silicon-containing metal oxynitride dielectric film Grant 8,288,234 - Seino , et al. October 16, 2	2012-10-16
SiGe photodiode Grant 8,269,303 - Fujikata , et al. September 18, 2	2012-09-18
Semiconductor Device And Method Of Manufacturing The Same App 20120199919 - Nakagawa; Takashi ; et al.	2012-08-09
Dielectric, capacitor using dielectric, semiconductor device using dielectric, and manufacturing method of dielectric Grant 8,203,176 - Nakagawa , et al. June 19, 2	2012-06-19
Dielectric film with hafnium aluminum oxynitride film Grant 8,178,934 - Kitano , et al. May 15, 2	2012-05-15
Semiconductor Device And Method Of Manufacturing The Same App 20120043617 - Nakagawa; Takashi ; et al.	2012-02-23
Methods For Manufacturing Dielectric Films App 20120021612 - Nakagawa; Takashi ; et al.	2012-01-26
Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen Grant 8,053,311 - Nakagawa , et al. November 8, 2	2011-11-08
Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen Grant 8,030,694 - Nakagawa , et al. October 4, 2	2011-10-04
Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer Grant 7,968,463 - Nakagawa , et al. June 28, 2	2011-06-28
Dielectric Film With Metallic Oxynitride App 20110064642 - Kitano; Naomu ; et al.	2011-03-17
Dielectric Film, Method Of Manufacutring Semiconductor Device Using Dielectric Film, And Semiconductor Manufacturing Apparatus App 20110027979 - Seino; Takuya ; et al.	2011-02-03
SiGe PHOTODIODE App 20110012221 - Fujikata; Junichi ; et al.	2011-01-20
Method of manufacturing dielectric film that has hafnium-containing and aluminum-containing oxynitride Grant 7,867,847 - Kitano , et al. January 11, 2	2011-01-11
Dielectric Film And Semiconductor Device Using Dielectric Film App 20100330813 - Nakagawa; Takashi ; et al.	2010-12-30
Dielectric, Capacitor Using Dielectric, Semiconductor Device Using Dielectric, And Manufacturing Method Of Dielectric App 20100320520 - Nakagawa; Takashi ; et al.	2010-12-23
Dielectric Film And Semiconductor Device Using Dielectric Film App 20100244192 - Nakagawa; Takashi ; et al.	2010-09-30
Method Of Manufacturing Dielectric Film App 20100221885 - Kitano; Naomu ; et al.	2010-09-02
Semiconductor device and method for manufacturing same Grant 7,701,018 - Yamagami , et al. April 20, 2	2010-04-20
Semiconductor device manufacturing method and semiconductor device App 20100084713 - Nakagawa; Takashi ; et al.	2010-04-08
Semiconductor device, production method and production device thereof Grant 7,679,148 - Watanabe , et al. March 16, 2	2010-03-16
Semiconductor device having a conductive portion below an interlayer insulating film and method for producing the same Grant 7,612,416 - Takeuchi , et al. November 3, 2	2009-11-03
Semiconductor device with silicide-containing gate electrode and method of fabricating the same Grant 7,592,674 - Takahashi , et al. September 22, 2	2009-09-22
Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer App 20090170252 - Nakagawa; Takashi ; et al.	2009-07-02
Semiconductor device having a mis-type fet, and methods for manufacturing the same and forming a metal oxide film Grant 7,476,916 - Tatsumi , et al. January 13, 2	2009-01-13
Semiconductor Device and Method for Manufacturing Same App 20080251849 - Yamagami; Shigeharu ; et al.	2008-10-16
Apparatus for Forming Thin Film App 20080134976 - Shinriki; Hiroshi ; et al.	2008-06-12
Method for forming thin film and apparatus for forming thin film Grant 7,354,622 - Shinriki , et al. April 8, 2	2008-04-08
Semiconductor device having fin-type effect transistor App 20070187682 - Takeuchi; Kiyoshi ; et al.	2007-08-16
Semiconductor device and method of fabricating the same App 20070138580 - Takahashi; Kensuke ; et al.	2007-06-21
Semiconductor device and method for producing the same App 20070132009 - Takeuchi; Kiyoshi ; et al.	2007-06-14
Semiconductor device having a mis-type fet, and methods for manufacturing the same and forming a metal oxide film App 20070096104 - Tatsumi; Toru ; et al.	2007-05-03
Semiconductor device and manufacturing process therefor App 20070075372 - Terashima; Koichi ; et al.	2007-04-05
Semiconductor device, production method and production device thereof App 20050233526 - Watanabe, Heiji ; et al.	2005-10-20
Process for producing a semiconductor device Grant 6,790,741 - Tatsumi September 14, 2	2004-09-14
Vapor growth method for metal oxide dielectric film and pzt film App 20040058492 - Tatsumi, Toru	2004-03-25
Rear-projection screen and rear-projection image display Grant 6,665,118 - Yamaguchi , et al. December 16, 2	2003-12-16
Vapor phase deposition method for metal oxide dielectric film App 20030175425 - Tatsumi, Toru	2003-09-18
Method for forming thin film and appatus for forming thin film App 20030170388 - Shinriki, Hiroshi ; et al.	2003-09-11
Semiconductor device including a MIS transistor Grant 6,459,126 - Mogami , et al. October 1, 2	2002-10-01
Semiconductor device including a MIS transistor App 20020096721 - Mogami, Tohru ; et al.	2002-07-25
Rear-projection screen and rear-projection image display App 20020080483 - Yamaguchi, Hiroshi ; et al.	2002-06-27
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device Grant 6,372,628 - Matsubara , et al. April 16, 2	2002-04-16
Metal oxide dielectric film App 20020025453 - Tatsumi, Toru	2002-02-28
Semiconductor manufacturing method Grant 6,180,531 - Matsumoto , et al. January 30, 2	2001-01-30
Method for manufacturing semiconductor device capable of flattening surface of selectively-grown silicon layer Grant 6,121,120 - Wakabayashi , et al. September 19, 2	2000-09-19
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film Grant 6,091,081 - Matsubara , et al. July 18, 2	2000-07-18
Monocrystalline semiconductor photodetector Grant 6,075,253 - Sugiyama , et al. June 13, 2	2000-06-13
Method for forming amorphous carbon thin film by plasma chemical vapor deposition Grant 6,071,797 - Endo , et al. June 6, 2	2000-06-06
Vapor phase growth method Grant 6,060,391 - Tatsumi May 9, 2	2000-05-09
Method for manufacturing a semiconductor device having contact plug made of Si/SiGe/Si Grant 6,030,894 - Hada , et al. February 29, 2	2000-02-29
Process for fabricating semiconductor device having semiconductor layers epitaxially grown from active areas without short-circuit on field insulating layer Grant 5,946,570 - Kasai , et al. August 31, 1	1999-08-31
Semiconductor device and fabrication process thereof Grant 5,895,948 - Mori , et al. April 20, 1	1999-04-20
Semiconductor device and manufacturing method of the same Grant 5,866,920 - Matsumoto , et al. February 2, 1	1999-02-02
Method for fabricating polycrystalline silicon having micro roughness on the surface Grant 5,691,249 - Watanabe , et al. November 25, 1	1997-11-25
Semiconductor device having polycrystalline silicon layer with uneven surface defined by hemispherical or mushroom like shape silicon grain Grant 5,623,243 - Watanabe , et al. April 22, 1	1997-04-22
Method of manufacturing a semiconducter device capable of easily forming metal silicide films on source and drain regions Grant 5,571,735 - Mogami , et al. November 5, 1	1996-11-05
Thin film deposition method for wafer Grant 5,441,012 - Aketagawa , et al. August 15, 1	1995-08-15
Method of manufacturing polysilicon film including recrystallization of an amorphous film Grant 5,385,863 - Tatsumi , et al. January 31, 1	1995-01-31
Method for fabricating polycrystalline silicon having micro roughness on the surface Grant 5,366,917 - Watanabe , et al. November 22, 1	1994-11-22
Thin film deposition method Grant 5,234,862 - Aketagawa , et al. August 10, 1	1993-08-10

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