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Apparatus For Processing Substrate
App 20200118859 - SANDA; Hiroshi ; et al. | 2020-04-16 |
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
Grant 8,685,857 - Matsui , et al. April 1, 2 | 2014-04-01 |
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method
Grant 8,292,694 - Togawa , et al. October 23, 2 | 2012-10-23 |
Manufacturing method of a semiconductor device
Grant 8,174,125 - Kurashima , et al. May 8, 2 | 2012-05-08 |
Polishing apparatus and polishing method
Grant 8,078,306 - Nakao , et al. December 13, 2 | 2011-12-13 |
Aqueous Dispersion For Chemical Mechanical Polishing, Chemical Mechanical Polishing Method, Kit For Chemical Mechanical Polishing, And Kit For Preparing Aqueous Dispersion For Chemical Mechanical Polishing
App 20110250756 - UCHIKURA; Kazuhito ; et al. | 2011-10-13 |
Post-cmp Treating Liquid And Manufacturing Method Of Semiconductor Device Using The Same
App 20110195888 - KURASHIMA; Nobuyuki ; et al. | 2011-08-11 |
Method of manufacturing semiconductor device
Grant 7,985,685 - Matsui , et al. July 26, 2 | 2011-07-26 |
Post-CMP treating liquid and manufacturing method of semiconductor device using the same
Grant 7,951,717 - Kurashima , et al. May 31, 2 | 2011-05-31 |
Fabricating method of nonvolatile semiconductor storage apparatus
Grant 7,888,139 - Matsui , et al. February 15, 2 | 2011-02-15 |
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method
Grant 7,883,394 - Togawa , et al. February 8, 2 | 2011-02-08 |
Semiconductor Memory Device
App 20100193850 - ASAO; Yoshiaki ; et al. | 2010-08-05 |
Fabricating Method Of Nonvolatile Semiconductor Storage Apparatus
App 20100144062 - MATSUI; Yukiteru ; et al. | 2010-06-10 |
Substrate Holding Mechanism, Substrate Polishing Apparatus And Substrate Polishing Method
App 20100062691 - TOGAWA; Tetsuji ; et al. | 2010-03-11 |
Semiconductor Device Manufacturing Method
App 20090258493 - MATSUI; Yukiteru ; et al. | 2009-10-15 |
Manufacturing Method Of A Semiconductor Device
App 20090184415 - Kurashima; Nobuyuki ; et al. | 2009-07-23 |
Chemical Mechanical Polishing Slurry And Semiconductor Device Manufacturing Method
App 20090176372 - MINAMIHABA; Gaku ; et al. | 2009-07-09 |
Method Of Manufacturing Semiconductor Device
App 20090156000 - MATSUI; Yukiteru ; et al. | 2009-06-18 |
Aqueous Dispersion For Chemical Mechanical Polishing, Chemical Mechanical Polishing Method, Kit For Chemical Mechanical Polishing, And Kit For Preparing Aqueous Dispersion For Chemical Mechanical Polishing
App 20090124172 - Uchikura; Kazuhito ; et al. | 2009-05-14 |
Method Of Manufacturing Semiconductor Device
App 20090124076 - Matsui; Yukiteru ; et al. | 2009-05-14 |
Polishing apparatus and polishing method
App 20090111358 - Nakao; Hidetaka ; et al. | 2009-04-30 |
Manufacturing method of a semiconductor device
Grant 7,521,350 - Kurashima , et al. April 21, 2 | 2009-04-21 |
Polishing Liquid And Method For Manufacturing Semiconductor Device
App 20090068840 - MINAMIHABA; Gaku ; et al. | 2009-03-12 |
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
App 20090068841 - Matsui; Yukiteru ; et al. | 2009-03-12 |
Substrate Holding Mechanism, Substrate Polishing Apparatus And Substrate Polishing Method
App 20080318503 - TOGAWA; Tetsuji ; et al. | 2008-12-25 |
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
Grant 7,452,819 - Matsui , et al. November 18, 2 | 2008-11-18 |
Post-cmp Treating Liquid And Manufacturing Method Of Semiconductor Device Using The Same
App 20080216415 - KURASHIMA; Nobuyuki ; et al. | 2008-09-11 |
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method
Grant 7,419,420 - Togawa , et al. September 2, 2 | 2008-09-02 |
Cleaning Composition, Cleaning Method, And Manufacturing Method Of Semiconductor Device
App 20080045016 - Andou; Michiaki ; et al. | 2008-02-21 |
Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing process, and process for producing semiconductor devices
App 20070049180 - Shida; Hirotaka ; et al. | 2007-03-01 |
Semiconductor device and method of manufacturing the same
Grant 7,144,804 - Minamihaba , et al. December 5, 2 | 2006-12-05 |
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method
App 20060205323 - Togawa; Tetsuji ; et al. | 2006-09-14 |
Method of manufacturing semiconductor device using chemical mechanical polishing
Grant 7,101,801 - Ono , et al. September 5, 2 | 2006-09-05 |
Manufacturing method of a semiconductor device
App 20060151888 - Kurashima; Nobuyuki ; et al. | 2006-07-13 |
Semiconductor device containing a dummy wire
Grant 7,042,099 - Kurashima , et al. May 9, 2 | 2006-05-09 |
Method of making semiconductor device by polishing with intermediate clean polishing
Grant 6,984,582 - Fukushima , et al. January 10, 2 | 2006-01-10 |
Polishing pad and method of manufacturing semiconductor devices
App 20050227489 - Minamihara, Gaku ; et al. | 2005-10-13 |
Semiconductor device and method of manufacturing the same
App 20050116348 - Minamihaba, Gaku ; et al. | 2005-06-02 |
Semiconductor device having an improved construction in the interlayer insulating film
Grant 6,858,936 - Minamihaba , et al. February 22, 2 | 2005-02-22 |
Polishing apparatus
Grant 6,835,116 - Oguri , et al. December 28, 2 | 2004-12-28 |
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
App 20040253822 - Matsui, Yukiteru ; et al. | 2004-12-16 |
Semiconductor device manufacturing method
App 20040152318 - Fukushima, Dai ; et al. | 2004-08-05 |
Method of manufacturing semiconductor device
App 20040152316 - Ono, Takatoshi ; et al. | 2004-08-05 |
Semiconductor device and its manufacturing method
App 20040119164 - Kurashima, Nobuyuki ; et al. | 2004-06-24 |
Semiconductor device and method of manufacturing the same
App 20040070077 - Minamihaba, Gaku ; et al. | 2004-04-15 |
Polishing apparatus
App 20040072512 - Kimura, Norio ; et al. | 2004-04-15 |
Polishing apparatus, polishing method and method of manufacturing semiconductor device
App 20040002292 - Fukushima, Dai ; et al. | 2004-01-01 |
Polishing apparatus
Grant 6,645,053 - Kimura , et al. November 11, 2 | 2003-11-11 |
CMP method and semiconductor manufacturing apparatus
Grant 6,561,876 - Tateyama , et al. May 13, 2 | 2003-05-13 |
Chemical mechanical polishing method and semiconductor device manufacturing method
App 20020158395 - Mizuno, Naohito ; et al. | 2002-10-31 |
Polishing apparatus
App 20010012749 - Oguri, Shozo ; et al. | 2001-08-09 |
Polishing apparatus
Grant 6,036,582 - Aizawa , et al. March 14, 2 | 2000-03-14 |
Polishing pad, polishing apparatus and polishing method
Grant 5,664,989 - Nakata , et al. September 9, 1 | 1997-09-09 |
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