Tateyama; Masanori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tateyama; Masanori.The latest application filed is for "coater/developer, method of coating and developing resist film, and computer readable storing medium".

Company Profile

0.11.8

Tateyama; Masanori - Koshi JP
TATEYAMA; Masanori - Koshi-Shi JP
Tateyama; Masanori - Kumamoto-Ken JP
Tateyama; Masanori - Kikuchi-Gun JP
Tateyama; Masanori - Kumamoto JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Coater/developer, method of coating and developing resist film, and computer readable storing medium Grant 8,372,480 - Miyata , et al. February 12, 2	2013-02-12
Coater/developer, Method Of Coating And Developing Resist Film, And Computer Readable Storing Medium App 20110262623 - MIYATA; Akira ; et al.	2011-10-27
Coater/developer, method of coating and developing resist film, and computer readable storing medium Grant 8,015,940 - Miyata , et al. September 13, 2	2011-09-13
Coater/developer, Method Of Coating And Developing Resist Film, And Computer Readable Storing Medium App 20090098298 - MIYATA; Akira ; et al.	2009-04-16
Substrate processing system and substrate processing method Grant 6,834,210 - Tateyama , et al. December 21, 2	2004-12-21
Substrate processing system and substrate processing method Grant 6,526,329 - Tateyama , et al. February 25, 2	2003-02-25
Substrate processing system and substrate processing method Grant 6,507,770 - Tateyama , et al. January 14, 2	2003-01-14
Substrate processing method and substrate processing apparatus Grant 6,457,882 - Ogata , et al. October 1, 2	2002-10-01
Substrate processing system and substrate processing method App 20020076306 - Tateyama, Masanori ; et al.	2002-06-20
Substrate processing apparatus and substrate processing method Grant RE37,470 - Ohkura , et al. December 18, 2	2001-12-18
Substrate processing system and substrate processing method App 20010051837 - Tateyama, Masanori ; et al.	2001-12-13
Substrate processing system and substrate processing method App 20010048865 - Tateyama, Masanori ; et al.	2001-12-06
Parts maintenance managing system App 20010041076 - Ogata, Kunie ; et al.	2001-11-15
Substrate processing method and substrate processing apparatus App 20010022897 - Ogata, Kunie ; et al.	2001-09-20
Coating film forming apparatus and coating film forming method App 20010016225 - Ogata, Kunie ; et al.	2001-08-23
Method of substrate processing to form a film on multiple target objects Grant 6,054,181 - Nanbu , et al. April 25, 2	2000-04-25
Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections Grant 5,725,664 - Nanbu , et al. March 10, 1	1998-03-10
Resist process apparatus Grant 5,061,144 - Akimoto , et al. October 29, 1	1991-10-29

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