TATARA; Ryoji

Patent Applications and Registrations

Patent applications and USPTO patent grants for TATARA; Ryoji.The latest application filed is for "photosensitive resin composition".

Company Profile

3.1.8

TATARA; Ryoji - Tokyo JP
TATARA; Ryoji - Minato-ku Tokyo
- Tokyo JP
Tatara; Ryoji - Tsukuba JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive Resin Composition App 20220043346 - KANNO; Kimiyuki ; et al.	2022-02-10
Photosensitive Resin Composition App 20220043345 - TSUYUKI; Ryouta ; et al.	2022-02-10
Photosensitive Resin Composition, Method For Producing Resin Film Having Pattern, Resin Film Having Pattern, And Semiconductor Circuit Substrate App 20210286262 - YAMAGUCHI; Torahiko ; et al.	2021-09-16
Polymer, resin composition and resin molded product Grant 10,266,650 - Nawate , et al.	2019-04-23
Polymer, resin composition and resin molded product Grant 10227449 -	2019-03-12
Polymer, Resin Composition And Resin Molded Product App 20180179335 - Nawate; Yuuya ; et al.	2018-06-28
Polymer, Resin Composition And Resin Molded Product App 20180009938 - ANABUKI; Shoma ; et al.	2018-01-11
Polymer, Resin Composition And Resin Molded Product App 20170369649 - Nawate; Yuuya ; et al.	2017-12-28
Photocurable resin composition App 20070096355 - Yashiro; Takao ; et al.	2007-05-03
Photocurable resin composition App 20070004816 - Yashiro; Takao ; et al.	2007-01-04

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