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Tanjyo, Masayasu Patent Filings

Tanjyo, Masayasu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tanjyo, Masayasu.The latest application filed is for "method for forming an soi substrate by use of plasma ion irradiation".

Company Profile
0.2.1
  • Tanjyo, Masayasu - Kyoto JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method For Forming An Soi Substrate By Use Of Plasma Ion Irradiation
App 20020155679 - Ogura, Atsushi ;   et al.
2002-10-24
Method and apparatus for deflecting charged particles
Grant 6,160,262 - Aoki , et al. December 12, 2
2000-12-12
Ion source having a mass separation device
Grant 5,189,303 - Tanjyo , et al. February 23, 1
1993-02-23

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