loadpatents
name:-0.014524936676025
name:-0.010687828063965
name:-0.00040388107299805
Taniguchi; Yuzo Patent Filings

Taniguchi; Yuzo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Taniguchi; Yuzo.The latest application filed is for "method of making gas discharge display panel and gas discharge display device".

Company Profile
0.8.6
  • Taniguchi; Yuzo - Kodaira JP
  • Taniguchi; Yuzo - Higashimurayama JP
  • Taniguchi, Yuzo - Tokyo JP
  • Taniguchi, Yuzo - Kodaira-shi JP
  • Taniguchi, Yuzo - Higashimurayama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system
Grant 6,650,409 - Noguchi , et al. November 18, 2
2003-11-18
Inspection data analyzing system
Grant 6,628,817 - Ishikawa , et al. September 30, 2
2003-09-30
Method of making gas discharge display panel and gas discharge display device
Grant 6,624,575 - Nishiki , et al. September 23, 2
2003-09-23
Wiring substrate and gas discharge display device
Grant 6,621,217 - Nishiki , et al. September 16, 2
2003-09-16
Process for manufacturing electronic circuit devices
Grant 6,471,115 - Ijuin , et al. October 29, 2
2002-10-29
Method of making gas discharge display panel and gas discharge display device
App 20020089285 - Nishiki, Masashi ;   et al.
2002-07-11
Wiring substrate and gas discharge display device
App 20020070665 - Nishiki, Masashi ;   et al.
2002-06-13
Inspection data analyzing system
App 20020034326 - Ishikawa, Seiji ;   et al.
2002-03-21
Wiring substrate and gas discharge display device
App 20020014841 - Nishiki, Masashi ;   et al.
2002-02-07
Inspection data analyzing system
App 20010038708 - Ishikawa, Seiji ;   et al.
2001-11-08
Inspection data analyzing system
App 20010001015 - Ishikawa, Seiji ;   et al.
2001-05-10
Inspection system and method using separate processors for processing different information regarding a workpiece such as an electronic device
Grant 6,185,322 - Ishikawa , et al. February 6, 2
2001-02-06
Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line
Grant 5,274,434 - Morioka , et al. December 28, 1
1993-12-28
Pattern defect inspection apparatus
Grant 4,731,855 - Suda , et al. March 15, 1
1988-03-15

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