Tang; Shane

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tang; Shane.The latest application filed is for "conformal damage-free encapsulation of chalcogenide materials".

Company Profile

3.7.9

Tang; Shane - Camas WA
Tang; Shane - West Linn OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20220115592 - Sims; James Samuel ; et al.	2022-04-14
Conformal damage-free encapsulation of chalcogenide materials Grant 11,239,420 - Sims , et al. February 1, 2	2022-02-01
Method Of Depositing Silicon Nitride Films App 20210384028 - SIMS; James S. ; et al.	2021-12-09
Selective inhibition in atomic layer deposition of silicon-containing films Grant 10,804,099 - Henri , et al. October 13, 2	2020-10-13
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20200066987 - Sims; James Samuel ; et al.	2020-02-27
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20180138028 - Henri; Jon ; et al.	2018-05-17
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,875,891 - Henri , et al. January 23, 2	2018-01-23
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20170117134 - Henri; Jon ; et al.	2017-04-27
Method of depositing ammonia free and chlorine free conformal silicon nitride film Grant 9,589,790 - Henri , et al. March 7, 2	2017-03-07
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,564,312 - Henri , et al. February 7, 2	2017-02-07
Deposition of conformal films by atomic layer deposition and atomic layer etch Grant 9,502,238 - Danek , et al. November 22, 2	2016-11-22
Deposition Of Conformal Films By Atomic Layer Deposition And Atomic Layer Etch App 20160293398 - Danek; Michal ; et al.	2016-10-06
Method Of Depositing Ammonia Free And Chlorine Free Conformal Silicon Nitride Film App 20160148806 - Henri; Jon ; et al.	2016-05-26
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20160148800 - Henri; Jon ; et al.	2016-05-26
Plasma enhanced atomic layer deposition with pulsed plasma exposure Grant 9,076,646 - Sims , et al. July 7, 2	2015-07-07
Plasma Enhanced Atomic Layer Deposition With Pulsed Plasma Exposure App 20140113457 - Sims; James S. ; et al.	2014-04-24

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