| Patent | Date |
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Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,444,628 - Kori , et al. Oc | 2019-10-15 |
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,429,739 - Kori , et al. O | 2019-10-01 |
Composition for forming a coating type BPSG film, substrate, and patterning process
Grant 9,902,875 - Tachibana , et al. February 27, 2 | 2018-02-27 |
Composition for forming a coating type silicon-containing film, substrate, and patterning process
Grant 9,880,470 - Tachibana , et al. January 30, 2 | 2018-01-30 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170183531 - KORI; Daisuke ; et al. | 2017-06-29 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170184968 - KORI; Daisuke ; et al. | 2017-06-29 |
Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
Grant 9,627,204 - Ogihara , et al. April 18, 2 | 2017-04-18 |
Patterning process using a boron phosphorus silicon glass film
Grant 9,580,623 - Tachibana , et al. February 28, 2 | 2017-02-28 |
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
Grant 9,522,979 - Watanabe , et al. December 20, 2 | 2016-12-20 |
Patterning Process
App 20160276152 - TACHIBANA; Seiichiro ; et al. | 2016-09-22 |
Fluorine-containing Silicon Compound, Method For Producing Same, And Method For Producing Fluorine-containing Silicon Resin
App 20160229960 - WATANABE; Takeru ; et al. | 2016-08-11 |
Compositon for forming metal oxide-containing film and patterning process
Grant 9,377,690 - Ogihara , et al. June 28, 2 | 2016-06-28 |
Method for producing semiconductor apparatus substrate
Grant 9,312,127 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Composition For Forming A Coating Type Bpsg Film, Substrate, And Patterning Process
App 20160096978 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Composition For Forming A Coating Type Silicon-containing Film, Substrate, And Patterning Process
App 20160096977 - TACHIBANA; Seiichiro ; et al. | 2016-04-07 |
Method For Producing Semiconductor Apparatus Substrate
App 20160064220 - OGIHARA; Tsutomu ; et al. | 2016-03-03 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,188,866 - Ogihara , et al. November 17, 2 | 2015-11-17 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,176,382 - Ogihara , et al. November 3, 2 | 2015-11-03 |
Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
Grant 9,075,309 - Ogihara , et al. July 7, 2 | 2015-07-07 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,945,820 - Ogihara , et al. February 3, 2 | 2015-02-03 |
Composition for forming a silicon-containing resist underlayer film and patterning process using the same
Grant 8,932,953 - Ogihara , et al. January 13, 2 | 2015-01-13 |
Composition For Forming A Coating Type Bpsg Film, Substrate Formed A Film By Said Composition, And Patterning Process Using Said Composition
App 20150004791 - OGIHARA; Tsutomu ; et al. | 2015-01-01 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273447 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273448 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Compositon For Forming Metal Oxide-containing Film And Patterning Process
App 20140193757 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140193975 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Patterning process
Grant 8,759,220 - Ogihara , et al. June 24, 2 | 2014-06-24 |
Silicon Compound, Silicon-containing Compound, Composition For Forming Resist Underlayer Film Containing The Same And Patterning Process
App 20130280912 - OGIHARA; Tsutomu ; et al. | 2013-10-24 |
Silicon-containing Surface Modifier, Resist Underlayer Film Composition Containing This, And Patterning Process
App 20130210236 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing Surface Modifier, Resist Lower Layer Film-forming Composition Containing The Same, And Patterning Process
App 20130210229 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137271 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Composition For Forming A Silicon-containing Resist Underlayer Film And Patterning Process Using The Same
App 20130045601 - OGIHARA; Tsutomu ; et al. | 2013-02-21 |
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