Tandon; Sanjeev

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tandon; Sanjeev.The latest application filed is for "method of optimizing an interface for processing of an organic semiconductor".

Company Profile

0.7.10

Tandon; Sanjeev - Colorado Springs CO
Tandon; Sanjeev - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of optimizing an interface for processing of an organic semiconductor Grant 9,929,215 - Rodriquez , et al. March 27, 2	2018-03-27
Method Of Optimizing An Interface For Processing Of An Organic Semiconductor App 20180019284 - Rodriquez; Robert ; et al.	2018-01-18
Method For Silicon Based Dielectric Chemical Vapor Deposition App 20090111284 - Wang; Yaxin ; et al.	2009-04-30
Silicon nitride film with stress control Grant 7,488,690 - Iyer , et al. February 10, 2	2009-02-10
Method for silicon based dielectric chemical vapor deposition Grant 7,473,655 - Wang , et al. January 6, 2	2009-01-06
Method of fabricating a silicon nitride stack Grant 7,465,669 - Iyer , et al. December 16, 2	2008-12-16
Method for fabricating controlled stress silicon nitride films Grant 7,416,995 - Iyer , et al. August 26, 2	2008-08-26
Method for silicon nitride chemical vapor deposition Grant 7,365,029 - Iyer , et al. April 29, 2	2008-04-29
Precursors And Hardware For Cvd And Ald App 20080063798 - Kher; Shreyas S. ; et al.	2008-03-13
Method for fabricating silicon nitride spacer structures Grant 7,294,581 - Iyer , et al. November 13, 2	2007-11-13
Method of fabricating a silicon nitride stack App 20070111538 - Iyer; R. Suryanarayanan ; et al.	2007-05-17
Method for fabricating controlled stress silicon nitride films App 20070111546 - Iyer; R. Suryanarayanan ; et al.	2007-05-17
Method for fabricating silicon nitride spacer structures App 20070087575 - Iyer; R. Suryanarayanan ; et al.	2007-04-19
Method for silicon based dielectric chemical vapor deposition App 20060286818 - Wang; Yaxin ; et al.	2006-12-21
Silicon nitride film with stress control App 20060009041 - Iyer; R. Suryanarayanan ; et al.	2006-01-12
Method for silicon nitride chemical vapor deposition App 20050255714 - Iyer, R. Suryanarayanan ; et al.	2005-11-17
Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamber App 20050109276 - Iyer, R. Suryanarayanan ; et al.	2005-05-26

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.