| Patent | Date |
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Development defect preventing process and material
Grant 7,195,863 - Takano , et al. March 27, 2 | 2007-03-27 |
Etching method and composition for forming etching protective layer
Grant 7,141,177 - Tanaka November 28, 2 | 2006-11-28 |
Method for forming pattern and treating agent for use therein
Grant 7,018,785 - Ono , et al. March 28, 2 | 2006-03-28 |
Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom
Grant 6,939,661 - Kang , et al. September 6, 2 | 2005-09-06 |
Etching method and composition for forming etching protective layer
App 20040238486 - Tanaka, Hatsuyuki | 2004-12-02 |
Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition
Grant 6,803,168 - Padmanaban , et al. October 12, 2 | 2004-10-12 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
Grant 6,737,492 - Kang , et al. May 18, 2 | 2004-05-18 |
Method for forming pattern and treating agent for use therein
App 20040053170 - Ijima, Kazuyo ; et al. | 2004-03-18 |
Composition for antireflection coating
Grant 6,692,892 - Takano , et al. February 17, 2 | 2004-02-17 |
Development deffect preventing process and material
App 20030180667 - Takano, Yusuke ; et al. | 2003-09-25 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
App 20030065119 - Kang, Wen-Bing ; et al. | 2003-04-03 |
Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom
App 20030027078 - Kang, Wen-Bing ; et al. | 2003-02-06 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
Grant 6,468,718 - Kang , et al. October 22, 2 | 2002-10-22 |
Antireflection or light-absorbing coating composition and polymer therefor
Grant 6,329,117 - Padmanaban , et al. December 11, 2 | 2001-12-11 |
Light-absorbing polymers and application thereof to anti-reflection film
Grant 6,255,405 - Kang , et al. July 3, 2 | 2001-07-03 |
Method for forming a protective coating film on electronic parts and devices
Grant 5,520,952 - Tanitsu , et al. May 28, 1 | 1996-05-28 |
Method and liquid coating composition for the formation of silica-based coating film on substrate surface
Grant 5,496,402 - Sakamoto , et al. March 5, 1 | 1996-03-05 |
Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent
Grant 5,100,758 - Tanaka , et al. March 31, 1 | 1992-03-31 |
Developer solution for positive-working resist composition
Grant 4,997,748 - Takeda , et al. March 5, 1 | 1991-03-05 |
Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
Grant 4,882,260 - Kohara , et al. November 21, 1 | 1989-11-21 |
Method for forming a resist pattern on a substrate surface and a scum-remover therefor
Grant 4,873,177 - Tanaka , et al. October 10, 1 | 1989-10-10 |
Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant
Grant 4,833,067 - Tanaka , et al. May 23, 1 | 1989-05-23 |
Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation
Grant 4,804,612 - Asaumi , et al. February 14, 1 | 1989-02-14 |
Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
Grant 4,784,937 - Tanaka , et al. November 15, 1 | 1988-11-15 |
Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins
Grant 4,731,319 - Kohara , et al. March 15, 1 | 1988-03-15 |
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