TANABE; Hiroyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for TANABE; Hiroyoshi.The latest application filed is for "reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing mask blank and mask".

Company Profile

0.8.9

TANABE; Hiroyoshi - Tokyo JP
Tanabe; Hiroyoshi - Muroran JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective Mask Blank For Euv Lithography, Reflective Mask For Euv Lithography, And Method For Manufacturing Mask Blank And Mask App 20220299862 - AKAGI; Daijiro ; et al.	2022-09-22
Reflective Mask Blank And Reflective Mask App 20220236636 - TANABE; Hiroyoshi ; et al.	2022-07-28
Reflective Mask Blank For Euvl, Reflective Mask For Euvl, And Method Of Manufacturing Reflective Mask For Euvl App 20220187699 - TANABE; Hiroyoshi	2022-06-16
Reflective Mask Blank For Euv Exposure, And Reflective Mask App 20220163879 - TANABE; Hiroyoshi	2022-05-26
Reflective mask blank for EUV exposure, and reflective mask Grant 11,281,088 - Tanabe March 22, 2	2022-03-22
Reflective Mask Blank, Reflective Mask, And Process For Producing Reflective Mask Blank App 20210349387 - TANABE; Hiroyoshi ; et al.	2021-11-11
Reflective Mask Blank For Euv Lithography App 20210325772 - KAWAHARA; Hirotomo ; et al.	2021-10-21
Reflective mask blank, reflective mask, and process for producing reflective mask blank Grant 10,890,842 - Tanabe January 12, 2	2021-01-12
Reflective Mask Blank, Reflective Mask, And Method Of Manufacturing Reflective Mask Blank App 20190384156 - TANABE; Hiroyoshi	2019-12-19
Reflective Mask Blank, Reflective Mask, And Process For Producing Reflective Mask Blank App 20190086791 - TANABE; Hiroyoshi	2019-03-21
Reflective Mask Blank For Euv Exposure, And Reflective Mask App 20180299766 - TANABE; Hiroyoshi	2018-10-18
Photomask and method of exposure using same Grant 6,150,059 - Tanabe , et al. November 21, 2	2000-11-21
Halftone phase-shift mask and halftone phase-shift mask defect correction method Grant 5,945,237 - Tanabe August 31, 1	1999-08-31
Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer Grant 5,631,110 - Shioiri , et al. May 20, 1	1997-05-20
Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer Grant 5,559,583 - Tanabe September 24, 1	1996-09-24
Phase shifting mask Grant 5,275,894 - Tanabe January 4, 1	1994-01-04
Process for preparation of thick films by electrophoresis Grant 5,002,647 - Tanabe , et al. March 26, 1	1991-03-26

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