| Patent | Date |
|---|
Method For Etching Features Using A Targeted Deposition For Selective Passivation
App 20220301853 - LIU; Wenchi ; et al. | 2022-09-22 |
Semiconductor Mask Reshaping Using A Sacrificial Layer
App 20220076962 - Tan; Zhongkui ; et al. | 2022-03-10 |
Directional Deposition In Etch Chamber
App 20220028697 - Tan; Zhongkui ; et al. | 2022-01-27 |
Silicon Oxide Silicon Nitride Stack Stair Step Etch
App 20210407811 - QIN; Ce ; et al. | 2021-12-30 |
Methods and systems for advanced ion control for etching processes
Grant 11,049,726 - Tan , et al. June 29, 2 | 2021-06-29 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20210193474 - Tan; Zhongkui ; et al. | 2021-06-24 |
Amorphous carbon layer opening process
Grant 11,037,784 - Qin , et al. June 15, 2 | 2021-06-15 |
Methods and systems for advanced ion control for etching processes
Grant 10,943,789 - Tan , et al. March 9, 2 | 2021-03-09 |
Amorphous Carbon Layer Opening Process
App 20210035796 - QIN; Ce ; et al. | 2021-02-04 |
Silicon-based deposition for semiconductor processing
Grant 10,658,194 - Tan , et al. | 2020-05-19 |
Edge Ring Focused Deposition During A Cleaning Process Of A Processing Chamber
App 20190341275 - JIN; Yansha ; et al. | 2019-11-07 |
Method and apparatus for anisotropic tungsten etching
Grant 10,354,888 - Tan , et al. July 16, 2 | 2019-07-16 |
Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber
Grant 10,242,845 - Tan , et al. | 2019-03-26 |
Methods and systems for plasma etching using bi-modal process gas composition responsive to plasma power level
Grant 10,177,003 - Tan , et al. J | 2019-01-08 |
Near-Substrate Supplemental Plasma Density Generation with Low Bias Voltage within Inductively Coupled Plasma Processing Chamber
App 20180204708 - Tan; Zhongkui ; et al. | 2018-07-19 |
Edge roughness reduction
Grant 10,020,183 - Jin , et al. July 10, 2 | 2018-07-10 |
Silicon oxide silicon nitride stack ion-assisted etch
Grant 9,997,366 - Tan , et al. June 12, 2 | 2018-06-12 |
Atomic layer etching in continuous plasma
Grant 9,991,128 - Tan , et al. June 5, 2 | 2018-06-05 |
Silicon Oxide Silicon Nitride Stack Ion-assisted Etch
App 20180108532 - TAN; Zhongkui ; et al. | 2018-04-19 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20180090334 - Tan; Zhongkui ; et al. | 2018-03-29 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20180076045 - Tan; Zhongkui ; et al. | 2018-03-15 |
Silicon-based Deposition For Semiconductor Processing
App 20180061659 - TAN; Zhongkui ; et al. | 2018-03-01 |
Methods and Systems for Independent Control of Radical Density, Ion Density, and Ion Energy in Pulsed Plasma Semiconductor Device Fabrication
App 20180005803 - Tan; Zhongkui ; et al. | 2018-01-04 |
Line edge roughness improvement with photon-assisted plasma process
Grant 9,859,127 - Tan , et al. January 2, 2 | 2018-01-02 |
Systems and Methods for Reverse Pulsing
App 20170372912 - Long; Maolin ; et al. | 2017-12-28 |
Line edge roughness improvement with sidewall sputtering
Grant 9,852,924 - Tan , et al. December 26, 2 | 2017-12-26 |
Line Edge Roughness Improvement With Photon-assisted Plasma Process
App 20170358456 - TAN; Zhongkui ; et al. | 2017-12-14 |
Methods and systems for advanced ion control for etching processes
Grant 9,824,896 - Tan , et al. November 21, 2 | 2017-11-21 |
Methods and Systems for Plasma Etching Using Bi-Modal Process Gas Composition Responsive to Plasma Power Level
App 20170271166 - Tan; Zhongkui ; et al. | 2017-09-21 |
Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication
Grant 9,767,991 - Tan , et al. September 19, 2 | 2017-09-19 |
Systems and methods for reverse pulsing
Grant 9,761,459 - Long , et al. September 12, 2 | 2017-09-12 |
Atomic Layer Etching In Continuous Plasma
App 20170229311 - Tan; Zhongkui ; et al. | 2017-08-10 |
Method And Apparatus For Anisotropic Tungsten Etching
App 20170194166 - Tan; Zhongkui ; et al. | 2017-07-06 |
Methods and systems for plasma etching using bi-modal process gas composition responsive to plasma power level
Grant 9,691,625 - Tan , et al. June 27, 2 | 2017-06-27 |
Methods and Systems for Independent Control of Radical Density, Ion Density, and Ion Energy in Pulsed Plasma Semiconductor Device Fabrication
App 20170125216 - Tan; Zhongkui ; et al. | 2017-05-04 |
Methods and Systems for Plasma Etching Using Bi-Modal Process Gas Composition Responsive to Plasma Power Level
App 20170125253 - Tan; Zhongkui ; et al. | 2017-05-04 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20170125260 - Tan; Zhongkui ; et al. | 2017-05-04 |
Method and apparatus for anisotropic tungsten etching
Grant 9,633,867 - Tan , et al. April 25, 2 | 2017-04-25 |
Systems and methods for reverse pulsing
Grant 9,583,357 - Long , et al. February 28, 2 | 2017-02-28 |
Systems And Methods For Reverse Pulsing
App 20170040174 - Long; Maolin ; et al. | 2017-02-09 |
Systems And Methods For Reverse Pulsing
App 20170040176 - Long; Maolin ; et al. | 2017-02-09 |
Method And Apparatus For Anisotropic Tungsten Etching
App 20160196985 - Tan; Zhongkui ; et al. | 2016-07-07 |
| 