Tan; Samantha SiamHwa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tan; Samantha SiamHwa.The latest application filed is for "atomic layer etch and ion beam etch patterning".

Company Profile

5.3.16

Tan; Samantha SiamHwa - Newark CA
TAN; Samantha SiamHwa - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Deposition of self assembled monolayer for enabling selective deposition and etch Grant 11,450,532 - Lee , et al. September 20, 2	2022-09-20
Atomic Layer Etch And Ion Beam Etch Patterning App 20220254649 - TAN; Samantha SiamHwa ; et al.	2022-08-11
Photoresist Development With Halide Chemistries App 20220244645 - Tan; Samantha SiamHwa ; et al.	2022-08-04
Selective Carbon Deposition App 20220235464 - GUPTA; Awnish ; et al.	2022-07-28
Deposition Of Self Assembled Monolayer For Enabling Selective Deposition And Etch App 20220208555 - LEE; Younghee ; et al.	2022-06-30
Carbon Based Depositions Used For Critical Dimension Control During High Aspect Ratio Feature Etches And For Forming Protective Layers App 20220199417 - HENRI; Jon ; et al.	2022-06-23
Atomic Layer Etching For Subtractive Metal Etch App 20220199422 - YANG; Wenbing ; et al.	2022-06-23
High Etch Selectivity, Low Stress Ashable Carbon Hard Mask App 20220181147 - XUE; Jun ; et al.	2022-06-09
Tin oxide mandrels in patterning Grant 11,355,353 - Yu , et al. June 7, 2	2022-06-07
Selective Etch Using A Sacrificial Mask App 20220122848 - PETER; Daniel ; et al.	2022-04-21
Removing Metal Contamination From Surfaces Of A Processing Chamber App 20220037132 - YU; Jengyi ; et al.	2022-02-03
Dry Development Of Resists App 20220020584 - Volosskiy; Boris ; et al.	2022-01-20
Selectively Etching For Nanowires App 20210335626 - XUE; Jun ; et al.	2021-10-28
Selectively Etching For Nanowires App 20210272814 - PETER; Daniel ; et al.	2021-09-02
Metal-containing Passivation For High Aspect Ratio Etch App 20210242032 - COLINJIVADI; Karthik S. ; et al.	2021-08-05
Plasma Etching Chemistries Of High Aspect Ratio Features In Dielectrics App 20210005472 - KANARIK; Keren J. ; et al.	2021-01-07
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 10,515,816 - Kanarik , et al. Dec	2019-12-24
Tin Oxide Mandrels In Patterning App 20190237341 - Yu; Jengyi ; et al.	2019-08-01
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20190139778 - Kanarik; Keren Jacobs ; et al.	2019-05-09

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.