loadpatents
name:-0.0034480094909668
name:-0.074092864990234
name:-0.00079488754272461
Tamura; Hidemasa Patent Filings

Tamura; Hidemasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tamura; Hidemasa.The latest application filed is for "contoured sputtering target".

Company Profile
0.10.0
  • Tamura; Hidemasa - Sendai JP
  • Tamura; Hidemasa - Kanagawa JP
  • Tamura; Hidemasa - Yokohama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Contoured sputtering target
Grant 6,086,735 - Gilman , et al. July 11, 2
2000-07-11
Method for manufacturing fine lead titanate powders
Grant 4,810,484 - Uedaira , et al. March 7, 1
1989-03-07
Method for manufacturing dielectric fine powder of Ba.sub.1-x Sr.sub.x TiO.sub.3
Grant 4,677,083 - Uedaira , et al. * June 30, 1
1987-06-30
Method for manufacturing fine powder of barium zirconate
Grant 4,595,580 - Uedaira , et al. June 17, 1
1986-06-17
Method for manufacturing dielectric metal titanate
Grant 4,587,041 - Uedaira , et al. May 6, 1
1986-05-06
Method for manufacturing fine powder of SrZrO.sub.3
Grant 4,547,355 - Uedaira , et al. October 15, 1
1985-10-15
Method of manufacturing metal titanate fine powder
Grant 4,520,004 - Uedaira , et al. May 28, 1
1985-05-28
Method of making a rotary ball display device
Grant 4,438,160 - Ishikawa , et al. March 20, 1
1984-03-20
Dew-sensing hygroscopic element
Grant 4,167,725 - Shimizu , et al. September 11, 1
1979-09-11
Piezoelectric resonator with multi layer electrodes
Grant 3,891,873 - Yanagisawa , et al. June 24, 1
1975-06-24

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