TAMAMUSHI; Shuichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for TAMAMUSHI; Shuichi.The latest application filed is for "process condition estimating apparatus, method, and program".

Company Profile

1.28.25

TAMAMUSHI; Shuichi - Tokyo JP
Tamamushi; Shuichi - Hwaseong-si KR
Tamamushi; Shuichi - Kanagawa JP
Tamamushi; Shuichi - Seoul KR
Tamamushi; Shuichi - Fujisawa JP
Tamamushi; Shuichi - Fujisawa-shi JP
Tamamushi; Shuichi - Kawasaki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process Condition Estimating Apparatus, Method, And Program App 20220254009 - ISHIKAWA; Akio ; et al.	2022-08-11
Aperture system of electron beam apparatus, electron beam exposure apparatus, and electron beam exposure apparatus system Grant 10,497,534 - Lee , et al. De	2019-12-03
Aperture System Of Electron Beam Apparatus, Electron Beam Exposure Apparatus, And Electron Beam Exposure Apparatus System App 20190180972 - LEE; Hyun Ho ; et al.	2019-06-13
Method of correcting mask pattern and method of manufacturing reticle Grant 10,012,900 - Kim , et al. July 3, 2	2018-07-03
Exposure method using electron beam and substrate manufacturing method using the same Grant 9,709,893 - Lee , et al. July 18, 2	2017-07-18
Method Of Correcting Mask Pattern And Method Of Manufacturing Reticle App 20170082921 - KIM; Jong-su ; et al.	2017-03-23
Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same Grant 9,583,305 - Jung , et al. February 28, 2	2017-02-28
Exposure Method Using Electron Beam And Substrate Manufacturing Method Using The Same App 20160223903 - LEE; SOOK HYUN ; et al.	2016-08-04
Inspection system and method for inspecting line width and/or positional errors of a pattern Grant 9,406,117 - Touya , et al. August 2, 2	2016-08-02
Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table Grant 9,343,266 - Ogasawara , et al. May 17, 2	2016-05-17
Exposure Method Using Control Of Settling Times And Methods Of Manufacturing Integrated Circuit Devices By Using The Same App 20150311032 - JUNG; Yong-Seok ; et al.	2015-10-29
Inspection System And Method For Inspecting Line Width And/or Positional Errors Of A Pattern App 20150193918 - TOUYA; Takanao ; et al.	2015-07-09
Inspection system and method for inspecting line width and/or positional errors of a pattern Grant 9,036,896 - Touya , et al. May 19, 2	2015-05-19
Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens Grant 8,927,941 - Touya , et al. January 6, 2	2015-01-06
Charged Particle Beam Pattern Writing Method And Charged Particle Beam Writing Apparatus App 20140061499 - Ogasawara; Munehiro ; et al.	2014-03-06
Multi Charged Particle Beam Writing Apparatus And Multi Charged Particle Beam Writing Method App 20130240750 - Touya; Takanao ; et al.	2013-09-19
Apparatus and method for pattern inspection Grant 8,452,074 - Tamamushi May 28, 2	2013-05-28
Apparatus And Method For Pattern Inspection App 20130010291 - TAMAMUSHI; Shuichi	2013-01-10
Apparatus and method for pattern inspection Grant 8,306,310 - Tamamushi November 6, 2	2012-11-06
Move mechanism for moving target object and charged particle beam writing apparatus Grant 8,277,603 - Tamamushi , et al. October 2, 2	2012-10-02
Mask inspection apparatus and mask inspection method Grant 8,229,207 - Tamamushi July 24, 2	2012-07-24
Charged particle beam drawing apparatus and proximity effect correction method thereof Grant 8,207,514 - Hara , et al. June 26, 2	2012-06-26
Correcting substrate for charged particle beam lithography apparatus Grant 8,183,544 - Tsuruta , et al. May 22, 2	2012-05-22
Inspection System And Method For Inspecting Line Width And/or Positional Errors Of A Pattern App 20110255770 - Touya; Takanao ; et al.	2011-10-20
Charged Particle Beam Drawing Apparatus And Proximity Effect Correction Method Thereof App 20110068281 - HARA; Shigehiro ; et al.	2011-03-24
Charged particle beam lithography system and method for evaluating the same Grant 7,834,333 - Nishimura , et al. November 16, 2	2010-11-16
System and method for charged-particle beam lithography Grant 7,800,084 - Tamamushi September 21, 2	2010-09-21
Lithography method of electron beam App 20100178611 - Anze; Hirohito ; et al.	2010-07-15
Mask Inspection Apparatus And Mask Inspection Method App 20100074513 - TAMAMUSHI; Shuichi	2010-03-25
Mask Inspection Apparatus, And Exposure Method And Mask Inspection Method Using The Same App 20100074511 - TAMAMUSHI; Shuichi ; et al.	2010-03-25
Apparatus And Method For Pattern Inspection App 20100067778 - TAMAMUSHI; Shuichi	2010-03-18
Method of calculating deflection aberration correcting voltage and charged particle beam writing method Grant 7,679,068 - Kamikubo , et al. March 16, 2	2010-03-16
Position measuring apparatus and positional deviation measuring method Grant 7,643,130 - Yoshitake , et al. January 5, 2	2010-01-05
Correcting Substrate For Charged Particle Beam Lithography Apparatus App 20090242807 - TSURUTA; Kaoru ; et al.	2009-10-01
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus Grant 7,554,107 - Yoshitake , et al. June 30, 2	2009-06-30
Electron beam writing apparatus and writing method Grant 7,485,879 - Sunaoshi , et al. February 3, 2	2009-02-03
Charged Particle Beam Writing Apparatus And Method App 20080265174 - HIRAMOTO; Makoto ; et al.	2008-10-30
System And Method For Charged-particle Beam Lithography App 20080105827 - Tamamushi; Shuichi	2008-05-08
Charged Particle Beam Lithography System And Method For Evaluating The Same App 20080067338 - Nishimura; Rieko ; et al.	2008-03-20
Forming Method Of Resist Pattern And Writing Method Of Charged Particle Beam App 20070243487 - Anze; Hirohito ; et al.	2007-10-18
Method Of Calculating Deflection Aberration Correcting Voltage And Charged Particle Beam Writing Method App 20070158576 - Kamikubo; Takashi ; et al.	2007-07-12
Move mechanism for moving target object and charged particle beam writing apparatus App 20070152169 - Tamamushi; Shuichi ; et al.	2007-07-05
Position Measuring Apparatus And Positional Deviation Measuring Method App 20070103657 - YOSHITAKE; Shusuke ; et al.	2007-05-10
Writing Method And Writing Apparatus Of Charged Particle Beam, Positional Deviation Measuring Method, And Position Measuring Apparatus App 20070103659 - YOSHITAKE; Shusuke ; et al.	2007-05-10
Electron beam writing apparatus and writing method App 20070023703 - Sunaoshi; Hitoshi ; et al.	2007-02-01
Charged beam drawing method Grant 5,894,057 - Yamaguchi , et al. April 13, 1	1999-04-13
Charged beam lithography method Grant 5,885,747 - Yamasaki , et al. March 23, 1	1999-03-23
Method for correcting astigmatism and focusing in charged particle optical lens-barrel Grant 5,793,041 - Ogasawara , et al. August 11, 1	1998-08-11
Filter manufacturing apparatus Grant 5,707,501 - Inoue , et al. January 13, 1	1998-01-13
Projectin exposure apparatus Grant 5,627,626 - Inoue , et al. May 6, 1	1997-05-06
Method of correcting astigmatism of variable shaped beam Grant 5,047,646 - Hattori , et al. September 10, 1	1991-09-10

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