loadpatents
Patent applications and USPTO patent grants for Tamagaki; Hiroshi.The latest application filed is for "deposition device and deposition method".
Patent | Date |
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Glass film transfer apparatus Grant 9,828,205 - Tamagaki , et al. November 28, 2 | 2017-11-28 |
Deposition device and deposition method Grant 9,758,857 - Nagamine , et al. September 12, 2 | 2017-09-12 |
Sputter device Grant 9,617,634 - Okimoto , et al. April 11, 2 | 2017-04-11 |
Plasma CVD apparatus Grant 9,562,290 - Tamagaki , et al. February 7, 2 | 2017-02-07 |
Substrate transport roller Grant 9,550,202 - Ohba , et al. January 24, 2 | 2017-01-24 |
Deposition Device And Deposition Method App 20160047032 - NAGAMINE; Asuka ;   et al. | 2016-02-18 |
Method of producing .alpha. crystal structure-based alumina films Grant 9,260,776 - Kohara , et al. February 16, 2 | 2016-02-16 |
In-line Plasma Cvd Apparatus App 20150329968 - Tamagaki; Hiroshi ;   et al. | 2015-11-19 |
Plasma CVD apparatus Grant 9,133,547 - Tamagaki , et al. September 15, 2 | 2015-09-15 |
Glass Film Transfer Apparatus App 20150246787 - Tamagaki; Hiroshi ;   et al. | 2015-09-03 |
Substrate Transport Roller App 20150238995 - Ohba; Naoki ;   et al. | 2015-08-27 |
Web Substrate Roll-forming Apparatus And Web Substrate Roll App 20150176118 - Tamagaki; Hiroshi ;   et al. | 2015-06-25 |
Glass Film Conveying Device App 20150165749 - Tamagaki; Hiroshi | 2015-06-18 |
Plasma Cvd Apparatus App 20140318454 - Tamagaki; Hiroshi ;   et al. | 2014-10-30 |
Plasma Source And Vacuum Plasma Processing Apparatus Provided With Same App 20140312761 - Tamagaki; Hiroshi | 2014-10-23 |
Continuous deposition apparatus Grant 8,821,638 - Tamagaki , et al. September 2, 2 | 2014-09-02 |
Vacuum Coating Apparatus App 20140110253 - Tamagaki; Hiroshi ;   et al. | 2014-04-24 |
Plasma Cvd Apparatus App 20130269610 - Tamagaki; Hiroshi ;   et al. | 2013-10-17 |
Vacuum Coating Apparatus App 20130186334 - OKIMOTO; Tadao ;   et al. | 2013-07-25 |
Plasma Cvd Apparatus App 20130133577 - Tamagaki; Hiroshi ;   et al. | 2013-05-30 |
Film Formation Apparatus And Film Formation Method App 20130105310 - Hirota; Satoshi ;   et al. | 2013-05-02 |
Process for producing alumina coating composed mainly of .alpha.-type crystal structure Grant 8,323,807 - Kohara , et al. December 4, 2 | 2012-12-04 |
Protective alumina film and production method thereof Grant 8,309,236 - Tamagaki , et al. November 13, 2 | 2012-11-13 |
Continuous film forming apparatus Grant 8,303,714 - Tamagaki November 6, 2 | 2012-11-06 |
Arc ion plating apparatus Grant 8,261,693 - Tamagaki , et al. September 11, 2 | 2012-09-11 |
Cvd Apparatus App 20120180720 - Segawa; Toshiki ;   et al. | 2012-07-19 |
Plasma Cvd Apparatus App 20120174864 - Tamagaki; Hiroshi ;   et al. | 2012-07-12 |
Reactive sputtering method and device Grant 8,163,140 - Ikari , et al. April 24, 2 | 2012-04-24 |
Method Of Producing Alpha Crystal Structure-based Alumina Films App 20110220486 - KOHARA; Toshimitsu ;   et al. | 2011-09-15 |
Protective Alumina Film And Production Method Thereof App 20110200806 - TAMAGAKI; Hiroshi ;   et al. | 2011-08-18 |
Method for preparing alumna coating film having alpha-type crystal structure as primary structure Grant 7,967,957 - Kohara , et al. June 28, 2 | 2011-06-28 |
Sputter Device App 20110147206 - Okimoto; Tadao ;   et al. | 2011-06-23 |
Continuous Deposition Apparatus App 20110139072 - Tamagaki; Hiroshi ;   et al. | 2011-06-16 |
Protective alumina film and production method thereof Grant 7,955,722 - Tamagaki , et al. June 7, 2 | 2011-06-07 |
Arc Ion Plating Apparatus App 20110067631 - Tamagaki; Hiroshi ;   et al. | 2011-03-24 |
Continuous Film Forming Apparatus App 20100313810 - Tamagaki; Hiroshi | 2010-12-16 |
Methods of producing an alumina film mainly in alpha crystal structure and the multilayer film thereof Grant 7,776,393 - Tamagaki , et al. August 17, 2 | 2010-08-17 |
Film Formation Apparatus App 20100187104 - Tamagaki; Hiroshi | 2010-07-29 |
Sputtering Apparatus App 20100181191 - Tamagaki; Hiroshi | 2010-07-22 |
PROCESS FOR PRODUCING AN ALUMINA COATING COMPOSED MAINLY OF a-TYPE CRYSTAL STRUCTURE App 20090214894 - KOHARA; Toshimitsu ;   et al. | 2009-08-27 |
Process For Producing An Alumina Coating Comprised Mainly Of Alpha Crystal Structure App 20090173625 - KOHARA; Toshimitsu ;   et al. | 2009-07-09 |
Process for producing an alumina coating comprised mainly of .alpha. crystal structure Grant 7,531,212 - Kohara , et al. May 12, 2 | 2009-05-12 |
Arc Ion Plating Apparatus App 20070240982 - Tamagaki; Hiroshi ;   et al. | 2007-10-18 |
Multilayered film having excellent wear resistance, heat resistance and adhesion to substrate and method for producing the same Grant 7,241,492 - Kohara , et al. July 10, 2 | 2007-07-10 |
Multilayer coating excellent in wear resistance and heat resistance Grant 7,169,485 - Kohara , et al. January 30, 2 | 2007-01-30 |
Plasma CVD apparatus Grant 7,156,046 - Tamagaki , et al. January 2, 2 | 2007-01-02 |
Alumina protective coating film and method for formation thereof App 20060263640 - Tamagaki; Hiroshi ;   et al. | 2006-11-23 |
Methods of producing an alumina film mainly in alpha crystal structure and the multilayer film thereof App 20060257562 - Tamagaki; Hiroshi ;   et al. | 2006-11-16 |
Multilayer coating excellent in wear resistance and heat resistance App 20060014041 - Kohara; Toshimitsu ;   et al. | 2006-01-19 |
Method for preparing alumna coating film having alpha-type crystal structure as primary structure App 20060006059 - Kohara; Toshimitsu ;   et al. | 2006-01-12 |
Process for producing alumina coating composed mainly of alpha-type crystal structure, alumina coating composed mainly of alpha-type crystal structure, laminate coating including the alumina coating, member clad with the alumina coating or laminate coating, process for producing the member, and phys App 20050276990 - Kohara, Toshimitsu ;   et al. | 2005-12-15 |
Reactive sputtering method and device App 20050205413 - Ikari, Yoshimitsu ;   et al. | 2005-09-22 |
Multilayered film having excellent wear resistance, heat resistance and adhesion to substrate and method for producing the same App 20050058850 - Kohara, Toshimitsu ;   et al. | 2005-03-17 |
Plasma cvd system App 20040045508 - Tamagaki, Hiroshi ;   et al. | 2004-03-11 |
Vacuum coating apparatus App 20030051667 - Tamagaki, Hiroshi | 2003-03-20 |
Vacuum arc deposition apparatus Grant 5,744,017 - Tamagaki , et al. April 28, 1 | 1998-04-28 |
Arc ion plating device and arc ion plating system Grant 5,730,847 - Hanaguri , et al. March 24, 1 | 1998-03-24 |
Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member Grant 5,449,547 - Miyazaki , et al. September 12, 1 | 1995-09-12 |
Vacuum arc deposition device Grant 5,277,714 - Tamagaki January 11, 1 | 1994-01-11 |
Vaccum arc vapor deposition device Grant 5,221,349 - Tamagaki June 22, 1 | 1993-06-22 |
Apparatus and method of cathodic arc deposition Grant 5,126,030 - Tamagaki , et al. June 30, 1 | 1992-06-30 |
Hall accelerator with preionization discharge Grant 4,703,222 - Yoshikawa , et al. October 27, 1 | 1987-10-27 |
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