loadpatents
name:-0.028852939605713
name:-0.03013801574707
name:-0.000579833984375
Talwar; Somit Patent Filings

Talwar; Somit

Patent Applications and Registrations

Patent applications and USPTO patent grants for Talwar; Somit.The latest application filed is for "laser thermal processing with laser diode radiation".

Company Profile
0.29.19
  • Talwar; Somit - Los Gatos CA
  • Talwar; Somit - Bonita CA
  • Talwar; Somit - Palo Alto CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Laser thermal annealing of lightly doped silicon substrates
Grant 7,879,741 - Talwar , et al. February 1, 2
2011-02-01
Laser thermal processing with laser diode radiation
Grant 7,763,828 - Talwar , et al. July 27, 2
2010-07-27
Heated chuck for laser thermal processing
Grant 7,731,798 - Shareef , et al. June 8, 2
2010-06-08
Laser thermal processing with laser diode radiation
App 20090095724 - Talwar; Somit ;   et al.
2009-04-16
Laser thermal annealing of lightly doped silicon substrates
Grant 7,494,942 - Talwar , et al. February 24, 2
2009-02-24
Method of thermal processing a substrate with direct and redirected reflected radiation
Grant 7,399,945 - Talwar , et al. July 15, 2
2008-07-15
Laser thermal processing chuck with a thermal compensating heater module
Grant 7,326,877 - Shareef , et al. February 5, 2
2008-02-05
Laser scanning apparatus and methods for thermal processing
App 20070051708 - Talwar; Somit ;   et al.
2007-03-08
Laser thermal processing chuck with a thermal compensating heater module
App 20070004232 - Shareef; Iqbal A. ;   et al.
2007-01-04
Laser scanning apparatus and methods for thermal processing
Grant 7,157,660 - Talwar , et al. January 2, 2
2007-01-02
Laser scanning apparatus and methods for thermal processing
Grant 7,154,066 - Talwar , et al. December 26, 2
2006-12-26
Laser thermal annealing of lightly doped silicon substrates
Grant 7,148,159 - Talwar , et al. December 12, 2
2006-12-12
Silicon layer for uniformizing temperature during photo-annealing
Grant 7,145,104 - Talwar , et al. December 5, 2
2006-12-05
Laser thermal annealing of lightly doped silicon substrates
App 20060252282 - Talwar; Somit ;   et al.
2006-11-09
Laser thermal annealing of lightly doped silicon substrates
App 20060246694 - Talwar; Somit ;   et al.
2006-11-02
Laser thermal annealing of lightly doped silicon substrates
Grant 7,098,155 - Talwar , et al. August 29, 2
2006-08-29
Heated chuck for laser thermal processing
App 20060113290 - Shareef; Iqbal A. ;   et al.
2006-06-01
Laser thermal processing with laser diode radiation
App 20050189329 - Talwar, Somit ;   et al.
2005-09-01
Silicon layer for uniformizing temperature during photo-annealing
App 20050189340 - Talwar, Somit ;   et al.
2005-09-01
Laser thermal annealing of lightly doped silicon substrates
App 20050103998 - Talwar, Somit ;   et al.
2005-05-19
Laser thermal annealing of lightly doped silicon substrates
App 20050067384 - Talwar, Somit ;   et al.
2005-03-31
Laser thermal processing with laser diode radiation
App 20050045604 - Talwar, Somit ;   et al.
2005-03-03
Methods for annealing a substrate and article produced by such methods
Grant 6,825,101 - Hawryluk , et al. November 30, 2
2004-11-30
Laser scanning apparatus and methods for thermal processing
App 20040188396 - Talwar, Somit ;   et al.
2004-09-30
Laser scanning apparatus and methods for thermal processing
App 20040173585 - Talwar, Somit ;   et al.
2004-09-09
Method for semiconductor gate doping
Grant 6,777,317 - Seibel , et al. August 17, 2
2004-08-17
Laser scanning apparatus and methods for thermal processing
Grant 6,747,245 - Talwar , et al. June 8, 2
2004-06-08
Laser Scanning Apparatus And Methods For Thermal Processing
App 20040084427 - Talwar, Somit ;   et al.
2004-05-06
Selective absorption process for forming an activated doped region in a semiconductor
Grant 6,645,838 - Talwar , et al. November 11, 2
2003-11-11
Method for annealing using partial absorber layer exposed to radiant energy and article made with partial absorber layer
Grant 6,635,541 - Talwar , et al. October 21, 2
2003-10-21
Method for laser thermal processing using thermally induced reflectivity switch
Grant 6,635,588 - Hawryluk , et al. October 21, 2
2003-10-21
Illumination fluence regulation system and method for use in thermal processing employed in the fabrication of reduced-dimension integrated circuits
Grant 6,570,656 - Owens, Jr. , et al. May 27, 2
2003-05-27
Method for semiconductor gate doping
App 20030045074 - Seibel, Cindy ;   et al.
2003-03-06
Thermally induced reflectivity switch for laser thermal processing
Grant 6,495,390 - Hawryluk , et al. December 17, 2
2002-12-17
Thermally induced phase switch for laser thermal processing
Grant 6,479,821 - Hawryluk , et al. November 12, 2
2002-11-12
Method for forming a silicide region on a silicon body
Grant 6,387,803 - Talwar , et al. May 14, 2
2002-05-14
High-speed semiconductor transistor and selective absorption process forming same
Grant 6,380,044 - Talwar , et al. April 30, 2
2002-04-30
Laser thermal process for fabricating field-effect transistors
Grant 6,365,476 - Talwar , et al. April 2, 2
2002-04-02
Thermally induced reflectivity switch for laser thermal processing
App 20020022294 - Hawryluk, Andrew M. ;   et al.
2002-02-21
Thermally induced reflectivity switch for laser thermal processing
App 20020019148 - Hawryluk, Andrew M. ;   et al.
2002-02-14
Methods For Determining Wavelength And Pulse Length Of Radiant Energy Used For Annealing
App 20010039063 - MARKLE, DAVID A. ;   et al.
2001-11-08
Methods for annealing an integrated device using a radiant energy absorber layer
Grant 6,300,208 - Talwar , et al. October 9, 2
2001-10-09
Method for forming silicide regions on an integrated device
Grant 6,297,135 - Talwar , et al. October 2, 2
2001-10-02
Method of forming a silicide region in a Si substrate and a device having same
Grant 6,274,488 - Talwar , et al. August 14, 2
2001-08-14
Method For Forming A Silicide Region On A Silicon Body
App 20010012693 - TALWAR, SOMIT ;   et al.
2001-08-09
Gas immersion laser annealing method suitable for use in the fabrication of reduced-dimension integrated circuits
Grant 5,956,603 - Talwar , et al. September 21, 1
1999-09-21
Fabrication method for reduced-dimension FET devices
Grant 5,908,307 - Talwar , et al. June 1, 1
1999-06-01
Method for forming a silicide region on a silicon body
Grant 5,888,888 - Talwar , et al. March 30, 1
1999-03-30

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