| Patent | Date |
|---|
Organic Electroluminescence Device
App 20190372030 - Takizawa; Hiroo ; et al. | 2019-12-05 |
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
Grant 10,444,627 - Takizawa , et al. Oc | 2019-10-15 |
Organic electroluminescence device
Grant 10,403,832 - Takizawa , et al. Sep | 2019-09-03 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
Grant 10,234,759 - Kawabata , et al. | 2019-03-19 |
Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
Grant 10,031,419 - Takizawa , et al. July 24, 2 | 2018-07-24 |
Organic thin-film transistor and method for manufacturing same
Grant 10,008,671 - Takizawa , et al. June 26, 2 | 2018-06-26 |
Organic Thin Film Transistor, Method Of Manufacturing Organic Thin Film Transistor, Organic Semiconductor Composition, Organic Semiconductor Film, And Method Of Manufacturing Organic Semiconductor Film
App 20180175300 - YAMAMOTO; Yosuke ; et al. | 2018-06-21 |
Organic Thin Film Transistor, Method Of Manufacturing Organic Thin Film Transistor, Organic Semiconductor Composition, Organic Semiconductor Film, And Method Of Manufacturing Organic Semiconductor Film
App 20180175299 - YAMAMOTO; Yosuke ; et al. | 2018-06-21 |
Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device
Grant 9,915,870 - Takizawa , et al. March 13, 2 | 2018-03-13 |
Semiconductor device and insulating layer-forming composition
Grant 9,905,768 - Nagata , et al. February 27, 2 | 2018-02-27 |
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
Grant 9,829,796 - Takizawa , et al. November 28, 2 | 2017-11-28 |
Organic thin-film transistor and method for manufacturing same
Grant 9,799,832 - Takizawa , et al. October 24, 2 | 2017-10-24 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device
Grant 9,766,547 - Takizawa , et al. September 19, 2 | 2017-09-19 |
Thin film transistor
Grant 9,755,160 - Takizawa September 5, 2 | 2017-09-05 |
Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
Grant 9,651,863 - Takizawa , et al. May 16, 2 | 2017-05-16 |
Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device
Grant 9,612,535 - Hirano , et al. April 4, 2 | 2017-04-04 |
Semiconductor Device And Insulating Layer-forming Composition
App 20170054076 - NAGATA; Yuzo ; et al. | 2017-02-23 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device
Grant 9,557,643 - Takizawa , et al. January 31, 2 | 2017-01-31 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
Grant 9,551,933 - Takizawa , et al. January 24, 2 | 2017-01-24 |
Semiconductor Element And Insulating Layer-forming Composition
App 20170005266 - NAGATA; Yuzo ; et al. | 2017-01-05 |
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
Grant 9,527,809 - Yokokawa , et al. December 27, 2 | 2016-12-27 |
Organic Thin-film Transistor And Method For Manufacturing Same
App 20160372663 - TAKIZAWA; Hiroo ; et al. | 2016-12-22 |
Organic Thin-film Transistor And Method For Manufacturing Same
App 20160372662 - TAKIZAWA; Hiroo ; et al. | 2016-12-22 |
Thin Film Transistor
App 20160351824 - TAKIZAWA; Hiroo | 2016-12-01 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,500,951 - Yokokawa , et al. November 22, 2 | 2016-11-22 |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
Grant 9,470,980 - Inoue , et al. October 18, 2 | 2016-10-18 |
Pattern Forming Method, Electronic Device Manufacturing Method, Electronic Device, Block Copolymer And Block Copolymer Production Method
App 20160291461 - YOSHIDA; Hayato ; et al. | 2016-10-06 |
Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device
Grant 9,448,482 - Iwato , et al. September 20, 2 | 2016-09-20 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device
Grant 9,448,477 - Kawabata , et al. September 20, 2 | 2016-09-20 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
Grant 9,423,690 - Takizawa , et al. August 23, 2 | 2016-08-23 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
Grant 9,411,230 - Takizawa , et al. August 9, 2 | 2016-08-09 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern
Grant 9,400,430 - Tsuchimura , et al. July 26, 2 | 2016-07-26 |
Pattern Forming Method, Actinic Ray Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device Using Same, And Electronic Device
App 20160147147 - HIRANO; Shuji ; et al. | 2016-05-26 |
Pattern Formation Method, Active Light-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Production Method For Electronic Device Using Same, And Electronic Device
App 20160147154 - TAKIZAWA; Hiroo ; et al. | 2016-05-26 |
Pattern Formation Method, Active Light-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Production Method For Electronic Device Using Same, And Electronic Device
App 20160147155 - TAKIZAWA; Hiroo ; et al. | 2016-05-26 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
Grant 9,323,150 - Hirano , et al. April 26, 2 | 2016-04-26 |
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
Grant 9,323,153 - Hirano , et al. April 26, 2 | 2016-04-26 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
Grant 9,291,897 - Hirano , et al. March 22, 2 | 2016-03-22 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
Grant 9,291,896 - Hirano , et al. March 22, 2 | 2016-03-22 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
Grant 9,291,898 - Yokokawa , et al. March 22, 2 | 2016-03-22 |
Pattern Forming Method, Composition Kit And Resist Film, Manufacturing Method Of Electronic Device Using These, And Electronic Device
App 20160048075 - TAKIZAWA; Hiroo ; et al. | 2016-02-18 |
Pattern Forming Method, Active Light Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device, And Electronic Device
App 20160041465 - TAKIZAWA; Hiroo ; et al. | 2016-02-11 |
Compound, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, And Pattern Formation Method, And Method For Manufacturing Electronic Device Using Same, And Electronic Device
App 20160024005 - YOKOKAWA; NATSUMI ; et al. | 2016-01-28 |
Pattern Forming Method, Composition Kit And Resist Film, And Method For Producing Electronic Device Using Them, And Electronic Device
App 20160018734 - TAKIZAWA; HIROO ; et al. | 2016-01-21 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Method Of Manufacturing Electronic Device Using The Same, And Electronic Device
App 20160011517 - TAKIZAWA; HIROO ; et al. | 2016-01-14 |
Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
Grant 9,223,215 - Yokokawa , et al. December 29, 2 | 2015-12-29 |
Pattern Forming Method, Electron Beam- Or Extreme Ultraviolet-sensitive Resin Composition, Resist Film Using The Same, Method Of Manufacturing Electronic Device, And Electronic Device
App 20150370170 - HIRANO; SHUJI ; et al. | 2015-12-24 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film And Method Of Forming Pattern
App 20150338736 - KAWABATA; Takeshi ; et al. | 2015-11-26 |
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
Grant 9,188,862 - Hirano , et al. November 17, 2 | 2015-11-17 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,188,865 - Yokokawa , et al. November 17, 2 | 2015-11-17 |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
Grant 9,170,489 - Takizawa , et al. October 27, 2 | 2015-10-27 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150293446 - YOKOKAWA; Natsumi ; et al. | 2015-10-15 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150284492 - YOKOKAWA; Natsumi ; et al. | 2015-10-08 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound
Grant 9,152,047 - Kawabata , et al. October 6, 2 | 2015-10-06 |
Pattern Forming Method, Resist Pattern Formed By The Method, Method For Manufacturing Electronic Device Using The Same, And Electronic Device
App 20150253673 - IWATO; Kaoru ; et al. | 2015-09-10 |
Organic Electroluminescence Device
App 20150243913 - Takizawa; Hiroo ; et al. | 2015-08-27 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150185612 - KAWABATA; Takeshi ; et al. | 2015-07-02 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150185610 - HIRANO; Shuji ; et al. | 2015-07-02 |
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these
Grant 9,069,246 - Takizawa , et al. June 30, 2 | 2015-06-30 |
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Ray-sensitive Resin Composition, Resist Film, And Method For Manufacturing Electronic Device, And Electronic Device Using The Same
App 20150168834 - TAKIZAWA; Hiroo ; et al. | 2015-06-18 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150147688 - YOKOKAWA; Natsumi ; et al. | 2015-05-28 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, And Electronic Device
App 20150140484 - TAKIZAWA; Hiroo ; et al. | 2015-05-21 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, And Electronic Device
App 20150132687 - HIRANO; Shuji ; et al. | 2015-05-14 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, Electronic Device And Resin
App 20150132688 - YOKOKAWA; Natsumi ; et al. | 2015-05-14 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom, Method Of Forming Pattern, Process For Manufacturing Semiconductor Device, And Semiconductor Device
App 20150118628 - KAWABATA; Takeshi ; et al. | 2015-04-30 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film And Pattern Forming Method Using The Same, Manufacturing Method Of Semiconductor Device, And Semiconductor Device
App 20150086912 - KAWABATA; Takeshi ; et al. | 2015-03-26 |
Organic electroluminescence device
Grant 8,945,725 - Takizawa , et al. February 3, 2 | 2015-02-03 |
Pattern Forming Method, Method For Selecting Heating Temperature In Pattern Forming Method, Extreme Ultraviolet-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150017576 - INOUE; Naoki ; et al. | 2015-01-15 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150010857 - YOKOKAWA; Natsumi ; et al. | 2015-01-08 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And, Actinic Ray-sensitive Or Radiation-sensitive Film And Pattern Forming Method, Each Using The Same
App 20150004533 - HIRANO; Shuji ; et al. | 2015-01-01 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same And Electronic Device
App 20140363758 - NIHASHI; Wataru ; et al. | 2014-12-11 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray-or Radiation-sensitive Film Therefrom, Method Of Forming Pattern, Process For Manufacturing Semiconductor Device, Semiconductor Device And Compound
App 20140349223 - KAWABATA; Takeshi ; et al. | 2014-11-27 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same And Electronic Device
App 20140349224 - TAKIZAWA; Hiroo ; et al. | 2014-11-27 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Pattern Forming Method And Resist Film Using The Composition, And Electronic Device Manufacturing Method And Electronic Device Using These
App 20140349221 - TAKIZAWA; Hiroo ; et al. | 2014-11-27 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And, Actinic Ray-sensitive Or Radiation-sensitive Film And Pattern Forming Method, Each Using The Same
App 20140295332 - HIRANO; Shuji ; et al. | 2014-10-02 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Actinic Ray-sensitive Or Radiation-sensitive Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, Electronic Device And Resin
App 20140272692 - YOKOKAWA; Natsumi ; et al. | 2014-09-18 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film, Mask Blank And Method Of Forming Pattern
App 20140242502 - TSUCHIMURA; Tomotaka ; et al. | 2014-08-28 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom And Method Of Forming Pattern
App 20140227636 - HIRANO; Shuji ; et al. | 2014-08-14 |
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet-sensitive Composition, Resist Film, Method For Manufacturing Electronic Device Using The Same, And Electronic Device
App 20140212796 - TAKIZAWA; Hiroo ; et al. | 2014-07-31 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140212811 - INOUE; Naoki ; et al. | 2014-07-31 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140199617 - TSUBAKI; Hideaki ; et al. | 2014-07-17 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140193749 - TAKIZAWA; Hiroo ; et al. | 2014-07-10 |
Actinic-ray-or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Resin Film Therefrom And Method Of Forming Pattern Using The Composition
App 20140030643 - TAKAHASHI; Toshiya ; et al. | 2014-01-30 |
Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition
Grant 8,614,033 - Tsuchimura , et al. December 24, 2 | 2013-12-24 |
Organic electroluminescent device
Grant 8,420,234 - Kinoshita , et al. April 16, 2 | 2013-04-16 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Resin Film Therefrom And Method Of Forming Pattern Using The Composition
App 20130045445 - TAKAHASHI; Toshiya ; et al. | 2013-02-21 |
Resist Film, Resist Coated Mask Blanks And Method Of Forming Resist Pattern Using The Resist Film, And Chemical Amplification Type Resist Composition
App 20120214091 - TSUCHIMURA; Tomotaka ; et al. | 2012-08-23 |
Chemical Amplification Type Positive Resist Composition, And Resist Film, Resist Coated Mask Blanks And Resist Pattern Forming Method Using The Composition
App 20120202141 - INASAKI; Takeshi ; et al. | 2012-08-09 |
Organic electroluminescence device, novel platinum complex compound and novel compound capable of being a ligand thereof
Grant 8,216,698 - Murakami , et al. July 10, 2 | 2012-07-10 |
Organic Electroluminescence Device
App 20120153816 - Takizawa; Hiroo ; et al. | 2012-06-21 |
Organic electroluminescence device
Grant 8,187,729 - Murakami , et al. May 29, 2 | 2012-05-29 |
Charge-transporting Material And Organic Electroluminescence Device
App 20120126221 - Kitamura; Tetsu ; et al. | 2012-05-24 |
Simultaneous Two-photon Absorption Recording-reproduction Method, And Simultaneous Two-photon Absorption Recording Material For Use Therein
App 20100330496 - AKIBA; Masaharu ; et al. | 2010-12-30 |
Two-photon Absorbing Optical Recording Material And Two-photon Absorbing Optical Recording And Reproducing Method
App 20100239962 - AKIBA; Masaharu ; et al. | 2010-09-23 |
Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
Grant 7,771,915 - Akiba , et al. August 10, 2 | 2010-08-10 |
Organic Electroluminescent Device
App 20100171418 - KINOSHITA; Ikuo ; et al. | 2010-07-08 |
Non-resonant Two-photon Absorption Recording Material And Non-resonant Two-photon Absorption Compound
App 20100078607 - AKIBA; Masaharu ; et al. | 2010-04-01 |
Two-photon-absorbing Recording Medium, Two-photon-absorbing Recording/reproducing Method, And Two-photon-absorbing Recording/reproducing Apparatus
App 20090303855 - Akiba; Masaharu ; et al. | 2009-12-10 |
Organic Electroluminescence Device, Novel Platinum Complex Compound And Novel Compound Capable Of Being A Ligand Thereof
App 20090261721 - Murakami; Takeshi ; et al. | 2009-10-22 |
Hologram recording method and hologram recording material
Grant 7,588,863 - Takizawa , et al. September 15, 2 | 2009-09-15 |
Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material
Grant 7,582,391 - Takizawa September 1, 2 | 2009-09-01 |
Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
Grant 7,582,390 - Takizawa September 1, 2 | 2009-09-01 |
Hologram recording material, hologram recording method and optical recording medium
Grant 7,572,555 - Takizawa , et al. August 11, 2 | 2009-08-11 |
Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material
Grant 7,531,667 - Takizawa May 12, 2 | 2009-05-12 |
Holographic recording medium and recording method
Grant 7,524,589 - Furuki , et al. April 28, 2 | 2009-04-28 |
Two-photon Absorption Recording Material Containing Dye Having Polymerizable Group
App 20090088490 - AKIBA; Masaharu ; et al. | 2009-04-02 |
Organic Electroluminescence Device
App 20090072726 - MURAKAMI; Takeshi ; et al. | 2009-03-19 |
Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material
Grant 7,432,036 - Takizawa , et al. October 7, 2 | 2008-10-07 |
Hologram recording material and hologram recording method
App 20070207390 - Takizawa; Hiroo ; et al. | 2007-09-06 |
Holographic recording medium and holographic recording method using the same
Grant 7,236,277 - Kawano , et al. June 26, 2 | 2007-06-26 |
Hologram recording method, hologram recording material, optical recording medium
App 20070047038 - Takizawa; Hiroo | 2007-03-01 |
Two-photon recording method, two-photon absorption recording material, two-photon absorption recording-reproduction method and optical recoding medium
App 20070048666 - Takizawa; Hiroo | 2007-03-01 |
Silver halide photographic light-sensitive material
Grant 7,172,856 - Hioki , et al. February 6, 2 | 2007-02-06 |
Two-photon absorbing polymerizable composition and polymerization process thereof
Grant 7,112,616 - Takizawa , et al. September 26, 2 | 2006-09-26 |
Hologram recording material and optical recording medium
App 20060194122 - Takizawa; Hiroo | 2006-08-31 |
Hologram recording material, hologram recording method
App 20060194121 - Takizawa; Hiroo ; et al. | 2006-08-31 |
Hologram recording material, hologram recording method, and optical recording medium
App 20060188790 - Takizawa; Hiroo | 2006-08-24 |
Hologram recording material, hologram recording method, optical recording medium, and dye therefor
App 20060188789 - Takizawa; Hiroo ; et al. | 2006-08-24 |
Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material
App 20060083890 - Takizawa; Hiroo | 2006-04-20 |
Hologram recording material, hologram recording method and optical recording medium
App 20060078803 - Takizawa; Hiroo ; et al. | 2006-04-13 |
Hologram recording material and hologram recording method
App 20060057467 - Takizawa; Hiroo | 2006-03-16 |
Methine dye and silver halide photographic light-sensitive material containing the methine dye
Grant 6,979,529 - Katoh , et al. December 27, 2 | 2005-12-27 |
Optical recording material, optical recording medium and optical recording/reproducing device
App 20050265134 - Minabe, Jiro ; et al. | 2005-12-01 |
Optical recording material, optical recording medium and optical recording/reproducing device
App 20050228153 - Minabe, Jiro ; et al. | 2005-10-13 |
Hologram recording material, hologram recording method and optical recording medium
App 20050221198 - Takizawa, Hiroo ; et al. | 2005-10-06 |
Hologram recording material, hologram recording method, optical recording medium, three-dimensional display hologram and holographic optical element
App 20050214650 - Takizawa, Hiroo ; et al. | 2005-09-29 |
Holographic recording medium and holographic recording method using the same
App 20050206984 - Kawano, Katsunori ; et al. | 2005-09-22 |
Optical recording medium, method for producing the same, and optical recording and reproducing devices using the same
App 20050208256 - Yoshizawa, Hisae ; et al. | 2005-09-22 |
Holographic recording medium and recording method
App 20050208388 - Furuki, Makoto ; et al. | 2005-09-22 |
Optical recording material, optical recording medium and optical recording/reproducing apparatus
App 20050208387 - Minabe, Jiro ; et al. | 2005-09-22 |
Hologram recording method and hologram recording material
App 20050058910 - Takizawa, Hiroo ; et al. | 2005-03-17 |
Hologram recording material composition, hologram recording material and hologram recording method
App 20050046915 - Takizawa, Hiroo ; et al. | 2005-03-03 |
Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material
App 20050019711 - Takizawa, Hiroo | 2005-01-27 |
Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
App 20050003133 - Akiba, Masaharu ; et al. | 2005-01-06 |
Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
App 20040245432 - Takizawa, Hiroo | 2004-12-09 |
Methine dye and silver halide photographic light-sensitive material containing the same
Grant 6,806,043 - Takizawa October 19, 2 | 2004-10-19 |
Two-photon absorbing polymerizable composition and polymerization process thereof
App 20040204513 - Takizawa, Hiroo ; et al. | 2004-10-14 |
Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, method for inducing absorption of non-resonant two-photons and method for generating emission of non-resonant two-photons
App 20040131969 - Takizawa, Hiroo ; et al. | 2004-07-08 |
Methine dye and silver halide photographic material containing the same
Grant 6,750,003 - Takizawa June 15, 2 | 2004-06-15 |
Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material
App 20040086803 - Takizawa, Hiroo ; et al. | 2004-05-06 |
Silver halide color photographic light-sensitive material
Grant 6,670,112 - Takizawa , et al. December 30, 2 | 2003-12-30 |
Silver halide photographic light-sensitive material
App 20030228549 - Hioki, Takanori ; et al. | 2003-12-11 |
Methine dye and silver halide photographic material containing the same
App 20030198906 - Takizawa, Hiroo | 2003-10-23 |
Silver halide color photographic light-sensitive material
App 20030194663 - Takizawa, Hiroo ; et al. | 2003-10-16 |
Methine dye and silver halide photographic material containing the same
Grant 6,632,597 - Takizawa October 14, 2 | 2003-10-14 |
Methine dye and silver halide photographic light-sensitive material containing the same
App 20030138746 - Takizawa, Hiroo | 2003-07-24 |
Methine dye and silver halide photographic material containing the same
App 20020155400 - Takizawa, Hiroo | 2002-10-24 |
Methine dye and silver halide photographic light-sensitive material containing the methine dye
App 20020086250 - Katoh, Takashi ; et al. | 2002-07-04 |
Photoelectric conversion device and solar cell
Grant 6,084,176 - Shiratsuchi , et al. July 4, 2 | 2000-07-04 |
Heat developable light-sensitive material and method of forming color images
Grant 6,051,359 - Ohkawa , et al. April 18, 2 | 2000-04-18 |
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