Takeyama; Naoki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Takeyama; Naoki.The latest application filed is for "negative type resist composition".
- Takeyama; Naoki - Saga JP
- Takeyama; Naoki - Settsu JP
- Takeyama; Naoki - Osaka JP
| Patent | Date |
|---|---|
| Negative type resist composition Grant RE40,964 - Suetsugu , et al. November 10, 2 | 2009-11-10 |
| Resist composition Grant 6,656,660 - Urano , et al. December 2, 2 | 2003-12-02 |
| Photosensitive resin composition for color filter Grant 5,876,895 - Hishiro , et al. March 2, 1 | 1999-03-02 |
| Curable resin composition for overcoat film of color filter and color filter Grant 5,614,594 - Miyazaki , et al. March 25, 1 | 1997-03-25 |
| Photoresist composition containing alkyletherified polyvinylphenol Grant 5,585,218 - Nakano , et al. December 17, 1 | 1996-12-17 |
| Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye Grant 5,362,598 - Takeyama , et al. November 8, 1 | 1994-11-08 |
| Negative photoresist composition Grant 5,304,456 - Ueda , et al. April 19, 1 | 1994-04-19 |
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